WO2007018570A2

WO2007018570A2 - Absorbing film

Info

Publication number: WO2007018570A2
Application number: PCT/US2005/039482
Authority: WO
Inventors: Jonathan Tischler; Michael Scott Bradley; Vladimir Bulovic
Original assignee: Massachusetts Institute Of Technology
Priority date: 2004-11-03
Filing date: 2005-11-03
Publication date: 2007-02-15
Also published as: US20060159901A1; WO2007018570A3; US7799422B2

Abstract

A high oscillator strength thin film has an absorption constant greater than or equal to 106 cm-1.

Description

ABSORBING FILM

CLAIM OF PRIORITY

This application claims priority to provisional U.S. Patent Application No. 60/624,198, filed November 3, 2004, which is incorporated by reference in its entirety.

TECHNICAL FIELD The present invention relates to a light absorbing film.

FEDERALLY SPONSORED RESEARCH OR DEVELOPMENT

The U.S. Government may have certain rights in this invention pursuant to Grant No. DMR 02-13282 from the National Science Foundation.

BACKGROUND Light-emitting devices can be used, for example, in displays (e.g., flat-panel displays), screens (e.g., computer screens), and other items that require illumination. Accordingly, the brightness of the light-emitting device is one important feature of the device. Also, low operating voltages and high efficiencies can improve the viability of producing emissive devices. Light-emitting devices can release photons in response to excitation of an active component of the device. Emission can be stimulated by applying a voltage across the active component (e.g., an electroluminescent component) of the device. The electroluminescent component can be a polymer, such as a conjugated organic polymer or a polymer containing electroluminescent moieties or layers of organic molecules. Typically, the emission can occur by radiative recombination of an excited charge between layers of a device. The emitted light has an emission profile that includes a maximum emission wavelength, and an emission intensity, measured in luminance (candelas/square meter (cd/m ) or power flux (W/m )). The emission profile, and other physical characteristics of the device, can be altered by the electronic structure (e.g., energy gaps) of the material. For example, the brightness, range of color, efficiency, operating voltage, and operating half-lives of light-emitting devices can vary based on the structure of the device. SUMMARY

In general, a high oscillator strength thin film can be applied to a surface. The film can have an absorption coefficient greater than 10⁵ cm^"1, for example, greater than or equal to 10⁶ cm^"1. Thin films characterized by a high absorption coefficient and methods for making such films are provided. The films are formed by adsorption into layered structures of charged species with strong dipole-dipole interactions between species. The films are built by adsorption of species with alternating charge on a solid substrate e.g., glass, silicon, a polymer surface, or a previous polymer film disposed on a substrate, etc. The high absorption coefficient arises from the interaction of dipoles in a plane perpendicular to the probe direction. The process used to form these films allows for strong dipole interactions within the adsorbed layer. Additionally, the process allows for precise deposition of a single physical layer of the dipole-dipole-interacting absorbing species. As a result, the dipole-dipole interactions in the plane of absorbing species perpendicular to the probe direction provide a high absorption constant in the thin film. In one aspect, a light absorbing film includes a light absorbing material and a multiply charged material adjacent to the light absorbing material, wherein the light absorbing material and the multiply charged material interact noncovalently. A first molecule of the light absorbing material can form a dipole-dipole interaction with a second molecule of the light absorbing material. The light absorbing material can be a J- aggregate. The light absorbing material can include a cyanine dye. The film can have an absorption coefficient of at least 10^s cm^"1 at a wavelength between 100 nm and 10,000 nm; of at least 10⁵ cm^"1 at a wavelength between 300 nm and 700 nm; of at least 10⁵ cm^"1 at a wavelength between 700 nm and 2,000 nm; of at least 10 cm^"1 at a wavelength between 100 nm and 10,000 nm; of at least 10⁶ cm^"1 at a wavelength between 300 nm and 700 nm; or of at least 10⁶ cm^"1 at a wavelength between 700 nm and 2,000 nm.

