WO2008111701A1 - Plasma analyzer - Google Patents

Plasma analyzer Download PDF

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Publication number
WO2008111701A1
WO2008111701A1 PCT/KR2007/001971 KR2007001971W WO2008111701A1 WO 2008111701 A1 WO2008111701 A1 WO 2008111701A1 KR 2007001971 W KR2007001971 W KR 2007001971W WO 2008111701 A1 WO2008111701 A1 WO 2008111701A1
Authority
WO
WIPO (PCT)
Prior art keywords
plasma
gas
spectrometer
case
sapphire tube
Prior art date
Application number
PCT/KR2007/001971
Other languages
French (fr)
Inventor
Dong Je Sung
Chan Hee Han
Byong Han Kim
Tae Hoon Kim
Byoung Sun Lee
Original Assignee
Newprotech Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Newprotech Co., Ltd. filed Critical Newprotech Co., Ltd.
Publication of WO2008111701A1 publication Critical patent/WO2008111701A1/en

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Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • G01N21/66—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light electrically excited, e.g. electroluminescence
    • G01N21/68—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light electrically excited, e.g. electroluminescence using high frequency electric fields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge

Definitions

  • the present invention relates to a plasma analyzer comprising a plasma source, a spectrometer, and an operation system which are disposed in a block form as a single unit for its easy installation, disassembly, movement, and operation.
  • the malfunction and the cause of the malfunction are detected via materials used for the process and the post-use residues of the materials.
  • the semiconductor or display panel is manufactured by a variety of processes such as lithography, etching, ashing, and deposition processes for forming circuit pattern, and gas is frequently used for the processes.
  • an analyzer is used for detecting the malfunction and the cause of the malfunction in advance by inspecting waste gas used for the process and by-products in the waste gas in the process facilities for the conventional semiconductor or display panel manufacturing.
  • an analyzer for detecting waste gas or by-products included in the waste gas has drawbacks such as its too huge size not capable of being applied to a process facility and enormous cost for the installation and operation.
  • an analyzer using mass spectrometry has problems in that the analyzer become larger due to complicated operation which gas pressure of the process facility should be lowered at first and then transferred to the analyzer, and installation cost rises due to installation of a device lowering the gas pressure.
  • This analyzer using mass spectrometry obtains its desired result by a thermion generated from filament, which ionizes a gas molecule, and measuring an energy change of the molecule.
  • the filament of the analyzer using mass spectrometry has nonlinearity in lower pressure than atmospheric pressure for an analysis, and is destructed in higher pressure than that.
  • gas pressure during the manufacturing process is more than 1 ,000 times higher than pressure for the analysis, so that this cannot be directly applied to the analysis.
  • the present invention has been made to provide a plasma analyzer comprising a plasma source, a spectrometer, and an operation system which are disposed in a block form as a single unit for its easy installation, disassembly, movement, and operation.
  • the present invention has been made to further provide a plasma analyzer capable of being operated stably by preventing electromagnetic noise and thermal interferences between integrated blocks.
  • the present invention has been made to still further provide a plasma analyzer including a sapphire tube for prevent its corrosion by corrosive gas and, malfunction thereby.
  • the present invention has been made to finally provide a plasma analyzer including a magnetic field generator disposed on a transfer path of emission light generated from the sapphire tube for preventing a waste gas from being deposited on the transfer path and obstructing transfer of the emission light.
  • a plasma analyzer comprises: a plasma generator which is coupled to a process facility to be supplied with gas, and transforms the gas into plasma state, thereby generating emission light; a spectrometer which is supplied with the emission light from the plasma generator to be spectrumized to form spectrum, and transforms the emission light spectrum into an electric signal; and a central controlled unit which is supplied with the electric signal from the spectrometer, thereby analyzing components of the gas.
  • the plasma generator comprises: a first case; an external coupling unit including a gas inlet which is fixed by passing through one surface of the first case, and coupled to the process facility to provide a path transferring the gas; a sapphire tube formed in the shape of tube forming a transmittance part with its one side opened and the other side covered, in which an opening receives gas via the gas inlet of the external coupling; an adaptor fixed on the transmittance part of the sapphire tube by passing through the other surface the first case; a magnetic field generator disposed in the parallel direction to the sapphire tube so as to form the magnetic field on the sapphire tube; a coil wound to the outside of the sapphire tube; and a high frequency generating unit which is electrically coupled to the coil to provide high frequency power to the coil.
  • the magnetic field generator includes a plurality of magnets, and the magnet can be any one chosen from a permanent magnet, an electromagnet or a group comprising them.
  • the plurality of magnets can be disposed in the orthogonal direction to the longitudinal direction of the sapphire tube so that any one of an interval between the sapphire tube and the magnets and an interval between the magnets each other is uniform.
  • the plurality of magnets of the magnetic field generator can be disposed in the parallel direction to the sapphire tube with uniform interval therebetween.
  • the plurality of magnets can be disposed with the same pole towards the sapphire tube.
  • the first case can include any one chosen from a heat sink and a pan for radiation.
  • the spectrometer can include a plurality of magnifying reflectors and an imaging device.
  • the spectrometer can be coupled by the plasma generator and optical fiber.
  • the spectrometer, the central controlled unit, and the plasma generator can be assembled as a single module to be united.
  • a shielding plate can be further disposed between the plasma generator and the spectrometer so as to shield any one chosen from heat and electromagnetic.
  • the plasma analyzer comprises a plasma generator, a spectrometer, and an operation system constituted by separate blocks, and they are received in one case and installed in a manufacturing facility, so that its installation, disassembly, movement, and operation are easy.
