WO2008051351A3 - Sacrificial spacer process and resultant structure for mems support structure - Google Patents

Sacrificial spacer process and resultant structure for mems support structure Download PDF

Info

Publication number
WO2008051351A3
WO2008051351A3 PCT/US2007/021046 US2007021046W WO2008051351A3 WO 2008051351 A3 WO2008051351 A3 WO 2008051351A3 US 2007021046 W US2007021046 W US 2007021046W WO 2008051351 A3 WO2008051351 A3 WO 2008051351A3
Authority
WO
WIPO (PCT)
Prior art keywords
mems
movable mirror
support structure
sidewall spacer
sacrificial spacer
Prior art date
Application number
PCT/US2007/021046
Other languages
French (fr)
Other versions
WO2008051351A2 (en
Inventor
Ren Gregory David U
Original Assignee
Qualcomm Mems Technologies Inc
Ren Gregory David U
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Qualcomm Mems Technologies Inc, Ren Gregory David U filed Critical Qualcomm Mems Technologies Inc
Publication of WO2008051351A2 publication Critical patent/WO2008051351A2/en
Publication of WO2008051351A3 publication Critical patent/WO2008051351A3/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B3/00—Devices comprising flexible or deformable elements, e.g. comprising elastic tongues or membranes
    • B81B3/0064—Constitution or structural means for improving or controlling the physical properties of a device
    • B81B3/0067—Mechanical properties
    • B81B3/0072—For controlling internal stress or strain in moving or flexible elements, e.g. stress compensating layers
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/001—Optical devices or arrangements for the control of light using movable or deformable optical elements based on interference in an adjustable optical cavity
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2201/00—Specific applications of microelectromechanical systems
    • B81B2201/04—Optical MEMS
    • B81B2201/047—Optical MEMS not provided for in B81B2201/042 - B81B2201/045
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2203/00—Basic microelectromechanical structures
    • B81B2203/01—Suspended structures, i.e. structures allowing a movement
    • B81B2203/0109—Bridges
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2203/00—Basic microelectromechanical structures
    • B81B2203/05—Type of movement
    • B81B2203/053—Translation according to an axis perpendicular to the substrate
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C2201/00—Manufacture or treatment of microstructural devices or systems
    • B81C2201/01—Manufacture or treatment of microstructural devices or systems in or on a substrate
    • B81C2201/0161—Controlling physical properties of the material
    • B81C2201/0163—Controlling internal stress of deposited layers
    • B81C2201/017—Methods for controlling internal stress of deposited layers not provided for in B81C2201/0164 - B81C2201/0169

Abstract

Disclosed is a microelectromechanical systems (MEMS) device and method of manufacturing the same. MEMS such as an interferometric modulator include a sidewall spacer (844) formed adjacent to a movable mirror (840). The sidewall spacer (844) may be a sacrificial spacer that is removed during fabrication, or it may remain in the final product. Increased clearance (885) is provided between the movable mirror (840) and a support structure (880) during actuation of the movable mirror (840), thereby avoiding contact during operation of the interferometric modulator. The deformable layer (870) may be deposited in a more continuous fashion over the contour of a lower layer as determined by the contour of the sidewall spacer (844), resulting in a stronger and more resilient deformable layer (870).
PCT/US2007/021046 2006-10-19 2007-09-28 Sacrificial spacer process and resultant structure for mems support structure WO2008051351A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/583,575 US7545552B2 (en) 2006-10-19 2006-10-19 Sacrificial spacer process and resultant structure for MEMS support structure
US11/583,575 2006-10-19

Publications (2)

Publication Number Publication Date
WO2008051351A2 WO2008051351A2 (en) 2008-05-02
WO2008051351A3 true WO2008051351A3 (en) 2008-07-03

Family

ID=39278310

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2007/021046 WO2008051351A2 (en) 2006-10-19 2007-09-28 Sacrificial spacer process and resultant structure for mems support structure

Country Status (2)