In another aspect, a method of forming a light absorbing film includes contacting a substrate with a multiply charged material, and contacting the substrate with a light absorbing material having an opposite charge. Contacting the substrate with a multiply charged material includes contacting the substrate with a solution of the multiply charged material. Contacting the substrate with a light absorbing material can include contacting the substrate with a solution of the light absorbing material. Contacting the substrate with the multiply charged material includes forming a layer of the multiply charged material on the substrate. Contacting the substrate with a light absorbing material can include forming a layer of light absorbing material adjacent to the layer of multiply charged material.

The multiply charged material can include a polyelectrolyte. The polyelectrolyte can be a polycation or polyanion. The multiply charged material can include a metal ion. The light absorbing material and the multiply charged material can form an electrostatic bilayer. The film can include a plurality of electrostatic bilayers arranged in a multilayer.

In another aspect, a light absorbing film includes a plurality of electrostatic bilayers. Each bilayer includes a first layer including a light absorbing material, and a second layer adjacent to the first layer, the second layer including a multiply charged material.

In another aspect, a method of forming a light absorbing film includes sequentially depositing a plurality of electrostatic bilayers on a substrate. Each bilayer includes a first layer including a light absorbing material, and a second layer adjacent to the first layer, the second layer including a multiply charged material. Other features, objects, and advantages will be apparent from the description and drawings, and from the claims.

DESCRIPTION OF DRAWINGS

FIG. 1 is a schematic diagram depicting a bilayer structure.

FIG. 2 depicts AFM images and data of layered structures. FIGS. 3A-3F are graphs depicting optical properties of layered structures.

DETAILED DESCRIPTION

Thin films having a high oscillator strength (i.e., absorption coefficient) can be made by alternately adsorbing two or more materials capable of non-covalent interaction onto a support or substrate from solution, where one material is a light absorbing material. The non-covalent interaction can be, for example, an electrostatic interaction or hydrogen bonding. Selection of appropriate materials and assembly conditions can result in a film where the light absorbing material participates in strong dipole-dipole interactions, favoring a high absorption coefficient. The light absorbing material can be a dye capable of forming a J-aggregate. Layers of light absorbing material, which can be positively or negatively charged, can be interspersed with layers of an oppositely charged material. The oppositely charged material can include a multiply charged species. A multiply charged species can have a plurality of charge sites each bearing a partial, single, or multiple charge; or a single charge site bearing a multiple charge. A polyelectrolyte, for example, can have a plurality of charge sites each bearing a partial, single, or multiple charge. A polyelectrolyte has a backbone with a plurality of charged functional groups attached to the backbone. A polyelectrolyte can be polycationic or polyanionic. A polycation has a backbone with a plurality of positively charged functional groups attached to the backbone, for example poly(allylamine hydrochloride). A polyanion has a backbone with a plurality of negatively charged functional groups attached to the backbone, such as sulfonated polystyrene (SPS), polyacrylic acid, or a salt thereof. Some polyelectrolytes can lose their charge (i.e., become electrically neutral) depending on conditions such as pH. Some polyelectrolytes, such as copolymers, can include both polycationic segments and polyanionic segments. The charge density of a polyelectrolyte in aqueous solution can be pH insensitive (i.e., a strong polyelectrolyte) or pH sensitive (i.e., a weak polyelectrolyte). Without limitation, some exemplary polyelectrolytes are poly diallyldimethylammonium chloride (PDAC, a strong polycation), poly allylamine hydrochloride (PAH₅ a weak polycation), sulfonated polystyrene (SPS, a strong polyanion), and poly acrylic acid (PAA, a weak polyanion). Examples of a single charge site bearing a multiple charge include multiply charged metal ions, such as, without limitation, Mg²⁺, Ca²⁺, Zn²⁺, Fe²⁺, Fe³⁺, Co²⁺, Cu²⁺, Cd²⁺, Sn⁴⁺, Eu³⁺, Tb³⁺, and the like. Multiply charged metal ions are available as salts, e.g. chloride salts such as CoCl₂, FeCl₃, EuCl₃, TbCl₃, CdCl₂, and SnCl₄.