  • the plasma analyzer according to the present invention prevents electromagnetic noise and thermal interferences between the blocks by a provided shielding plate, so that it is possible to operate stably the analyzer.
  • the plasma analyzer according to the present invention enhances corrosion resistance for waste gas by a provided sapphire tube, so that it is possible to lower its malfunction incidence rate.
  • the plasma analyzer according to the present invention is provided with a magnetic field generator providing a repulsion field on a transfer path transferring emission light of the sapphire tube, so that it is possible to prevent loss of the efficiency of transferring the emission light caused by deposition of a plasma particle, and so that it is possible to use the sapphire tube for long periods, thereby reducing the necessity of maintenance thereof and increasing stable transfer of the emission light.
  • FIG. 1 is a perspective view of a plasma analyzer according to the present invention
  • FIG. 2 is an exploded perspective view of a plasma analyzer of FIG. 1 ;
  • FIG. 3 is another perspective view of a second case of FIG. 1 ;
  • FIG. 4 is a sectional view showing perpendicular section of a plasma generator
  • FIG. 5 is a top projective view showing the plasma generator downward
  • FIG. 6 is a schematic diagram showing an inner structure of a spectrometer and a spectroscopy of FIG. 1 ;
  • FIG. 7 is a schematic diagram illustrating coupling of the spectrometer, plasma generator, and cases
  • FIG. 8 to 10 are top projective views showing the plasma generator downward according to other embodiments of the present invention.
  • FIG. 11 is a schematic sectional view of the plasma generator including two permanent magnets disposed therein; and FIG. 12 is a schematic sectional view of the plasma generator including three electromagnets disposed therein.
  • FIG. 1 is a perspective view of a plasma analyzer according to the present invention
  • FIG. 2 is an exploded perspective view of a plasma analyzer of FIG. 1
  • FIG. 3 is another perspective view of a second case of FIG. 1.
  • a plasma analyzer 100 according to the present invention comprises a plasma generator 110 and an analysis device 140.
  • the plasma analyzer 100 further comprises a case 101.
  • the analysis device 140 comprises a spectrometer 160 and a central controlled unit 180.
  • the case 101 comprises a first case 102 and a second case 103.
  • the plasma generator 110 and the analysis device 140 will be described schematically at first and then each of them will be described in detail.
  • the plasma generator 110 generates plasma by using Radio Frequency (RF) of a constant frequency.
  • the plasma generator 110 makes gas flowed from a process facility (not shown) excited state by using plasma.
  • the gas means an waste gas exhausted from the process facility mainly used in a manufacturing process of semiconductor, and may include a process by-product contained in the waste gas.
  • the gas can mean the gas used in the process in the case that the plasma generator 110 is mounted on the gas supplying line of the process facility.
  • the plasma generator 110 provides emission light generated from a process which the gas is transferred from excited state to ground state to the analysis device 140.
  • the plasma generator 110 is supplied with gas via an external coupling unit 115 formed on the outside of a first case 102 and a gas inlet 116 coupled to the process facility by the external coupling unit 115.
  • the process by-product is additionally flowed into the plasma generator 110 with the gas.
  • the plasma generator 110 will be described in more detail referring to FIG. 4 and FIG. 5.
  • the analysis device 140 comprises a spectrometer 160 and a central controlled unit 180 contained in a second case 103.
  • the second case 103 can be formed separately to its components, and the structure of the second case 103 is not limited herein.
  • the analysis device 140 analyzes emission light supplied from the plasma generator 110 by using spectrum analysis.
  • the second case 103 accommodates the spectrometer 160 and the central controlled unit 180 therein, and its lower part is coupled to the first case 102 of the plasma generator 110.
  • the second case 103 protects the spectrometer 160 and the central controlled unit 180 contained therein from external environment such as contaminants and impulse from manufacturing environment.
  • the second case 103 is coupled to the first case 102, so that the plasma analyzer 100 is constituted as a module. Accordingly, the second case 103 make it possible to easily maintain and inspect the spectrometer 160, the central controlled unit 180, and other components contained therein, and to easily mount and separate the plasma analyzer 100 to and from the manufacturing facility.
  • the second case 103 can have an input-output port 190 mounted therein for coupling of the plasma analyzer 100 and an external apparatus.
  • the input-output port 190 of the second case 103 can comprises a video port capable of being coupled to an external display apparatus, a network port for connection of LAN (Local Area Network) or Internet, a printer port, an external memory slot, a USB port, and an equivalent thereof.
  • the input-output port 190 can be replaced with a radio communication module.
  • the input-output port 190 of the second case 103 is coupled to I/O cable 197 of a central controlled unit 180.
  • the second case 103 can be manufactured in somewhat larger size than that of the plasma generator 110.
  • the extra space after receiving the plasma generator 110 in the second case 103 is used as a space receiving optical fiber 170 and cables 197, 198 and a space for flowing of air for radiation.
  • the shape of the second case 103 can be formed variously.
  • the plasma generator 110 is coupled to the second case 103 in a form of covering an opening formed on the lower part of the second case 103, in which the spectrometer 160 and the central controlled unit 180 are contained.
  • the plasma generator 110, the spectrometer 160, and the central controlled unit 180 can be contained in a case in various methods such as a method which they are contained in the case altogether, a method which they are contained in each case separately at first, and then the cases are coupled with one another, or a method which the coupled cases are contained in one case once again.
  • the plasma spectrometer 160, the central controlled unit 180, and the plasma generator 110 can be assembled as a single unit and formed as a single module for convenient use and space saving thereof.
  • the spectrometer 160 is supplied with emission light from the plasma generator 110 by optical fiber 170 coupled to the plasma generator 110.