Country Link
US (1) US7545552B2 (en)
WO (1) WO2008051351A2 (en)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101423321B1 (en) * 2005-07-22 2014-07-30 퀄컴 엠이엠에스 테크놀로지스, 인크. Electomechanical devices having support structures and methods of fabricating the same
US7527998B2 (en) 2006-06-30 2009-05-05 Qualcomm Mems Technologies, Inc. Method of manufacturing MEMS devices providing air gap control
US7706042B2 (en) 2006-12-20 2010-04-27 Qualcomm Mems Technologies, Inc. MEMS device and interconnects for same
US20080180783A1 (en) * 2007-01-25 2008-07-31 Li-Ming Wang Critical dimension control for photolithography for microelectromechanical systems devices
US20080181159A1 (en) * 2007-01-25 2008-07-31 Metzler Benjamin T Method and apparatus for reliable multicast communication over wireless network
US7643202B2 (en) 2007-05-09 2010-01-05 Qualcomm Mems Technologies, Inc. Microelectromechanical system having a dielectric movable membrane and a mirror
US7719752B2 (en) 2007-05-11 2010-05-18 Qualcomm Mems Technologies, Inc. MEMS structures, methods of fabricating MEMS components on separate substrates and assembly of same
US7625825B2 (en) * 2007-06-14 2009-12-01 Qualcomm Mems Technologies, Inc. Method of patterning mechanical layer for MEMS structures
US8068268B2 (en) 2007-07-03 2011-11-29 Qualcomm Mems Technologies, Inc. MEMS devices having improved uniformity and methods for making them
US7863079B2 (en) 2008-02-05 2011-01-04 Qualcomm Mems Technologies, Inc. Methods of reducing CD loss in a microelectromechanical device
US8710601B2 (en) * 2009-11-19 2014-04-29 United Microelectronics Corp. MEMS structure and method for making the same
US8547626B2 (en) 2010-03-25 2013-10-01 Qualcomm Mems Technologies, Inc. Mechanical layer and methods of shaping the same
KR20130100232A (en) 2010-04-09 2013-09-10 퀄컴 엠이엠에스 테크놀로지스, 인크. Mechanical layer of an electromechanical device and methods of forming the same
EP2558776B1 (en) 2010-04-16 2022-09-14 Azumo, Inc. Front illumination device comprising a film-based lightguide
MX2012012033A (en) 2010-04-16 2013-05-20 Flex Lighting Ii Llc Illumination device comprising a film-based lightguide.
US8963159B2 (en) 2011-04-04 2015-02-24 Qualcomm Mems Technologies, Inc. Pixel via and methods of forming the same
US9134527B2 (en) 2011-04-04 2015-09-15 Qualcomm Mems Technologies, Inc. Pixel via and methods of forming the same
US8659816B2 (en) 2011-04-25 2014-02-25 Qualcomm Mems Technologies, Inc. Mechanical layer and methods of making the same
US8643140B2 (en) 2011-07-11 2014-02-04 United Microelectronics Corp. Suspended beam for use in MEMS device
US8525354B2 (en) 2011-10-13 2013-09-03 United Microelectronics Corporation Bond pad structure and fabricating method thereof
JP5831905B2 (en) * 2012-02-06 2015-12-09 エヌ・ティ・ティ・アドバンステクノロジ株式会社 Fine element and manufacturing method thereof
US8981501B2 (en) 2013-04-25 2015-03-17 United Microelectronics Corp. Semiconductor device and method of forming the same
CN107799386B (en) 2016-09-06 2020-04-28 中芯国际集成电路制造(北京)有限公司 Semiconductor device and method for manufacturing the same
US20220365339A1 (en) * 2021-05-11 2022-11-17 II-VI Delaware, Inc Optical Package Having Tunable Filter

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5497262A (en) * 1994-07-29 1996-03-05 Texas Instruments Incorporated Support posts for micro-mechanical devices
US20040191937A1 (en) * 2003-03-28 2004-09-30 Patel Satyadev R. Barrier layers for microelectromechanical systems
US20050078348A1 (en) * 2003-09-30 2005-04-14 Wen-Jian Lin Structure of a micro electro mechanical system and the manufacturing method thereof
US20060066936A1 (en) * 2004-09-27 2006-03-30 Clarence Chui Interferometric optical modulator using filler material and method