The film can include hydrogen bonding polymers, such as, for example, polyacrylamide (PAm), polyvinylpyrolidone (PVP), and polyvinyl alcohol (PVA). The light absorbing film can include more than two materials. One of these materials is the light absorbing material and one of the other materials is either a multivalent ionic species or hydrogen bonding polymer. Additional materials may be included in the film to promote crosslinking, adhesion, or to sensitize light emission or absorption.

The thin films can include one or several layers of a polyelectrolyte and one or more charged species with strong dipole-dipole interactions and any additional dopants. At least one of the charged species used for strong dipole-dipole interactions has a charge opposite that of the polyelectrolyte used for the scaffold. When sequentially applied to a substrate, the oppositely charged materials attract forming an electrostatic bilayer. The polyelectrolyte provides a scaffold for the species with strong dipole-dipole interactions to form a layered structure. These films are compatible with other processes of building thin films through alternate adsorption of charged species. The films can be interspersed in a multifilm heterostructure with other thin films.

The charged species with strong dipole-dipole interactions can be a single type of species, such as a single type of J-aggregating material (for example, a cyanine dye). Alternatively, several charged species with strong dipole-dipole interactions among the species could be used. The species used for the strong dipole-dipole interacting layer can have individual dipoles that can couple together to produce a coherent quantum mechanical state. This allows for the buildup of coherence in two dimensions, producing effects in the probe dimension perpendicular to the interacting species. J-aggregates of cyanine dyes have long been known for their strong fluorescence.

This strong fluorescence makes J-aggregates a desirable candidate for use in organic light-emitting devices (OLEDs), and these devices have been demonstrated. The layer- by-layer (LBL) technique for film growth, first developed by Decher et al., was extended to create thin films of J-aggregates, which have been to create an OLED with J- aggregates as emitters. See, for example, E.E. Jelley, Nature 1936, 138, 1009; M. Era, C. Adachi, T. Tsutsui, S. Saito, Chem. Phys. Lett. 1991, 178, 488; G. Decher, J. D. Hong, J. Schmitt, Thin Solid Films 1992, 210, 831; H. Fukumoto, Y. Yonezawa, Thin Solid Films 1998, 329, 748; S. Bourbon, M. Y. Gao, S. Kirstein, Synthetic Metals 1999, 101, 152; Bradley, M.S. et al., Advanced Materials 2005, 17, 1881; and provisional U.S. Patent Application No. 60/624,187, filed November 3, 2004, each of which is incorporated by reference in its entirety.

Layer-by-layer (LBL) processing of polyelectrolyte multilayers can be utilized to fabricate conformal thin film coatings with molecular level control over film thickness and chemistry. Charged polyelectrolytes can be assembled in a layer-by-layer fashion. In other words, positively- and negatively-charged polyelectrolytes can be alternately deposited on a substrate. One method of depositing the polyelectrolytes is to contact the substrate with an aqueous solution of polyelectrolyte at an appropriate pH. The pH can be chosen such that the polyelectrolyte is partially or weakly charged. The multilayer can include a number of electrostatic bilayers. An electrostatic bilayer is the structure formed by the ordered application of a mulitply charged species (e.g., a polyelectrolyte or metal ion) and an oppositely charged material (e.g., a light absorbing material, polyelectrolyte or counterion). The properties of weakly charged polyelectrolytes can be precisely controlled by changes in pH. See, for example, G. Decher, Science 1997, 277, 1232; Mendelsohn et al., Langmuir 2000, 16, 5017; Fery et al., Langmuir 2001, 17, 3779; Shiratori et al., Macromolecules 2000, 33, 4213, each of which is incorporated by reference in its entirety.

