WO2007056025A3 - Reclaiming substrates having defects and contaminants - Google Patents
Reclaiming substrates having defects and contaminants Download PDFInfo
- Publication number
- WO2007056025A3 WO2007056025A3 PCT/US2006/042702 US2006042702W WO2007056025A3 WO 2007056025 A3 WO2007056025 A3 WO 2007056025A3 US 2006042702 W US2006042702 W US 2006042702W WO 2007056025 A3 WO2007056025 A3 WO 2007056025A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- substrates
- test
- identification code
- reclaimed
- cassettes
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67294—Apparatus for monitoring, sorting or marking using identification means, e.g. labels on substrates or labels on containers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67288—Monitoring of warpage, curvature, damage, defects or the like
Abstract
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008539010A JP2009521097A (en) | 2005-11-02 | 2006-10-31 | Regeneration of substrates with defects and contaminants |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/265,237 US7657390B2 (en) | 2005-11-02 | 2005-11-02 | Reclaiming substrates having defects and contaminants |
US11/265,237 | 2005-11-02 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2007056025A2 WO2007056025A2 (en) | 2007-05-18 |
WO2007056025A3 true WO2007056025A3 (en) | 2009-06-25 |
Family
ID=37996916
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2006/042702 WO2007056025A2 (en) | 2005-11-02 | 2006-10-31 | Reclaiming substrates having defects and contaminants |
Country Status (6)
Country | Link |
---|---|
US (1) | US7657390B2 (en) |
JP (1) | JP2009521097A (en) |
KR (1) | KR20080075140A (en) |
CN (1) | CN101632080A (en) |
TW (1) | TWI368931B (en) |
WO (1) | WO2007056025A2 (en) |
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JP4444154B2 (en) * | 2005-05-02 | 2010-03-31 | 大日本スクリーン製造株式会社 | Substrate processing equipment |
US20080293329A1 (en) * | 2007-05-21 | 2008-11-27 | Applied Materials, Inc. | Methods and apparatus for identifying a substrate edge profile and adjusting the processing of the substrate according to the identified edge profile |
JP5155698B2 (en) * | 2008-03-06 | 2013-03-06 | 東京エレクトロン株式会社 | Particle generation factor discrimination system and particle generation factor discrimination method |
US10434804B2 (en) | 2008-06-13 | 2019-10-08 | Kateeva, Inc. | Low particle gas enclosure systems and methods |
US8383202B2 (en) | 2008-06-13 | 2013-02-26 | Kateeva, Inc. | Method and apparatus for load-locked printing |
US9604245B2 (en) | 2008-06-13 | 2017-03-28 | Kateeva, Inc. | Gas enclosure systems and methods utilizing an auxiliary enclosure |
KR101878084B1 (en) | 2013-12-26 | 2018-07-12 | 카티바, 인크. | Apparatus and techniques for thermal treatment of electronic devices |
KR20220147699A (en) | 2014-01-21 | 2022-11-03 | 카티바, 인크. | Apparatus and techniques for electronic device encapsulation |
JP6461195B2 (en) | 2014-04-30 | 2019-01-30 | カティーバ, インコーポレイテッド | Gas cushion apparatus and technique for substrate coating |
CN105470157A (en) * | 2014-09-12 | 2016-04-06 | 上海华虹宏力半导体制造有限公司 | Cu content detection method in ICP_MS test |
GB201501342D0 (en) * | 2015-01-27 | 2015-03-11 | Univ Lancaster | Improvements relating to the authentication of physical entities |
KR101701487B1 (en) * | 2015-04-28 | 2017-02-03 | 웅진에너지 주식회사 | Inline wafer process system and processing method the same |
US11569138B2 (en) | 2015-06-16 | 2023-01-31 | Kla Corporation | System and method for monitoring parameters of a semiconductor factory automation system |
JP6832658B2 (en) * | 2016-09-23 | 2021-02-24 | スタンレー電気株式会社 | Light transmission board, display device, signal device, and lighting device |
CN111933541A (en) * | 2020-08-10 | 2020-11-13 | 北京北方华创微电子装备有限公司 | Method and system for processing wafer in semiconductor equipment |
CN114202133A (en) | 2020-09-02 | 2022-03-18 | 长鑫存储技术有限公司 | Method for detecting process data, computer readable medium and electronic device |
CN112366249B (en) * | 2020-11-16 | 2023-10-20 | 理想万里晖半导体设备(上海)股份有限公司 | Solar cell manufacturing method with tracking function and tracking system used by solar cell manufacturing method |
TWI766599B (en) * | 2021-02-26 | 2022-06-01 | 昇陽國際半導體股份有限公司 | Wafer Regeneration Process |
US11442440B1 (en) * | 2021-03-24 | 2022-09-13 | Changxin Memory Technologies, Inc. | Method and apparatus of handling control wafer, method of testing by using control wafer |
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-
2005
- 2005-11-02 US US11/265,237 patent/US7657390B2/en active Active
-
2006
- 2006-10-31 JP JP2008539010A patent/JP2009521097A/en not_active Withdrawn
- 2006-10-31 KR KR1020087013348A patent/KR20080075140A/en not_active Application Discontinuation
- 2006-10-31 TW TW095140308A patent/TWI368931B/en not_active IP Right Cessation
- 2006-10-31 WO PCT/US2006/042702 patent/WO2007056025A2/en active Application Filing
- 2006-10-31 CN CN200680050321A patent/CN101632080A/en active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5432702A (en) * | 1994-06-17 | 1995-07-11 | Advanced Micro Devices Inc. | Bar code recipe selection system using workstation controllers |
JP2000206480A (en) * | 1999-01-14 | 2000-07-28 | Advanced Display Inc | Repair support apparatus for liquid crystal display device and method therefor |
Also Published As
Publication number | Publication date |
---|---|
KR20080075140A (en) | 2008-08-14 |
WO2007056025A2 (en) | 2007-05-18 |
US20070099310A1 (en) | 2007-05-03 |
TWI368931B (en) | 2012-07-21 |
TW200737286A (en) | 2007-10-01 |
CN101632080A (en) | 2010-01-20 |
JP2009521097A (en) | 2009-05-28 |
US7657390B2 (en) | 2010-02-02 |
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