WO2008054549A3 - Solvent-enhanced wavelength-selective infrared laser vapor deposition of polymers - Google Patents

Solvent-enhanced wavelength-selective infrared laser vapor deposition of polymers Download PDF

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Publication number
WO2008054549A3
WO2008054549A3 PCT/US2007/013012 US2007013012W WO2008054549A3 WO 2008054549 A3 WO2008054549 A3 WO 2008054549A3 US 2007013012 W US2007013012 W US 2007013012W WO 2008054549 A3 WO2008054549 A3 WO 2008054549A3
Authority
WO
WIPO (PCT)
Prior art keywords
polymeric material
solvent
conductive polymeric
polymers
vapor deposition
Prior art date
Application number
PCT/US2007/013012
Other languages
French (fr)
Other versions
WO2008054549A9 (en
WO2008054549A2 (en
Inventor
Hee K Park
Stephen L Johnson
Richard F Haglund Jr
Original Assignee
Univ Vanderbilt
Hee K Park
Stephen L Johnson
Richard F Haglund Jr
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Univ Vanderbilt, Hee K Park, Stephen L Johnson, Richard F Haglund Jr filed Critical Univ Vanderbilt
Publication of WO2008054549A2 publication Critical patent/WO2008054549A2/en
Publication of WO2008054549A3 publication Critical patent/WO2008054549A3/en
Publication of WO2008054549A9 publication Critical patent/WO2008054549A9/en

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/60—Deposition of organic layers from vapour phase
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y10/00—Processes of additive manufacturing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y30/00—Apparatus for additive manufacturing; Details thereof or accessories therefor
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12—Organic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/164—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using vacuum deposition
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/06—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation
    • B05D3/068—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation using ionising radiations (gamma, X, electrons)
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
    • B05D5/12—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures to obtain a coating with specific electrical properties
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/10—Organic polymers or oligomers
    • H10K85/111—Organic polymers or oligomers comprising aromatic, heteroaromatic, or aryl chains, e.g. polyaniline, polyphenylene or polyphenylene vinylene
    • H10K85/113—Heteroaromatic compounds comprising sulfur or selene, e.g. polythiophene
    • H10K85/1135—Polyethylene dioxythiophene [PEDOT]; Derivatives thereof

Abstract

A method for depositing a conductive polymeric material that has a charge/hole- transport property onto a substrate. In one embodiment, the method comprises the steps of providing a solution having the conductive polymeric material, a first solvent element with a vibrational mode and a second solvent element with a vibrational mode; freezing the solution to form a target; directing light of a wavelength in the infrared region which is resonant with one of the vibrational mode of the first solvent element and the vibrational mode of the second solvent element to vaporize the target; vaporizing the conductive polymeric material in the target with the light without substantially changing the charge/hole-transport property of the conductive polymeric material; and depositing the vaporized conductive polymeric material on the substrate to form a film of the conductive polymeric material..
PCT/US2007/013012 2006-05-31 2007-05-31 Solvent-enhanced wavelength-selective infrared laser vapor deposition of polymers WO2008054549A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US44416506A 2006-05-31 2006-05-31
US11/444,165 2006-05-31

Publications (3)

Publication Number Publication Date
WO2008054549A2 WO2008054549A2 (en) 2008-05-08
WO2008054549A3 true WO2008054549A3 (en) 2008-06-26
WO2008054549A9 WO2008054549A9 (en) 2008-08-07

Family

ID=39344820

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2007/013012 WO2008054549A2 (en) 2006-05-31 2007-05-31 Solvent-enhanced wavelength-selective infrared laser vapor deposition of polymers

Country Status (2)

Country Link
TW (1) TW200815616A (en)
WO (1) WO2008054549A2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106297968B (en) * 2016-08-26 2018-01-09 中国科学院上海硅酸盐研究所 A kind of PEDOT films of high thickness high conductivity and preparation method thereof

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6025036A (en) * 1997-05-28 2000-02-15 The United States Of America As Represented By The Secretary Of The Navy Method of producing a film coating by matrix assisted pulsed laser deposition
US20020031151A1 (en) * 1999-05-26 2002-03-14 University Of Central Florida Multi-wavelengths infrared laser
US6692663B2 (en) * 2001-02-16 2004-02-17 Elecon, Inc. Compositions produced by solvent exchange methods and uses thereof
US6763042B2 (en) * 2001-12-14 2004-07-13 Evans & Sutherland Computer Corporation Apparatus and method for frequency conversion and mixing of laser light
US20050281948A1 (en) * 2004-06-17 2005-12-22 Eastman Kodak Company Vaporizing temperature sensitive materials
US6998156B2 (en) * 2002-01-29 2006-02-14 The United States Of America As Represented By The Secretary Of The Navy Deposition of thin films using an infrared laser

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6025036A (en) * 1997-05-28 2000-02-15 The United States Of America As Represented By The Secretary Of The Navy Method of producing a film coating by matrix assisted pulsed laser deposition
US20020031151A1 (en) * 1999-05-26 2002-03-14 University Of Central Florida Multi-wavelengths infrared laser
US6692663B2 (en) * 2001-02-16 2004-02-17 Elecon, Inc. Compositions produced by solvent exchange methods and uses thereof
US6763042B2 (en) * 2001-12-14 2004-07-13 Evans & Sutherland Computer Corporation Apparatus and method for frequency conversion and mixing of laser light
US6998156B2 (en) * 2002-01-29 2006-02-14 The United States Of America As Represented By The Secretary Of The Navy Deposition of thin films using an infrared laser
US20050281948A1 (en) * 2004-06-17 2005-12-22 Eastman Kodak Company Vaporizing temperature sensitive materials

Also Published As

Publication number Publication date
TW200815616A (en) 2008-04-01
WO2008054549A9 (en) 2008-08-07
WO2008054549A2 (en) 2008-05-08

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