The process conditions used in the deposition of the film can be varied. Some process conditions that can be varied include concentration, temperature, pH, salt concentration, co-solvent, co-solvent concentration, and deposition time. The temperature can be varied between, for example, 0 °C and 100 ⁰C, or between 5 ⁰C and 80 °C. The pH can be varied from 0.0 to 14.0, or from 3.0 to 13.0. The salt concentration can range from deionized (i.e., no salt added) to 1 M. NaCl and KCl are examples of salts used. Solutions can be prepared using water as the sole solvent, or with water and a co- solvent, such as an organic solvent. Some exemplary organic solvents include methanol, ethanol, isopropanol, acetone, acetic acid, THF, dioxane, DMF, and formamide. The deposition time can be 1 second or less; 30 seconds or less; 1 minute or less; 5 minutes or less; 10 minutes or less; 1 hour or less; or several hours or more. In some circumstances, deposition times will be in the range of 1 second to 10 minutes. The density of the film can be modified by repeatedly immersing the substrate into solutions of the light absorbing material prepared with different process conditions. As an example, by cyclically immersing into a solution held at a temperature of 20 °C and then in a second solution held at 60 ⁰C. The crystallinity of the resultant film is enhanced and dye density increased compared to films not treated in this manner. The film can include a plurality of bilayers, such as fewer than 100, fewer than 50, fewer than 20, or fewer than 10 bilayers. The film can include 0.5, 1.0, 1.5, 2.0, 2.5, 3.0, 3.5, 4.0, 4.5, 5.0, 5.5., 6.0, 6.5, 7.0, 7.5, 8.0, 8.5, 9.0, 9.5, or 10.0 bilayers. A bilayer includes a layer of multiply charged material and a layer of light absorbing material. In some embodiments, the film can include bilayers substantially free of light absorbing material, e.g., bilayers where one layer includes a polycation and the other layer includes a polyanion. Including bilayers that are substantially free of light absorbing material can be advantageous, for example, in altering the adhesion of the film to a substrate or in altering the thickness of the film.

The light absorbing film can be deposited on a hydrophilic or hydrophobic substrate. The film can be deposited onto conducting (e.g., metallic), semiconducting, or insulating layers; or bio-compatible materials, examples of which are a polymer film that is hydrophilic or hydrophobic, an oxide layer, a metal oxide layer, a metal layer, a DNA- coated surface, and others. Examples of a hydrophilic polymer layer include polyelectrolytes and hydrogen bonding polymers; amino acids; proteins; and hydrophilic polymers. Examples of hydrophobic polymers include PDMS, PoIy-TPD, and MEH- PPV. Metal oxide layers include, for example alumina, titania, and zinc oxide. Examples of semiconducting layers are layers of Si, Ge, GaAs, GaN, AlGaAs, GaAsP, CdSe, CdS, ZnS, and metal halides, such as AgCl, AgBr, and AgI. Adhesion of the light absorbing film to the substrate can be promoted by varying the process conditions described above.

Samples of LBL TDBC J-aggregate films were prepared on glass and used to probe the optical and morphological properties of the films. FIG. 1 shows a schematic of the sample bilayer (bilayer) structure and the chemical structures of the thin film constituents. The polycation used in the LBL growth was poly diallyldimethylammonium chloride (PDAC), and the anion was TDBC (5,6-dichloro-2-[3-[5,6-dichloro-l-ethyl-3-(3- sulfopropyl)-2(3H)-benzimidazolidene]-l-propenyl]-l-ethyl-3-(3-sulfopropyl) benzirnidazolium hydroxide, inner salt, sodium salt), a J-aggregate forming cyanine dye. Optical measurements were taken with the LBL-film side of the sample facing the beam. For analysis, the samples were modeled as regions of air, J-aggregate film, thick glass, and air.

Samples with different numbers of PDAC/TDBC bilayer were produced in order to observe the film structure at various stages of growth using atomic force microscopy (AFM). FIG. 2 shows AFM images throughout the various stages of growth. In addition, FIG. 2 shows a plot of RMS roughness versus the number of bilayers deposited.