  • the spectrometer 160 spectrumizes the supplied emission light, and transforms the spectrumized emission light pattern into an electric signal via an internal recognition device to transfer it to the central controlled unit 180.
  • the central controlled unit 180 figures out process components of the gas by analyzing the electric signal transferred form the spectrometer 160.
  • the central controlled unit 180 provides information to the outside via the input-output port 190, controls driving of the plasma generator 110 and the spectrometer 160, and analyzes the electric signal transferred from the spectrometer 160 to provide the analyzed data to an external device.
  • the spectrometer 160 disperses and diffuses emission light by using a reflector therein to spectrumize the emission light, and the spectrometer 160 transforms spectrumized emission light into an electric signal by an imaging device such as Charge-coupled Device (CCD) to transfer it to the central controlled part.
  • CCD Charge-coupled Device
  • the spectrometer 160 transfers the emission light to the central controlled unit 180 via a port 179 received in the spectrometer 160 and a data cable 198 coupled to the port 179.
  • the spectrometer 160 and the plasma generator 110 can be coupled by optical fiber 170 formed by quartz, etc.
  • the spectrometer 160 and the plasma generator 110 are coupled by the optical fiber 170 for easy coupling and efficient transmission of emission light
  • the coupling method is not limited herein.
  • the optical fiber 170 can have a connecting terminal formed on its end for coupling with the plasma generator 110.
  • the central controlled unit 180 is coupled to the spectrometer 160 by the data cable 198 to be supplied with an electric signal.
  • the central controlled unit 180 not only collects data about the supplied electric signal but also analyzes components of the present gas and gas by-products by comparing with pre-stored analysis data.
  • the central controlled unit 180 is electrically coupled to the plasma generator 110 and the spectrometer 160 to control them. In other words, when the plasma analyzer 100 is operated, the central controlled unit 180 controls the plasma generator 110 and the spectrometer 160 in accordance with a pre-established program.
  • the central controlled unit 180 transmits data to the external device, e.g., a high rank server or system.
  • the central controlled unit 180 can include a central processing unit 182 for controlling and analyzing thereof and a memory 181 for storing data and application for operation.
  • the central controlled unit 180 stores points per wavelength of the emission light spectrumized from the spectrometer and transforms the points per wavelength into a numerated signal.
  • the central controlled unit 180 is coupled via an external device (not shown) by an IO cable 197 and an input-output port of the second case 103, thereby transmitting the numerated signal to the external device.
  • the central controlled unit 180 can be embodied by a few boards or modules having a process capability of similar level to that of a general personnel computer.
  • the central controlled unit 180 can have a graphic card, all sorts of input-output devices, a communication device with a central processing unit and a storage device contained in a few boards and received in the analyzer. Accordingly, the central controlled unit 180 analyzes, processes, and stores the electric signal supplied from the spectrometer by a programmed process, and outputs and provides it by a display device, a communication line, a printer, etc., coupled via the input-output device.
  • the central controlled unit 180 can be programmed by a mouse, a keyboard, an external memory, etc., coupled via the input-output port 190 to analyze and process data in a way which a user wants, provide the data to the user.
  • the central controlled unit 180 can includes output devices such as a monitor and a printer according to environment and purpose in using them. To this end, the shape of the second case 103 can be slightly changed.
  • FIG. 4 is a sectional view showing perpendicular section of a plasma generator
  • FIG. 5 is a top projective view showing the plasma generator downward.
  • the plasma generator 110 comprises a first case 102, a pan 112, an external coupling unit 115, an adaptor 117, a sapphire tube 120, a coil 121 , a high frequency generating unit 122, and a magnetic field generator 125.
  • the first case 102 is approximately formed in the shape of box, contains a pan 112, a sapphire 120, a coil 121 , and a high frequency generating unit 122 therein, and fixes an adaptor 117 and an external coupling unit 115 thereto.
  • the first case 102 prevents heat and electromagnetic noise generated therein from being transferred to the outside, in particular, a spectrometer 160 and a central controlled unit 180.
  • a shielding plate 107 for shielding radiation and electromagnetic noise can be disposed on the upper surface of the first case 102 on which the spectrometer 160 and the central controlled unit is disposed, that is, on the upper surface of a second case 103.
  • the shielding plate 107 can be formed on both sides, a front side, and a rear side for efficiently shielding radiation and electromagnetic noise as well as the upper surface of the plasma generator 110.
  • the first case 102 can have the pan 112 fixed thereto for cooling, and numerous holes can be formed in the vicinity of a place to which the pan 112 is attached for flow of air.
  • the first case 102 can have a heat sink 111 as a structure for radiation.
  • the heat sink 111 is for radiating heat generated in the plasma generator 110, and its form and arrangement can be various for fine radiation.
  • the heat sink 111 can be made of the same material as the first case 102, or a material with higher thermal conductivity than that of the fist case 102.
  • the first case 102 has the external coupling unit 115 passed through one surface thereof to be fixed thereto.
  • the first case 102 has the adaptor passed through the other surface thereof to be fixed thereto.
  • the first case 102 includes the high frequency generating unit 122 disposed therein. Accordingly, the first case 102 can have a groove-shaped setting part 118 for arrangement of the high frequency generating unit 122.
  • the pan 112 prevents the temperature of the inside of the plasma generator 110 from being risen by inhaling air into the plasma generator 110 or exhausting the internal air. As shown in FIG. 3, while the pan 112 is attached to the first case, the pan can be disposed appropriately considering radiation efficiency and constituted as a plurality of pans.
  • the external coupling unit 115 couples a process facility and a plasma generator 110, in particular, the manufacture facility and a sapphire tube 120 to provide a path for gas supply so that gas flowed from a process facility can flow into the sapphire tube 120.
