WO2008016763A3 - Patterning and treatment methods for organic light emitting diode devices - Google Patents
Patterning and treatment methods for organic light emitting diode devices Download PDFInfo
- Publication number
- WO2008016763A3 WO2008016763A3 PCT/US2007/073101 US2007073101W WO2008016763A3 WO 2008016763 A3 WO2008016763 A3 WO 2008016763A3 US 2007073101 W US2007073101 W US 2007073101W WO 2008016763 A3 WO2008016763 A3 WO 2008016763A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- transfer
- emitting diode
- light emitting
- organic light
- patterning
- Prior art date
Links
- 238000000034 method Methods 0.000 title abstract 2
- 238000000059 patterning Methods 0.000 title 1
- 239000010410 layer Substances 0.000 abstract 4
- 238000006243 chemical reaction Methods 0.000 abstract 2
- 238000000137 annealing Methods 0.000 abstract 1
- 238000010276 construction Methods 0.000 abstract 1
- 238000011109 contamination Methods 0.000 abstract 1
- 239000011229 interlayer Substances 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 238000007669 thermal treatment Methods 0.000 abstract 1
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/50—Recording sheets characterised by the coating used to improve ink, dye or pigment receptivity, e.g. for ink-jet or thermal dye transfer recording
- B41M5/52—Macromolecular coatings
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/20—Duplicating or marking methods; Sheet materials for use therein using electric current
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M7/00—After-treatment of prints, e.g. heating, irradiating, setting of the ink, protection of the printed stock
- B41M7/0081—After-treatment of prints, e.g. heating, irradiating, setting of the ink, protection of the printed stock using electromagnetic radiation or waves, e.g. ultraviolet radiation, electron beams
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M7/00—After-treatment of prints, e.g. heating, irradiating, setting of the ink, protection of the printed stock
- B41M7/009—After-treatment of prints, e.g. heating, irradiating, setting of the ink, protection of the printed stock using thermal means, e.g. infrared radiation, heat
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/34—Imagewise removal by selective transfer, e.g. peeling away
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/18—Deposition of organic active material using non-liquid printing techniques, e.g. thermal transfer printing from a donor sheet
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/40—Thermal treatment, e.g. annealing in the presence of a solvent vapour
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/549—Organic PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/146—Laser beam
Abstract
A thermal transfer donor element is provided which can include a support, light-to-heat conversion layer, interlayer, and transfer layer. When the donor element is brought into contact with a receptor and imagewise irradiated, an image is obtained which is free from contamination by the light-to-heat conversion layer. In order to enhance the lifetimes of the transferred material, thermal treatments such as annealing are applied to the receptor before transfer, to the transfer layer after transfer, or a combination of them. The construction and process of the donor element is useful in making colored images including applications such as color proofs, color filter elements, and organic light emitting diode displays and devices.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009522915A JP2009545853A (en) | 2006-07-31 | 2007-07-10 | Patterning and processing methods for organic light emitting diode devices |
KR1020097001948A KR101333137B1 (en) | 2006-07-31 | 2007-07-10 | Patterning and treatment methods for organic light emitting diode devices |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/461,194 | 2006-07-31 | ||
US11/461,194 US7670450B2 (en) | 2006-07-31 | 2006-07-31 | Patterning and treatment methods for organic light emitting diode devices |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2008016763A2 WO2008016763A2 (en) | 2008-02-07 |
WO2008016763A3 true WO2008016763A3 (en) | 2008-03-27 |