In FIG. 2, each bilayer was made by a PDAC adsorption step followed by a TDBC adsorption step, with half bilayer referring to an additional PDAC adsorption step. The top three images show samples before and at the start of layered growth at 2.0 bilayers. The bottom three images show the build-up of thick layers. The histograms are lined up at the dominant film thicknesses to show that each physical layer is about 1.7 nm thick, the estimate used when modeling the films. The plot shows the roughness profile of thick films, from 3.5 to 10.5 bilayers. The roughness is nearly constant until 6.5 bilayers, when the growth regime changes from layered to Stransky-Krastanov (SK). All images have a vertical scale of 50 nm. As shown in the images of glass, 1.5 bilayers, and 2.0 bilayers (FIG. 2), the full layered structure of the LBL TDBC J-aggregate films did not appear until the second dye layer has been adsorbed. The images of thick films show that layered growth was still dominant at 4.5 bilayers, but at 6.5 bilayers and 10.5 bilayers the growth had shifted to a Stransky-Krastanov (SK) type of process, forming large islands of material. To quantify the growth trend, RMS roughness was measured on 16 μm² AFM images of films with 3.5 to 10.5 bilayers. The plot in FIG. 2 shows that a mostly constant roughness of 1.4 to 2.0 nm persisted through 5.5 bilayers, indicating layered growth. At 6.5 bilayers, the roughness started increasing with each new bilayer deposited, indicating the shift to SK growth.

The thickness data obtained from the AFM measurements were used along with data from optical measurements to extract the optical constants of LBL TDBC J- aggregate films. Transmittance and reflectance measurements were performed for samples with different numbers of bilayers adsorbed. FIG. 3 shows plots of reflectance and transmittance data for the sample structures shown in FIG. 1. Absorbance was obtained from measured transmittance data using the definition of absorbance as logio(l/T), where T is the transmittance. FIGS. 3A-3F also show plots of the full-width half-maximum (FWHM) and energy of the peak in absorbance. The reflectance and transmittance of the samples were used with the thickness data from the AFM to make a least-squared error (LSE) fit of the index of refraction of the LBL TDBC J-aggregate films at a wavelength of 594 nm. A model based on propagation and matching matrices representing the layers and interfaces of the structure in FIG. 1 was used for the fit. See, for example, L. Ward. The Optical Constants of Bulk Materials and Films (IOP Publishing Ltd.: Bristol, UK), 1994, which is incorporated by reference in its entirety. This fit was also shown in FIG 3.

FIGS. 3 A and 3B show reflectance and transmittance data collected for a different numbers of bilayers adsorbed. FIG. 3C shows absorbance data from the same samples, constructed using the collected transmittance data. FIGS. 3D and 3E show the FWHM and energy of the peak in absorbance as a function of number of bilayer adsorbed. FIG. 3F shows the collected transmittance and reflectance data plotted with predictions from modeling the samples. The model consisted of propagation and matching matrices for the sample structure shown in FIG. 1. A least-squared error method was used to fit the index of refraction at a wavelength of 594 nm using only the points in black. The points in black are for samples where layered growth was dominant. The outlined points are for samples where SK growth caused a significant change in measured RMS roughness. For these points, the thickness shown for the outlined points is an estimate of the layered portion, not the SK portion. The two fits plotted show the range in the index of refraction. From the AFM data collected, the physical layers deposited were observed to vary in thickness from about 1.4 to 2.0 nm. Based on this estimate of physical film thickness per adsorbed bilayer, the index of refraction was fit through the use of a propagation and matching matrix model of the sample structure. The model calculated transmittance and 7-degree-incident reflectance values based on the light traveling through air, a LBL

TDBC J-aggregate film, the glass slide, and then air. A range for the index of refraction was obtained by fitting for films with 1.4 to 2.0 nm per physical layer for every full bilayer adsorbed. Since no physical layer was evident for the first 1.5 bilayers adsorbed, the first physical layer's data corresponded to a sample with 2.5 bilayers adsorbed. Using this method, the index of refraction was estimated to have a real part between 2.3 and 2.8 and an imaginary part between 4.5 and 5.4. The high extinction coefficient corresponds to an absorption coefficient in the range of 1.05 ± 0.1 * 10⁶ cm^"1. Despite the observed presence of thick SK growth in samples with more than 5.5 bilayers adsorbed, the samples' optical properties can be predicted by treating the samples as having only thin layered growth.

The transmittance predicted by the model diverged slightly from the collected data as the number of bilayers increased. This may be due to a number of phenomena that are not considered in the model. As can be seen in FIG. 3B, a high energy shoulder was present in transmittance that may account for some of the difference between predicted and measured transmittance. Additionally, resonant Rayleigh scattering could be significant since the index of refraction was being examined on or near resonance. See, for example, J. Hegarty, et al. Phys. Rev. Lett. 1982, 49, 930, which is incorporated by reference in its entirety. Small variations in the film could cause large local shifts in the index of refraction, which may explain the divergence in measured and predicted transmittance. Lastly, the model did not account for a distribution of thicknesses in the physical layers or that each physical layer may not fully cover the sample, either of which could contribute to the difference between predicted and measured transmittance.