  • the external coupling unit 115 is mounted in a form passing through a first case 102, and the part of the external coupling unit 115 exposed to the outside of the first case 102 is manufactured to be capable of being coupled to the process facility, i.e., a outlet line of waste gas or a supply line of gas from the process facility.
  • the external coupling unit 115 supports one end of the sapphire tube 120 at the inside of the first case 102.
  • the external coupling unit 115 has a gas inlet 116 formed therein for inflow of gas.
  • the adaptor 117 couples the other end of the sapphire tube 120 and optical fiber 170. To this end, the adaptor 117 is mounted in a form passing through the first case 102 with its one end coupled to a connecting terminal of the optical fiber 170 and its other end coupled to an end of the sapphire tube 120.
  • the sapphire tube 120 has formed with its one end in the direction toward the external coupling unit 115 being opened to be capable of inflowing gas and its other end coupled to the optical fiber 170 being covered.
  • the sapphire tube 120 has a coil 121 wound to the outside thereof at a predetermined width.
  • the other end of the sapphire tube 120 is used as a transmittance part 119, and emission light generated at the inside of the sapphire tube 120 is transferred to the optical fiber 170 via the transmittance part 119. Accordingly, the sapphire tube 120 not only provides a space which gas flowed thereinto can be transformed into plasma but also transfers emission light generated when gas is transformed into plasma state to the optical fiber 170.
  • the sapphire tube 120 Since the sapphire tube 120 has better corrosion resistance and thermal resistance for gas and plasma than a conventional quartz tube, and the same or more emission light transmission as the quartz tube, the sapphire tube 120 stably transmits emission light generated therein to the optical fiber 170.
  • the coil 121 provides a high frequency signal by a high frequency power supplied from a high frequency generating unit 122 in the inside of the sapphire tube 120 and forms a magnetic field.
  • the coil 121 is wound more than one time in the near middle of the longitudinal direction of the sapphire tube 120. Gas flowed in the sapphire tube 120 or by-products contained in the gas are supplied with energy by the high frequency signal and the magnetic field supplied via the coil 121 to be ionized.
  • the high frequency generating unit 122 provides the high frequency power to the coil 121 according to control of a central controlled unit 180.
  • the high frequency generating unit 122 can be electrically coupled to the coil 121 , and fixed to the setting part 118 mounted at the inside of the first case 102.
  • the high frequency generating unit 122 provides the high frequency power of approximately 440MHz to the coil 121 for improving the efficiency of ionization.
  • the high frequency generating unit 122 can provides the high frequency power with other wavelength.
  • the magnetic field generator 125 is disposed in the vicinity of a transmittance part 119 of the sapphire tube 120 to provide a repulsion field by the magnetic field to the sapphire tube 120.
  • the magnetic field generator 125 prevents by-products generated according to ionization of gas in the sapphire tube 120 by the repulsion field or by-products flowed with the gas from being deposited on the transmittance part 119.
  • the efficiency, which emission light generated during ionization of process gas is transmitted to optical fiber becomes lower.
  • the magnetic field generator 125 prevents by-products from being deposited on the transmittance part 119, thereby preventing the efficiency of transmitting the emission light from being lower. Particles ionized in the plasma state are existed in positive particles from which electrons are separated. In addition, the activation of the gas transformed into the plasma state is lowered as time goes by, so that the gas is deposited in the sapphire tube 120.
  • the magnetic field generator 125 provides the repulsion field to the inside of the sapphire tube 120, thereby maintaining or increasing activation of the particles.
  • the magnetic field generator 125 prevents particles of by-products by the repulsion field from being flowed into the transmittance part 119. Accordingly, the particles in the sapphire tube 120 are not deposited in the sapphire tube 120, so that life span of the sapphire tube 120 is prolonged.
  • the magnetic field generator 125 includes more than two magnets mounted in the vicinity of the transmittance part 119 of the sapphire tube 120, and prevents particles of gas by-products from being deposited on the transmittance part 119. Accordingly, the efficiency of transmitting emission light of the transmittance part 119 can be maintained in the stable level for long periods, so that it is possible to improve the reliability of the plasma analyzer.
  • the magnetic field generator 125 is constituted of at least more than two electromagnets or permanent magnets, and is disposed in the vicinity of the transmittance parti 19.
  • the magnetic field generator 125 can be disposed in the vicinity of the transmittance part 119 of the sapphire tube 120 by a separate support 124.
  • the support 124 can be formed in various shapes as well as the shape shown in the drawing.
  • the magnetic field generator 125 is constituted of two magnets, each magnet is opposite to each other in the same pole direction with placing the sapphire tube 120 therebetween.
  • the magnetic field generator 125 is constituted of more than three magnets, the magnets are disposed in an equilateral triangle or a square shape around the sapphire tube 120 so that uniform magnet fields are generated in the sapphire tube 120.
  • the permanent magnet is used as the magnetic field generator 125 in the present invention, the electromagnet can be used instead. In the case that the electromagnets are used, a circuit for driving the electromagnet can be further included.
  • the magnetic field generator 125 is constituted of the electromagnet, it needs a separate power, so that the structure of the plasma generator 110 can be complicated. Therefore, it is preferable for the plasma generator 100 to be formed simply by the permanent magnet.
  • the permanent magnet comprises at least one chosen from or a group comprising rare-earth elements including Samarium Cobalt (Sm-Co) and neodymium (Nd-Fe-B), ferrite including Barium (Ba) and strontium (Sr), rubber magnet, and plastics.
  • Sm-Co Samarium Cobalt
  • Nd-Fe-B neodymium
  • ferrite including Barium (Ba) and strontium (Sr)
  • rubber magnet and plastics.