Family Cites Families (152)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3728030A (en) * 1970-06-22 1973-04-17 Cary Instruments Polarization interferometer
DE2336930A1 (en) 1973-07-20 1975-02-06 Battelle Institut E V INFRARED MODULATOR (II.)
NL8001281A (en) 1980-03-04 1981-10-01 Philips Nv DISPLAY DEVICE.
US4377324A (en) * 1980-08-04 1983-03-22 Honeywell Inc. Graded index Fabry-Perot optical filter device
NL8200354A (en) 1982-02-01 1983-09-01 Philips Nv PASSIVE DISPLAY.
US4482213A (en) 1982-11-23 1984-11-13 Texas Instruments Incorporated Perimeter seal reinforcement holes for plastic LCDs
US4710732A (en) 1984-07-31 1987-12-01 Texas Instruments Incorporated Spatial light modulator and method
US4566935A (en) * 1984-07-31 1986-01-28 Texas Instruments Incorporated Spatial light modulator and method
US4662746A (en) 1985-10-30 1987-05-05 Texas Instruments Incorporated Spatial light modulator and method
US5172262A (en) 1985-10-30 1992-12-15 Texas Instruments Incorporated Spatial light modulator and method
GB2186708B (en) 1985-11-26 1990-07-11 Sharp Kk A variable interferometric device and a process for the production of the same
US5835255A (en) 1986-04-23 1998-11-10 Etalon, Inc. Visible spectrum modulator arrays
GB8610129D0 (en) 1986-04-25 1986-05-29 Secr Defence Electro-optical device
US4786128A (en) 1986-12-02 1988-11-22 Quantum Diagnostics, Ltd. Device for modulating and reflecting electromagnetic radiation employing electro-optic layer having a variable index of refraction
NL8701138A (en) 1987-05-13 1988-12-01 Philips Nv ELECTROSCOPIC IMAGE DISPLAY.
US4900136A (en) * 1987-08-11 1990-02-13 North American Philips Corporation Method of metallizing silica-containing gel and solid state light modulator incorporating the metallized gel
US4956619A (en) 1988-02-19 1990-09-11 Texas Instruments Incorporated Spatial light modulator
US5022745A (en) 1989-09-07 1991-06-11 Massachusetts Institute Of Technology Electrostatically deformable single crystal dielectrically coated mirror
US4954789A (en) 1989-09-28 1990-09-04 Texas Instruments Incorporated Spatial light modulator
US5124834A (en) 1989-11-16 1992-06-23 General Electric Company Transferrable, self-supporting pellicle for elastomer light valve displays and method for making the same
GB9012099D0 (en) 1990-05-31 1990-07-18 Kodak Ltd Optical article for multicolour imaging
US5083857A (en) * 1990-06-29 1992-01-28 Texas Instruments Incorporated Multi-level deformable mirror device
US5099353A (en) * 1990-06-29 1992-03-24 Texas Instruments Incorporated Architecture and process for integrating DMD with control circuit substrates
US5526688A (en) 1990-10-12 1996-06-18 Texas Instruments Incorporated Digital flexure beam accelerometer and method
US5192395A (en) * 1990-10-12 1993-03-09 Texas Instruments Incorporated Method of making a digital flexure beam accelerometer
US5044736A (en) 1990-11-06 1991-09-03 Motorola, Inc. Configurable optical filter or display
US5233459A (en) 1991-03-06 1993-08-03 Massachusetts Institute Of Technology Electric display device
US5142414A (en) 1991-04-22 1992-08-25 Koehler Dale R Electrically actuatable temporal tristimulus-color device
US5226099A (en) 1991-04-26 1993-07-06 Texas Instruments Incorporated Digital micromirror shutter device
US5287215A (en) * 1991-07-17 1994-02-15 Optron Systems, Inc. Membrane light modulation systems
US5168406A (en) 1991-07-31 1992-12-01 Texas Instruments Incorporated Color deformable mirror device and method for manufacture
US5233456A (en) 1991-12-20 1993-08-03 Texas Instruments Incorporated Resonant mirror and method of manufacture
US5231532A (en) 1992-02-05 1993-07-27 Texas Instruments Incorporated Switchable resonant filter for optical radiation