The morphological and optical properties of LBL thin films of J-aggregates of TDBC cyanine dye have been measured. The growth regime was strictly layered up to the adsorption of the fourth physical layer, after which SK growth becomes considerable. The high absorption coefficient of the films demonstrated the viability of LBL thin film J- aggregates for use in devices, especially when significant interaction with light is desired, as in the case of polariton-emitting OLEDs. Experimental

J-aggregate thin films were produced using a layer-by-layer deposition method. Layers of polyelectrolyte and J-aggregate-forming dye were alternately adsorbed onto glass slides. The dye used was 5,6-dichloro-2-[3-[5,6-dichloro-l-ethyl-3-(3-sulfopropyl)- 2(3H)-benzimidazolidene]-l -propenyl]-l -ethyl-3-(3-sulfopropyl) benzimidazolium hydroxide, inner salt, sodium salt obtained from Nippon Kankoh Shikiso Kenkyusho Co., Ltd. (CAS 28272-54-0). The polyelectrolyte used was Poly(diallyldimethylammonium chloride), 20% by weight in water, M_w=400,000-500,000, obtained from Sigma- Aldrich (CAS 26062-79-3). The dye solvent and rinses for the dye adsorption step were approximately pH 9 solutions of deionized (DI) water plus sodium hydroxide. The sodium hydroxide was obtained from EM Science. The polyelectrolyte solvent and rinses for the polyelectrolyte adsorption step were DI water. The dye solution was approximately 5x10^"5 M. Once the dye was added to the dye solvent, the dye bucket was placed in a VWR ultrasonic cleaner to sonicate for 30 minutes. The dye was then mixed with a one-inch magnetic spin bar for 10 minutes, sonicated for 20 minutes, mixed for 5 minutes, and finally sonicated for 5 minutes. The polyelectrolyte solution was approximately 3x10^"2 M, prepared by adding 10 mL of polyelectrolyte to 400 mL of DI water. The polyelectrolyte solution was prepared using the same time lengths as the dye solution preparation, except sonication and mixing at each step were swapped. Care was taken throughout the deposition to shield the dye solution and samples from light.

Prior to the deposition, the glass slides were cleaned with a detergent solution (Micro-90), acetone, and isopropanol. The acetone, isopropanol, and methanol used in this study were OmniSolv-brand solvents made by EMD Chemicals. The slides were then treated with oxygen plasma for six minutes in a Plasma Preen system. The layer-by- layer deposition was performed using a Leica Autostainer XL. The stainer was controlled by a program running in National Instruments Lab VIEW 6.1. The polyelectrolyte adsorption step consisted of dipping the slides in polyelectrolyte solution for 15 minutes and in the three polyelectrolyte rinses for two minutes, two minutes, and one minute respectively. The dye adsorption step used the same times for the dye solution and dye rinses as the times used in the polyelectrolyte adsorption step.

Upon removal from the stainer, each sample was blown dry using nitrogen gas. For each sample, the side that was not treated with oxygen plasma prior to deposition was then cleaned using methanol to remove the deposited layers from the back. The AFM data were collected on a Digital Instruments D3100 Scanning Probe Microscope in tapping mode using silicon-nitride tips from Veeco. The optical data were collected using a Gary 5E UV-Vis-NIR spectrophotometer. The transmission data were collected with the light beam at normal incidence with a baseline of a clean, blank glass slide. This baseline was accounted for in the model by adjusting the predicted transmittance of a sample by the predicted transmittance for a blank slide with no J- aggregate layer. The reflectance data were collected in a V-W setup with the light beam at seven-degree incidence using the Gary Surface Reflectivity Accessory in Absolute Reflectivity mode. Other embodiments are within the scope of the following claims.