  • plastics plastics.
  • the magnetic generator 125 is disposed in the vicinity of the transmittance part 119 as shown in an embodiment of the present invention, it is possible for the magnetic generator 125 to be mounted on any place in the longitudinal direction of the sapphire tube 120 for preventing the inside of the sapphire tube 120 from being deposited.
  • FIG. 6 is a schematic diagram showing an inner structure of a spectrometer and a spectroscopy of FIG. 1.
  • the spectrometer 160 according to the present invention comprises a third case 161 , a first reflector to a third reflector 162, 163, 164, an imaging device 165, and a port 179.
  • the third case 161 has an enclosed space formed therein to prevent emission light from the outside from being flowed into, and fix and support the reflectors 162, 163, 164 and the imaging device 165.
  • the third case 161 has an optical nozzle 172 of optical fiber 170 attached to one side thereof, and emission light is emitted to the first reflector 162 via the optical nozzle.
  • the first reflector to third reflector 162, 163, 164 form emission light spectrum by reflecting repeatedly and diffusing the emission light examined via the optical nozzle to provide the emission spectrum to the imaging device 165.
  • the first reflector to third reflector 162, 163, 164 are disposed in a predetermined angle around a path of the emission light examined via the optical nozzle 172.
  • the number of the reflector constituting the spectrometer is not limited to three, and the number can be more or less.
  • the spectrometer forms the emission spectrum by using the reflector according to an embodiment of the present invention, a spectroscope by lens integrated device can be used.
  • the imaging device 165 transforms the emission light spectrum formed on the first reflector to third reflector 162, 163, 164 into an electric signal.
  • the imaging device 165 transfers the electric signal to a central controlled unit 180 via a port 179 and a data cable 198 coupled to the port 179.
  • the imaging device 165 can be formed of CCD (Charge-coupled Device) or CMOS image device.
  • FIG. 7 is a schematic diagram illustrating coupling of the spectrometer, plasma generator, and cases.
  • a first case 102 of the plasma generator 110 has numerous wings 126 formed on its side coupled to a second case 103 for being coupled to the second case 103.
  • the wings 126 has more than one coupling hole 127a formed on a position corresponding to that of a coupling hole 127b of the second case 103.
  • the wings 126 are positioned in the inside of the second case 103 and are coupled to the second case 103 by coupling members such as a volt and a screw added to the coupling hole 127a.
  • While the wings 126 are extended along the three sides of the upper edge 129 of the first case 102 as shown in FIG. 7, it is not limited in the present invention.
  • the shape of the wings 126 can be transformed into a shape for easy coupling and separation thereof. While the wings 126 formed in the first case 102 are illustrated in FIG. 7, it is possible for the wings 126 to be coupled to the second case 103 by other published methods for mechanical coupling. In addition, it is possible that the wings 126 are wound more than one time to be used as a guide for coupling with the second case 103.
  • the spectrometer 160 is shown as a broken line in FIG. 7.
  • the spectrometer 160 can be slightly smaller than the plasma generator 110, and is coupled to the upper surface 129 of the first case 102 including the wings 126 of the plasma generator 110 formed therein.
  • the spectrometer 160 is contained in the second case 103.
  • the first case 102 can have more than one supporter 128 formed on the upper edge thereof for fixing the spectrometer 160.
  • the supporter 128 can have more than one coupling hole 127c formed thereon for coupling by a coupling member.
  • the plasma analyzer according to other embodiments of the present invention will now be described.
  • the plasma analyzer according to other embodiments of the present invention has a difference in the magnetic field generator of the plasma generator with the plasma analyzer according to embodiments of FIG. 1 to FIG. 5. Accordingly, the magnetic field generator of the plasma analyzer according to other embodiments of the present invention will now be described in more detail.
  • FIG. 8 to 10 are top projective views showing the plasma generator downward according to other embodiments of the present invention.
  • plasma generators 210, 310 comprise magnetic field generators 225, 325 constituted of numerous magnets, and each magnet is separated from each other in the longitudinal direction of the sapphire tube 120.
  • the plasma generator 210 according to FIG. 8 has magnets of the magnet field generator 225 opposite to each other in the parallel direction to placing the sapphire tube 120 therebetween.
  • the plasma generator 310 according to FIG. 9 has magnets of the magnet field generator 325 disposed in a zigzag form with placing the sapphire tube 120 therebetween.
  • the magnets 225, 325 are formed of a plurality of magnets
  • the magnets are disposed in the orthogonal direction to the longitudinal direction of the sapphire tube 120 so that any one of an interval between the sapphire tube 120 and the magnets and an interval between the magnets each other is uniform.
  • the magnets of the magnet field generators 225, 325 are disposed as above, magnetic fields are uniformly formed in the sapphire tube 120.
  • the magnet field generators 225, 325 are formed of a plurality of magnets, the magnets are preferably disposed in the parallel direction to the sapphire tube 120 with uniform interval therebetween.
  • the magnets of the magnet field generators 225, 325 are disposed with uniform interval, and magnetic fields are uniformly formed in the sapphire tube 120.
  • the magnets of the magnet field generators 225, 325 are disposed as shown FIG. 8 and FIG. 9, a repulsion field is provided over the whole sapphire tube 120, thereby preventing gas and gas by-products from being deposited in the sapphire tube 120.
  • the magnets of the magnetic field generator 225, 325 are disposed as shown FIG. 8 and FIG. 9, the magnets should be opposite to each other in the same pole direction with placing the sapphire tube 120 therebetween. If the magnets of the magnetic field generator 225, 325 are opposite to each other in the different pole direction, particles flow according to the direction of the magnetic field, so that deposit can be formed in some part of the sapphire tube 120.