US5212582A (en) 1992-03-04 1993-05-18 Texas Instruments Incorporated Electrostatically controlled beam steering device and method
US5312513A (en) * 1992-04-03 1994-05-17 Texas Instruments Incorporated Methods of forming multiple phase light modulators
US5311360A (en) 1992-04-28 1994-05-10 The Board Of Trustees Of The Leland Stanford, Junior University Method and apparatus for modulating a light beam
TW245772B (en) * 1992-05-19 1995-04-21 Akzo Nv
JPH06214169A (en) * 1992-06-08 1994-08-05 Texas Instr Inc <Ti> Controllable optical and periodic surface filter
US5347377A (en) 1992-06-17 1994-09-13 Eastman Kodak Company Planar waveguide liquid crystal variable retarder
US5345328A (en) 1992-08-12 1994-09-06 Sandia Corporation Tandem resonator reflectance modulator
US5293272A (en) * 1992-08-24 1994-03-08 Physical Optics Corporation High finesse holographic fabry-perot etalon and method of fabricating
US5312512A (en) 1992-10-23 1994-05-17 Ncr Corporation Global planarization using SOG and CMP
US6674562B1 (en) * 1994-05-05 2004-01-06 Iridigm Display Corporation Interferometric modulation of radiation
US5559358A (en) 1993-05-25 1996-09-24 Honeywell Inc. Opto-electro-mechanical device or filter, process for making, and sensors made therefrom
US6199874B1 (en) * 1993-05-26 2001-03-13 Cornell Research Foundation Inc. Microelectromechanical accelerometer for automotive applications
US5489952A (en) * 1993-07-14 1996-02-06 Texas Instruments Incorporated Method and device for multi-format television
US5673139A (en) 1993-07-19 1997-09-30 Medcom, Inc. Microelectromechanical television scanning device and method for making the same
US5526172A (en) 1993-07-27 1996-06-11 Texas Instruments Incorporated Microminiature, monolithic, variable electrical signal processor and apparatus including same
US5629790A (en) 1993-10-18 1997-05-13 Neukermans; Armand P. Micromachined torsional scanner
US5517347A (en) 1993-12-01 1996-05-14 Texas Instruments Incorporated Direct view deformable mirror device
US5583688A (en) 1993-12-21 1996-12-10 Texas Instruments Incorporated Multi-level digital micromirror device
US5500761A (en) * 1994-01-27 1996-03-19 At&T Corp. Micromechanical modulator
US6710908B2 (en) * 1994-05-05 2004-03-23 Iridigm Display Corporation Controlling micro-electro-mechanical cavities
US7460291B2 (en) * 1994-05-05 2008-12-02 Idc, Llc Separable modulator
US6680792B2 (en) * 1994-05-05 2004-01-20 Iridigm Display Corporation Interferometric modulation of radiation
US7550794B2 (en) * 2002-09-20 2009-06-23 Idc, Llc Micromechanical systems device comprising a displaceable electrode and a charge-trapping layer
US7297471B1 (en) * 2003-04-15 2007-11-20 Idc, Llc Method for manufacturing an array of interferometric modulators
US6040937A (en) * 1994-05-05 2000-03-21 Etalon, Inc. Interferometric modulation
US20010003487A1 (en) * 1996-11-05 2001-06-14 Mark W. Miles Visible spectrum modulator arrays
US5454906A (en) 1994-06-21 1995-10-03 Texas Instruments Inc. Method of providing sacrificial spacer for micro-mechanical devices
WO1996008031A1 (en) 1994-09-02 1996-03-14 Dabbaj Rad H Reflective light valve modulator
US5703710A (en) 1994-09-09 1997-12-30 Deacon Research Method for manipulating optical energy using poled structure
US5619059A (en) * 1994-09-28 1997-04-08 National Research Council Of Canada Color deformable mirror device having optical thin film interference color coatings
DE4437259C1 (en) 1994-10-18 1995-10-19 Siemens Ag Micro-mechanical electrostatic relay with spiral contact spring bars
US5650881A (en) 1994-11-02 1997-07-22 Texas Instruments Incorporated Support post architecture for micromechanical devices
US5552924A (en) 1994-11-14 1996-09-03 Texas Instruments Incorporated Micromechanical device having an improved beam