Family
ID=38986712
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2007/073101 WO2008016763A2 (en) | 2006-07-31 | 2007-07-10 | Patterning and treatment methods for organic light emitting diode devices |
Country Status (5)
Country | Link |
---|---|
US (1) | US7670450B2 (en) |
JP (2) | JP2009545853A (en) |
KR (1) | KR101333137B1 (en) |
TW (1) | TWI423494B (en) |
WO (1) | WO2008016763A2 (en) |
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KR101318517B1 (en) * | 2008-05-30 | 2013-10-16 | 코오롱인더스트리 주식회사 | Film type transfer material |
KR102050029B1 (en) * | 2011-08-26 | 2019-11-29 | 삼성디스플레이 주식회사 | Donor substrate, method of manufacturing a donor substrate, organic light emitting display device and method of manufacturing an organic light emitting display device |
KR20130023643A (en) * | 2011-08-29 | 2013-03-08 | 삼성디스플레이 주식회사 | Fabricating apparatus for an organic light emitting display panel and fabricating method of the organic light emitting display panel using the same |
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EP2807685A1 (en) * | 2012-01-27 | 2014-12-03 | Wake Forest University | Electroluminescent devices and applications thereof |
US8846981B2 (en) | 2012-01-30 | 2014-09-30 | Southern Lithoplate, Inc. | 1,1-di[(alkylphenoxy)ethoxy]cyclohexanes |
US8632943B2 (en) | 2012-01-30 | 2014-01-21 | Southern Lithoplate, Inc. | Near-infrared sensitive, positive-working, image forming composition and photographic element containing a 1,1-di[(alkylphenoxy)ethoxy]cyclohexane |
KR101904107B1 (en) * | 2012-02-20 | 2018-10-05 | 엘지디스플레이 주식회사 | Donor film and method for forming pattern in flat panel display device using the same |
KR102175754B1 (en) | 2013-01-24 | 2020-11-06 | 도레이첨단소재 주식회사 | Transparent doner film for laser-induced thermal imazing |
KR102107661B1 (en) | 2013-01-30 | 2020-05-07 | 도레이첨단소재 주식회사 | Doner film for laser induced thermal imaging |
KR102081209B1 (en) * | 2013-03-26 | 2020-02-26 | 삼성디스플레이 주식회사 | Organic light emitting display device and manufacturing method thereof, and donor substrate, donor substrate set using manufacturing organic light emitting display device thereof |
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KR20190103691A (en) | 2018-02-28 | 2019-09-05 | 도레이첨단소재 주식회사 | Laser induced thermal transfer film |
KR102095544B1 (en) | 2018-03-09 | 2020-03-31 | 도레이첨단소재 주식회사 | Laser induced thermal transfer film |
CN110148678A (en) * | 2019-04-29 | 2019-08-20 | 深圳市华星光电半导体显示技术有限公司 | The production method of auxiliary electrode transfer organization and display panel |
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JP2023081173A (en) | 2021-11-30 | 2023-06-09 | 信越化学工業株式会社 | Laser photothermal transfer film |
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2006
- 2006-07-31 US US11/461,194 patent/US7670450B2/en active Active
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2007
- 2007-07-10 WO PCT/US2007/073101 patent/WO2008016763A2/en active Application Filing
- 2007-07-10 JP JP2009522915A patent/JP2009545853A/en active Pending
- 2007-07-10 KR KR1020097001948A patent/KR101333137B1/en active IP Right Grant
- 2007-07-25 TW TW096127111A patent/TWI423494B/en active
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2013
- 2013-01-11 JP JP2013003083A patent/JP5558594B2/en active Active
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US6186067B1 (en) * | 1999-09-30 | 2001-02-13 | Presstek, Inc. | Infrared laser-imageable lithographic printing members and methods of preparing and imaging such printing members |
US6921614B2 (en) * | 2001-05-11 | 2005-07-26 | E. I. Du Pont De Nemours And Company | High resolution laserable assemblages for laser-induced thermal image transfer |
Also Published As
Publication number | Publication date |
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KR20090034364A (en) | 2009-04-07 |
KR101333137B1 (en) | 2013-11-26 |
TWI423494B (en) | 2014-01-11 |
TW200821746A (en) | 2008-05-16 |
JP5558594B2 (en) | 2014-07-23 |
JP2013127971A (en) | 2013-06-27 |
US20080026306A1 (en) | 2008-01-31 |
US7670450B2 (en) | 2010-03-02 |
JP2009545853A (en) | 2009-12-24 |
WO2008016763A2 (en) | 2008-02-07 |
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