  • the magnetic field generators 225, 325 of the plasma generator 210, 310 has the advantage of forming the magnetic field enough to each need according to the number and density of the magnets and generating uniform magnetic fields.
  • the inner structure of the plasma generators 210, 310 can be complicated.
  • a plasma generator 410 according to other embodiments of the present invention has a magnetic field generator 425 formed of a magnet which has approximately the same length with the sapphire tube 120. Accordingly, the inner structure of the plasma generator 410 can be simple by the magnet of the magnetic field generator 425 formed as a single unit.
  • the magnetic field intensity of the magnetic field generator 425 of the plasma generator 410 can be weak according to the sort of the magnet, therefore, the magnet of the magnetic field generator 425 should be formed considering that.
  • FIG. 11 is a schematic sectional view of the plasma generator including two permanent magnets disposed therein
  • FIG. 12 is a schematic sectional view of the plasma generator including three electromagnets disposed therein.
  • the process of the plasma generator is described on the basis of the structure of the magnetic field generator according to embodiments of FIG. 1 to FIG. 5. Accordingly, FIG. 11 and FIG. 12 are sectional views showing section of the area including the magnetic field generator 125 in the perpendicular direction to the sapphire tube 120 in FIG. 5. Different sings from that of the magnets of the magnetic field generator according to embodiments of FIG. 1 to FIG. 5 are used herein for convenient description.
  • magnets 525a, 525b of the magnetic field generator 525 are opposite to each other in the same pole direction with placing the sapphire tube 120 therebetween to form a magnetic field in the parallel direction to them.
  • a repulsion field M1 formed by the magnets 525a, 525b is formed in the center C1 direction of a transmittance part 119. It is preferable that a point which magnetic flux density of the magnetic field formed by the magnetic field generator 525 is the highest becomes the center of the transmittance part 119.
  • the distance between the magnets 525a, 525b and the sapphire tube 120 can be defined by specific numeral, and it is preferable that the numeral is decided considering magnetic flux density according to the density of the magnets 525a, 525b and the size of the sapphire tube 120.
  • the magnets constituting the magnet field generators 225, 325 are disposed in a zigzag form as shown in FIG. 8 and FIG. 9. Accordingly, in the case that the magnetic field generators 225, 325 are formed of numerous magnets and are disposed in the longitudinal direction of the sapphire tube 120, it needs uniform magnetic fields over the whole sapphire tube 120, so that there can be a slight difference from the description of FIG. 11.
  • FIG. 11 and FIG. 12 describe exemplarily disposition of the magnets for preventing the deposition of transmittance part 119, therefore, the available scope of the embodiments should be considered according to that.
  • FIG. 12 shows that a magnetic field generator 625 is constituted of three electromagnets 625a, 625b, 625c.
  • the three electromagnets 625a, 625b, 625c are disposed on points corresponding to each vertex of an equilateral triangle.
  • a winding direction thereof and a direction of electricity supply should be decided so that the electromagnets 625a, 625b, 625c are disposed with the same pole towards the sapphire tube 120. Accordingly, as FIG.
  • the direction of the magnetic field supplied from the electromagnets 625a, 625b, 625c becomes the center direction of the transmittance part 119, and the distance on the disposition and the density on the magnetization of electromagnets 625 are decided so that the magnetic flux density is maximized in the center of the transmittance part 119.

Abstract

The present invention relates to a plasma analyzer comprising a plasma source, a spectrometer, and an operation system which are disposed in a block form as a single unit for its easy installation, disassembly, movement, and operation. The plasma analyzer according to the present invention comprises: a plasma generator which is coupled to a gas supply line of a manufacturing facility to be supplied with gas, and transforms the gas and impurities included in the gas into a plasma state, thereby generating emission light; a spectrometer which is supplied with the emission light from the plasma generator to be spectumized and form spectrum, and transforms the emission light spectrum into an electric signal; and a central controlled unit which is supplied with the electric signal from the spectrometer, thereby analyzing components and states of the gas and impurities in the gas.

Description

PLASMA ANALYZER
Technical Field
The present invention relates to a plasma analyzer comprising a plasma source, a spectrometer, and an operation system which are disposed in a block form as a single unit for its easy installation, disassembly, movement, and operation.
Background Art
In general, it is important to inspect any malfunction capable of generating during a process as well as speed and efficiency of manufacturing in all kinds of manufacturing processes and manufacturing facilities such as semiconductor and display panel manufacturings. It is considered to be more important inspecting malfunction and detecting a cause of the malfunction in advance in the case that a delicate pattern, circuit, structure, etc. such as that of the semiconductor and display panel manufacturings are formed in a very small region thereof.
Therefore, in the case of the semiconductor or display panel manufacturing facility, the malfunction and the cause of the malfunction are detected via materials used for the process and the post-use residues of the materials. In particular, the semiconductor or display panel is manufactured by a variety of processes such as lithography, etching, ashing, and deposition processes for forming circuit pattern, and gas is frequently used for the processes. To this end, an analyzer is used for detecting the malfunction and the cause of the malfunction in advance by inspecting waste gas used for the process and by-products in the waste gas in the process facilities for the conventional semiconductor or display panel manufacturing.
Disclosure
Technical Problem However, the conventional analyzer, in particular, an analyzer for detecting waste gas or by-products included in the waste gas has drawbacks such as its too huge size not capable of being applied to a process facility and enormous cost for the installation and operation. For example, an analyzer using mass spectrometry has problems in that the analyzer become larger due to complicated operation which gas pressure of the process facility should be lowered at first and then transferred to the analyzer, and installation cost rises due to installation of a device lowering the gas pressure. This analyzer using mass spectrometry obtains its desired result by a thermion generated from filament, which ionizes a gas molecule, and measuring an energy change of the molecule. The filament of the analyzer using mass spectrometry has nonlinearity in lower pressure than atmospheric pressure for an analysis, and is destructed in higher pressure than that. However, in general, gas pressure during the manufacturing process is more than 1 ,000 times higher than pressure for the analysis, so that this cannot be directly applied to the analysis.