US5535047A (en) 1995-04-18 1996-07-09 Texas Instruments Incorporated Active yoke hidden hinge digital micromirror device
US5784190A (en) 1995-04-27 1998-07-21 John M. Baker Electro-micro-mechanical shutters on transparent substrates
US6046840A (en) * 1995-06-19 2000-04-04 Reflectivity, Inc. Double substrate reflective spatial light modulator with self-limiting micro-mechanical elements
US5578976A (en) 1995-06-22 1996-11-26 Rockwell International Corporation Micro electromechanical RF switch
US5739945A (en) * 1995-09-29 1998-04-14 Tayebati; Parviz Electrically tunable optical filter utilizing a deformable multi-layer mirror
US5661591A (en) 1995-09-29 1997-08-26 Texas Instruments Incorporated Optical switch having an analog beam for steering light
US5740150A (en) * 1995-11-24 1998-04-14 Kabushiki Kaisha Toshiba Galvanomirror and optical disk drive using the same
US5825528A (en) 1995-12-26 1998-10-20 Lucent Technologies Inc. Phase-mismatched fabry-perot cavity micromechanical modulator
JP3799092B2 (en) * 1995-12-29 2006-07-19 アジレント・テクノロジーズ・インク Light modulation device and display device
US5771321A (en) 1996-01-04 1998-06-23 Massachusetts Institute Of Technology Micromechanical optical switch and flat panel display
US5638946A (en) 1996-01-11 1997-06-17 Northeastern University Micromechanical switch with insulated switch contact
US5751469A (en) 1996-02-01 1998-05-12 Lucent Technologies Inc. Method and apparatus for an improved micromechanical modulator
US5783864A (en) 1996-06-05 1998-07-21 Advanced Micro Devices, Inc. Multilevel interconnect structure of an integrated circuit having air gaps and pillars separating levels of interconnect
US5710656A (en) * 1996-07-30 1998-01-20 Lucent Technologies Inc. Micromechanical optical modulator having a reduced-mass composite membrane
US5838484A (en) 1996-08-19 1998-11-17 Lucent Technologies Inc. Micromechanical optical modulator with linear operating characteristic
US5786927A (en) 1997-03-12 1998-07-28 Lucent Technologies Inc. Gas-damped micromechanical structure
US5768009A (en) 1997-04-18 1998-06-16 E-Beam Light valve target comprising electrostatically-repelled micro-mirrors
US6104525A (en) 1997-04-29 2000-08-15 Daewoo Electronics Co., Ltd. Array of thin film actuated mirrors and method for the manufacture thereof
DE69806846T2 (en) * 1997-05-08 2002-12-12 Texas Instruments Inc Improvements for spatial light modulators
US5808780A (en) 1997-06-09 1998-09-15 Texas Instruments Incorporated Non-contacting micromechanical optical switch
US5914803A (en) 1997-07-01 1999-06-22 Daewoo Electronics Co., Ltd. Thin film actuated mirror array in an optical projection system and method for manufacturing the same
US5867302A (en) * 1997-08-07 1999-02-02 Sandia Corporation Bistable microelectromechanical actuator
US6031653A (en) * 1997-08-28 2000-02-29 California Institute Of Technology Low-cost thin-metal-film interference filters
US5978127A (en) 1997-09-09 1999-11-02 Zilog, Inc. Light phase grating device
US5972193A (en) 1997-10-10 1999-10-26 Industrial Technology Research Institute Method of manufacturing a planar coil using a transparency substrate
US6028690A (en) * 1997-11-26 2000-02-22 Texas Instruments Incorporated Reduced micromirror mirror gaps for improved contrast ratio
US5920421A (en) 1997-12-10 1999-07-06 Daewoo Electronics Co., Ltd. Thin film actuated mirror array in an optical projection system and method for manufacturing the same
US6438149B1 (en) * 1998-06-26 2002-08-20 Coretek, Inc. Microelectromechanically tunable, confocal, vertical cavity surface emitting laser and fabry-perot filter
US6195196B1 (en) * 1998-03-13 2001-02-27 Fuji Photo Film Co., Ltd. Array-type exposing device and flat type display incorporating light modulator and driving method thereof