Claims

WHAT IS CLAIMED IS:

1. A light absorbing film comprising a light absorbing material and a multiply charged material adjacent to the light absorbing material, wherein the light absorbing material and the multiply charged material interact noncovalently.

2. The film of claim 1 , wherein the a first molecule of the light absorbing material forms a dipole-dipole interaction with a second molecule of the light absorbing material.

3. The film of claim 1, wherein the light absorbing material is a J-aggregate.

4. The film of claim 3, wherein the light absorbing material includes a cyanine dye.

5. The film of claim 1 , wherein the film has an absorption coefficient of at least 10⁵ cm^'1 at a wavelength between 100 nm and 10,000 nm.

6. The film of claim 1 , wherein the film has an absorption coefficient of at least 10⁵ cm^"1 at a wavelength between 300 nm and 700 nm.

7. The film of claim 1 , wherein the film has an absorption coefficient of at least 10⁵ cm^" at a wavelength between 700 nm and 2,000 nm.

8. The film of claim 1 , wherein the film has an absorption coefficient of at least 10 cm^" at a wavelength between 100 nm and 10,000 nm.

9. The film of claim 1 , wherein the film has an absorption coefficient of at least 10⁶ cm^"1 at a wavelength between 300 nm and 700 nm.

10. The film of claim 1 , wherein the film has an absorption coefficient of at least 10⁶ cm^"1 at a wavelength between 700 nm and 2,000 nm.

11. The film of claim 1 , wherein the multiply charged material includes a polyelectrolyte.

12. The film of claim 11 , wherein the polyelectrolyte is a polycation.

13. The film of claim 11 , wherein the polyelectrolyte is a polyanion.

14. The film of claim 1 , wherein the multiply charged material includes a metal ion.

15. The film of claim 1 , wherein the light absorbing material and the multiply charged material form an electrostatic bilayer.

16. The film of claim 15, further comprising a plurality of electrostatic bilayers arranged in a multilayer.

17. A method of forming a light absorbing film comprising: contacting a substrate with a multiply charged material; and contacting the substrate with a light absorbing material having an opposite charge.

18. The method of claim 17, wherein contacting the substrate with a multiply charged material includes contacting the substrate with a solution of the multiply charged material.

19. The method of claim 18, wherein contacting the substrate with a light absorbing material includes contacting the substrate with a solution of the light absorbing material.

20. The method of claim 17, wherein contacting the substrate with the multiply charged material includes forming a layer of the multiply charged material on the substrate.

21. The method of claim 20, wherein contacting the substrate with a light absorbing material includes forming a layer of light absorbing material adjacent to the layer of multiply charged material.

22. The method of claim 17, wherein the multiply charged material includes a polyelectrolyte.

23. The method of claim 22, wherein the polyelectrolyte is a polycation.

24. The method of claim 22, wherein the polyelectrolyte is a polyanion.

25. The method of claim 22, wherein the multiply charged material includes a metal ion.

26. The method of claim 22, wherein the light absorbing material is a J- aggregate.

27. The method of claim 26, wherein the light absorbing material includes a cyanine dye.

28. A light absorbing film comprising: a plurality of electrostatic bilayers, each bilayer comprising: a first layer including a light absorbing material; and a second layer adjacent to the first layer, the second layer including a multiply charged material.

29. The film of claim 28, wherein the light absorbing material includes a J- aggregate. .

30. The film of claim 29, wherein the light absorbing material includes a cyanine dye.

31. The film of claim 30, wherein the multiply charged material includes a polyelectrolyte.

32. The film of claim 31 , wherein the film has an absorption coefficient of at least 10⁶ cm^'1 at a wavelength between 300 nm and 700 nm.

33. A method of forming a light absorbing film comprising: sequentially depositing a plurality of electrostatic bilayers on a substrate, each bilayer comprising: a first layer including a light absorbing material; and a second layer adjacent to the first layer, the second layer including a multiply charged material.

34. The method of claim 33, wherein the light absorbing material includes a J- aggregate.

35. The method of claim 34, wherein the light absorbing material includes a cyanine dye.

36. The method of claim 35, wherein the multiply charged material includes a polyelectrolyte.