Accordingly, while those who operate the process facility admit efficiency of an analyzer, they can hardly apply the analyzer to process facilities and operate them due to its complicated operation and enormous cost.
Technical Solution
The present invention has been made to provide a plasma analyzer comprising a plasma source, a spectrometer, and an operation system which are disposed in a block form as a single unit for its easy installation, disassembly, movement, and operation.
The present invention has been made to further provide a plasma analyzer capable of being operated stably by preventing electromagnetic noise and thermal interferences between integrated blocks.
The present invention has been made to still further provide a plasma analyzer including a sapphire tube for prevent its corrosion by corrosive gas and, malfunction thereby. The present invention has been made to finally provide a plasma analyzer including a magnetic field generator disposed on a transfer path of emission light generated from the sapphire tube for preventing a waste gas from being deposited on the transfer path and obstructing transfer of the emission light. In order to solve the aforementioned problems, a plasma analyzer according to the present invention comprises: a plasma generator which is coupled to a process facility to be supplied with gas, and transforms the gas into plasma state, thereby generating emission light; a spectrometer which is supplied with the emission light from the plasma generator to be spectrumized to form spectrum, and transforms the emission light spectrum into an electric signal; and a central controlled unit which is supplied with the electric signal from the spectrometer, thereby analyzing components of the gas.
The plasma generator comprises: a first case; an external coupling unit including a gas inlet which is fixed by passing through one surface of the first case, and coupled to the process facility to provide a path transferring the gas; a sapphire tube formed in the shape of tube forming a transmittance part with its one side opened and the other side covered, in which an opening receives gas via the gas inlet of the external coupling; an adaptor fixed on the transmittance part of the sapphire tube by passing through the other surface the first case; a magnetic field generator disposed in the parallel direction to the sapphire tube so as to form the magnetic field on the sapphire tube; a coil wound to the outside of the sapphire tube; and a high frequency generating unit which is electrically coupled to the coil to provide high frequency power to the coil.
The magnetic field generator includes a plurality of magnets, and the magnet can be any one chosen from a permanent magnet, an electromagnet or a group comprising them.
The plurality of magnets can be disposed in the orthogonal direction to the longitudinal direction of the sapphire tube so that any one of an interval between the sapphire tube and the magnets and an interval between the magnets each other is uniform.
The plurality of magnets of the magnetic field generator can be disposed in the parallel direction to the sapphire tube with uniform interval therebetween.
The plurality of magnets can be disposed with the same pole towards the sapphire tube.
The first case can include any one chosen from a heat sink and a pan for radiation.
The spectrometer can include a plurality of magnifying reflectors and an imaging device.
The spectrometer can be coupled by the plasma generator and optical fiber.
The spectrometer, the central controlled unit, and the plasma generator can be assembled as a single module to be united.
A shielding plate can be further disposed between the plasma generator and the spectrometer so as to shield any one chosen from heat and electromagnetic.
Advantageous Effects
As mentioned above, the plasma analyzer according to the present invention comprises a plasma generator, a spectrometer, and an operation system constituted by separate blocks, and they are received in one case and installed in a manufacturing facility, so that its installation, disassembly, movement, and operation are easy.
In addition, the plasma analyzer according to the present invention prevents electromagnetic noise and thermal interferences between the blocks by a provided shielding plate, so that it is possible to operate stably the analyzer. The plasma analyzer according to the present invention enhances corrosion resistance for waste gas by a provided sapphire tube, so that it is possible to lower its malfunction incidence rate.
Further, the plasma analyzer according to the present invention is provided with a magnetic field generator providing a repulsion field on a transfer path transferring emission light of the sapphire tube, so that it is possible to prevent loss of the efficiency of transferring the emission light caused by deposition of a plasma particle, and so that it is possible to use the sapphire tube for long periods, thereby reducing the necessity of maintenance thereof and increasing stable transfer of the emission light.
Description of the Drawings
The above and other features and advantages of the present invention will become more apparent by describing in detail exemplary embodiments thereof with reference to the attached drawings in which: FIG. 1 is a perspective view of a plasma analyzer according to the present invention;
FIG. 2 is an exploded perspective view of a plasma analyzer of FIG. 1 ;
FIG. 3 is another perspective view of a second case of FIG. 1 ;
FIG. 4 is a sectional view showing perpendicular section of a plasma generator;
FIG. 5 is a top projective view showing the plasma generator downward;
FIG. 6 is a schematic diagram showing an inner structure of a spectrometer and a spectroscopy of FIG. 1 ;
FIG. 7 is a schematic diagram illustrating coupling of the spectrometer, plasma generator, and cases;
FIG. 8 to 10 are top projective views showing the plasma generator downward according to other embodiments of the present invention;
FIG. 11 is a schematic sectional view of the plasma generator including two permanent magnets disposed therein; and FIG. 12 is a schematic sectional view of the plasma generator including three electromagnets disposed therein.
Best Mode
Hereinafter, an exemplary embodiment of the present invention will be described in detail with reference to accompanying drawings, in which like reference numerals denote like elements.