US6097145A (en) 1998-04-27 2000-08-01 Copytele, Inc. Aerogel-based phase transition flat panel display
US5943158A (en) 1998-05-05 1999-08-24 Lucent Technologies Inc. Micro-mechanical, anti-reflection, switched optical modulator array and fabrication method
US6147790A (en) 1998-06-02 2000-11-14 Texas Instruments Incorporated Spring-ring micromechanical device
US6100477A (en) 1998-07-17 2000-08-08 Texas Instruments Incorporated Recessed etch RF micro-electro-mechanical switch
US5943155A (en) 1998-08-12 1999-08-24 Lucent Techonolgies Inc. Mars optical modulators
US6215221B1 (en) * 1998-12-29 2001-04-10 Honeywell International Inc. Electrostatic/pneumatic actuators for active surfaces
US6358021B1 (en) * 1998-12-29 2002-03-19 Honeywell International Inc. Electrostatic actuators for active surfaces
US6537427B1 (en) * 1999-02-04 2003-03-25 Micron Technology, Inc. Deposition of smooth aluminum films
JP4787412B2 (en) * 1999-03-30 2011-10-05 シチズンホールディングス株式会社 Method for forming thin film substrate and thin film substrate formed by the method
JP3592136B2 (en) * 1999-06-04 2004-11-24 キヤノン株式会社 Liquid discharge head, method of manufacturing the same, and method of manufacturing microelectromechanical device
US6201633B1 (en) * 1999-06-07 2001-03-13 Xerox Corporation Micro-electromechanical based bistable color display sheets
US6351329B1 (en) * 1999-10-08 2002-02-26 Lucent Technologies Inc. Optical attenuator
US6960305B2 (en) * 1999-10-26 2005-11-01 Reflectivity, Inc Methods for forming and releasing microelectromechanical structures
US6747775B2 (en) * 2000-03-20 2004-06-08 Np Photonics, Inc. Detunable Fabry-Perot interferometer and an add/drop multiplexer using the same
US6677225B1 (en) * 2000-07-14 2004-01-13 Zyvex Corporation System and method for constraining totally released microcomponents
US6795605B1 (en) * 2000-08-01 2004-09-21 Cheetah Omni, Llc Micromechanical optical switch
JP4304852B2 (en) * 2000-09-04 2009-07-29 コニカミノルタホールディングス株式会社 Non-flat liquid crystal display element and method for manufacturing the same
US6522801B1 (en) * 2000-10-10 2003-02-18 Agere Systems Inc. Micro-electro-optical mechanical device having an implanted dopant included therein and a method of manufacture therefor
US7196599B2 (en) * 2000-12-11 2007-03-27 Dabbaj Rad H Electrostatic device
WO2002058089A1 (en) * 2001-01-19 2002-07-25 Massachusetts Institute Of Technology Bistable actuation techniques, mechanisms, and applications
JP3852306B2 (en) * 2001-07-06 2006-11-29 ソニー株式会社 Method for manufacturing MEMS element, method for manufacturing GLV device, and method for manufacturing laser display
JP3740444B2 (en) * 2001-07-11 2006-02-01 キヤノン株式会社 Optical deflector, optical equipment using the same, torsional oscillator
KR100452112B1 (en) * 2001-07-18 2004-10-12 한국과학기술원 Electrostatic Actuator
US7057251B2 (en) * 2001-07-20 2006-06-06 Reflectivity, Inc MEMS device made of transition metal-dielectric oxide materials
US20030053078A1 (en) * 2001-09-17 2003-03-20 Mark Missey Microelectromechanical tunable fabry-perot wavelength monitor with thermal actuators
US6940636B2 (en) * 2001-09-20 2005-09-06 Analog Devices, Inc. Optical switching apparatus and method of assembling same
US6791735B2 (en) * 2002-01-09 2004-09-14 The Regents Of The University Of California Differentially-driven MEMS spatial light modulator
US6794119B2 (en) * 2002-02-12 2004-09-21 Iridigm Display Corporation Method for fabricating a structure for a microelectromechanical systems (MEMS) device
JP3801099B2 (en) * 2002-06-04 2006-07-26 株式会社デンソー Tunable filter, manufacturing method thereof, and optical switching device using the same
US6822798B2 (en) * 2002-08-09 2004-11-23 Optron Systems, Inc. Tunable optical filter
US6825968B2 (en) * 2002-10-11 2004-11-30 Exajoule, Llc Micromirror systems with electrodes configured for sequential mirror attraction
FR2846318B1 (en) * 2002-10-24 2005-01-07 Commissariat Energie Atomique INTEGRATED ELECTROMECHANICAL MICROSTRUCTURE HAVING MEANS FOR ADJUSTING THE PRESSURE IN A SEALED CAVITY AND A METHOD OF ADJUSTING THE PRESSURE
US6747785B2 (en) * 2002-10-24 2004-06-08 Hewlett-Packard Development Company, L.P. MEMS-actuated color light modulator and methods
TWI289708B (en) * 2002-12-25 2007-11-11 Qualcomm Mems Technologies Inc Optical interference type color display
US6987432B2 (en) * 2003-04-16 2006-01-17 Robert Bosch Gmbh Temperature compensation for silicon MEMS resonator
TW567355B (en) * 2003-04-21 2003-12-21 Prime View Int Co Ltd An interference display cell and fabrication method thereof
US7218438B2 (en) * 2003-04-30 2007-05-15 Hewlett-Packard Development Company, L.P. Optical electronic device with partial reflector layer
FR2855908B1 (en) * 2003-06-06 2005-08-26 Soitec Silicon On Insulator METHOD FOR OBTAINING A STRUCTURE COMPRISING AT LEAST ONE SUBSTRATE AND AN ULTRAMINO LAYER
US20070064760A1 (en) * 2003-06-12 2007-03-22 Soren Kragh Optical amplification in miniaturized polymer cavity resonators
US7173314B2 (en) * 2003-08-13 2007-02-06 Hewlett-Packard Development Company, L.P. Storage device having a probe and a storage cell with moveable parts
TW200506479A (en) * 2003-08-15 2005-02-16 Prime View Int Co Ltd Color changeable pixel for an interference display
TWI231865B (en) * 2003-08-26 2005-05-01 Prime View Int Co Ltd An interference display cell and fabrication method thereof
JP3979982B2 (en) * 2003-08-29 2007-09-19 シャープ株式会社 Interferometric modulator and display device
TWI232333B (en) * 2003-09-03 2005-05-11 Prime View Int Co Ltd Display unit using interferometric modulation and manufacturing method thereof
US6982820B2 (en) * 2003-09-26 2006-01-03 Prime View International Co., Ltd. Color changeable pixel
US7329495B2 (en) * 2004-06-09 2008-02-12 Board Of Regents, The University Of Texas System Mutations in KIT confer imatinib resistance in gastrointestinal stromal tumors
CA2575314A1 (en) * 2004-07-29 2006-02-09 Idc, Llc System and method for micro-electromechanical operating of an interferometric modulator
US7273693B2 (en) * 2004-07-30 2007-09-25 Hewlett-Packard Development Company, L.P. Method for forming a planar mirror using a sacrificial oxide
US7710636B2 (en) * 2004-09-27 2010-05-04 Qualcomm Mems Technologies, Inc. Systems and methods using interferometric optical modulators and diffusers
US20060066932A1 (en) * 2004-09-27 2006-03-30 Clarence Chui Method of selective etching using etch stop layer
US7327510B2 (en) * 2004-09-27 2008-02-05 Idc, Llc Process for modifying offset voltage characteristics of an interferometric modulator
US7161730B2 (en) * 2004-09-27 2007-01-09 Idc, Llc System and method for providing thermal compensation for an interferometric modulator display
JP2009503565A (en) * 2005-07-22 2009-01-29 クアルコム，インコーポレイテッド Support structure for MEMS device and method thereof
EP2495212A3 (en) * 2005-07-22 2012-10-31 QUALCOMM MEMS Technologies, Inc. Mems devices having support structures and methods of fabricating the same
KR101423321B1 (en) * 2005-07-22 2014-07-30 퀄컴 엠이엠에스 테크놀로지스, 인크. Electomechanical devices having support structures and methods of fabricating the same
US7417784B2 (en) * 2006-04-19 2008-08-26 Qualcomm Mems Technologies, Inc. Microelectromechanical device and method utilizing a porous surface
US7321457B2 (en) * 2006-06-01 2008-01-22 Qualcomm Incorporated Process and structure for fabrication of MEMS device having isolated edge posts

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5497262A (en) * 1994-07-29 1996-03-05 Texas Instruments Incorporated Support posts for micro-mechanical devices
US20040191937A1 (en) * 2003-03-28 2004-09-30 Patel Satyadev R. Barrier layers for microelectromechanical systems
US20050078348A1 (en) * 2003-09-30 2005-04-14 Wen-Jian Lin Structure of a micro electro mechanical system and the manufacturing method thereof
US20060066936A1 (en) * 2004-09-27 2006-03-30 Clarence Chui Interferometric optical modulator using filler material and method

Also Published As

Publication number Publication date
WO2008051351A2 (en) 2008-05-02
US7545552B2 (en) 2009-06-09
US20080094686A1 (en) 2008-04-24

Similar Documents

Publication Publication Date Title
WO2008051351A3 (en) Sacrificial spacer process and resultant structure for mems support structure
WO2007126844A3 (en) Non-planar surface structures and process for microelectromechanical systems
WO2007126919A3 (en) Non-planar surface structures and process for microelectromechanical systems
WO2007123820A3 (en) Non-planar surface structures and process for microelectromechanical systems
TW200624859A (en) Mirror and mirror layer for optical modulator and method
TW200717027A (en) Support structure for MEMS device and methods therefor
TW200739978A (en) MEMS process and device
TW200744941A (en) Microelectromechanical device and method utilizing nanoparticles
WO2005044721A8 (en) Mems devices with unreleased thin film components
WO2003042721A3 (en) Trilayered beam mems device and related methods
WO2009036215A3 (en) Etching processes used in mems production
WO2007120886A3 (en) Microelectromechanical device and method utilizing a porous surface
WO2002096796A3 (en) Membrane for micro-electro-mechanical switch, and methods of making and using it
JP2009505162A5 (en)
WO2004055885A3 (en) Encapsulation of mems devices using pillar-supported caps
WO2008039372A3 (en) Assembling and applying nano-electro-mechanical systems
WO2008008162A3 (en) Support structure for free-standing mems device and methods for forming the same
WO2007072408A3 (en) A mems resonator, a method of manufacturing thereof, and a mems oscillator
TW200627602A (en) Method and system for sealing a substrate
TW200713415A (en) MEMS devices having support structures with substantially vertical sidewalls and methods for fabricating the same
WO2011162950A3 (en) Planar cavity mems and related structures, methods of manufacture and design structures
WO2008124372A3 (en) Eliminate release etch attack by interface modification in sacrificial layers
WO2007078495A3 (en) Method of creating mems device cavities by a non-etching process
WO2010034552A3 (en) Micromechanical component with cap electrodes and method for the production thereof
ATE510795T1 (en) METHOD FOR PRODUCING AN ELECTROMECHANICAL MEMS COMPONENT IN A SINGLE CRYSTALLINE MATERIAL

Legal Events

Date Code Title Description
WWE Wipo information: entry into national phase

Ref document number: 2007839076

Country of ref document: EP

121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 07839076

Country of ref document: EP

Kind code of ref document: A2

DPE1 Request for preliminary examination filed after expiration of 19th month from priority date (pct application filed from 20040101)
NENP Non-entry into the national phase

Ref country code: DE