FIG. 1 is a perspective view of a plasma analyzer according to the present invention, FIG. 2 is an exploded perspective view of a plasma analyzer of FIG. 1 , and FIG. 3 is another perspective view of a second case of FIG. 1. Referring to FIG. 1 to FIG. 3, a plasma analyzer 100 according to the present invention comprises a plasma generator 110 and an analysis device 140. The plasma analyzer 100 further comprises a case 101. In addition, the analysis device 140 comprises a spectrometer 160 and a central controlled unit 180. The case 101 comprises a first case 102 and a second case 103. Hereinafter, the plasma generator 110 and the analysis device 140 will be described schematically at first and then each of them will be described in detail.
The plasma generator 110 generates plasma by using Radio Frequency (RF) of a constant frequency. The plasma generator 110 makes gas flowed from a process facility (not shown) excited state by using plasma. Herein, the gas means an waste gas exhausted from the process facility mainly used in a manufacturing process of semiconductor, and may include a process by-product contained in the waste gas. In addition, the gas can mean the gas used in the process in the case that the plasma generator 110 is mounted on the gas supplying line of the process facility. The plasma generator 110 provides emission light generated from a process which the gas is transferred from excited state to ground state to the analysis device 140. To this end, the plasma generator 110 is supplied with gas via an external coupling unit 115 formed on the outside of a first case 102 and a gas inlet 116 coupled to the process facility by the external coupling unit 115. In this state, the process by-product is additionally flowed into the plasma generator 110 with the gas. The plasma generator 110 will be described in more detail referring to FIG. 4 and FIG. 5.
Referring to FIG. 1 and FIG. 2, the analysis device 140 comprises a spectrometer 160 and a central controlled unit 180 contained in a second case 103. However, the second case 103 can be formed separately to its components, and the structure of the second case 103 is not limited herein. The analysis device 140 analyzes emission light supplied from the plasma generator 110 by using spectrum analysis.
The second case 103 accommodates the spectrometer 160 and the central controlled unit 180 therein, and its lower part is coupled to the first case 102 of the plasma generator 110. The second case 103 protects the spectrometer 160 and the central controlled unit 180 contained therein from external environment such as contaminants and impulse from manufacturing environment. The second case 103 is coupled to the first case 102, so that the plasma analyzer 100 is constituted as a module. Accordingly, the second case 103 make it possible to easily maintain and inspect the spectrometer 160, the central controlled unit 180, and other components contained therein, and to easily mount and separate the plasma analyzer 100 to and from the manufacturing facility. In addition, the second case 103 can have an input-output port 190 mounted therein for coupling of the plasma analyzer 100 and an external apparatus. The input-output port 190 of the second case 103 can comprises a video port capable of being coupled to an external display apparatus, a network port for connection of LAN (Local Area Network) or Internet, a printer port, an external memory slot, a USB port, and an equivalent thereof. The input-output port 190 can be replaced with a radio communication module. In addition, the input-output port 190 of the second case 103 is coupled to I/O cable 197 of a central controlled unit 180. Herein, the second case 103 can be manufactured in somewhat larger size than that of the plasma generator 110. The extra space after receiving the plasma generator 110 in the second case 103 is used as a space receiving optical fiber 170 and cables 197, 198 and a space for flowing of air for radiation. However, the shape of the second case 103 can be formed variously. The plasma generator 110 is coupled to the second case 103 in a form of covering an opening formed on the lower part of the second case 103, in which the spectrometer 160 and the central controlled unit 180 are contained. However, the plasma generator 110, the spectrometer 160, and the central controlled unit 180 can be contained in a case in various methods such as a method which they are contained in the case altogether, a method which they are contained in each case separately at first, and then the cases are coupled with one another, or a method which the coupled cases are contained in one case once again. Accordingly, the plasma spectrometer 160, the central controlled unit 180, and the plasma generator 110 can be assembled as a single unit and formed as a single module for convenient use and space saving thereof.
The spectrometer 160 is supplied with emission light from the plasma generator 110 by optical fiber 170 coupled to the plasma generator 110. The spectrometer 160 spectrumizes the supplied emission light, and transforms the spectrumized emission light pattern into an electric signal via an internal recognition device to transfer it to the central controlled unit 180. The central controlled unit 180 figures out process components of the gas by analyzing the electric signal transferred form the spectrometer 160. In particular, the central controlled unit 180 provides information to the outside via the input-output port 190, controls driving of the plasma generator 110 and the spectrometer 160, and analyzes the electric signal transferred from the spectrometer 160 to provide the analyzed data to an external device. The spectrometer 160 disperses and diffuses emission light by using a reflector therein to spectrumize the emission light, and the spectrometer 160 transforms spectrumized emission light into an electric signal by an imaging device such as Charge-coupled Device (CCD) to transfer it to the central controlled part. In more particular, the spectrometer 160 transfers the emission light to the central controlled unit 180 via a port 179 received in the spectrometer 160 and a data cable 198 coupled to the port 179. Herein, the spectrometer 160 and the plasma generator 110 can be coupled by optical fiber 170 formed by quartz, etc. While it is preferable that the spectrometer 160 and the plasma generator 110 are coupled by the optical fiber 170 for easy coupling and efficient transmission of emission light, the coupling method is not limited herein. In addition, the optical fiber 170 can have a connecting terminal formed on its end for coupling with the plasma generator 110.
The central controlled unit 180 is coupled to the spectrometer 160 by the data cable 198 to be supplied with an electric signal. The central controlled unit 180 not only collects data about the supplied electric signal but also analyzes components of the present gas and gas by-products by comparing with pre-stored analysis data. As mentioned above, the central controlled unit 180 is electrically coupled to the plasma generator 110 and the spectrometer 160 to control them. In other words, when the plasma analyzer 100 is operated, the central controlled unit 180 controls the plasma generator 110 and the spectrometer 160 in accordance with a pre-established program. In addition, the central controlled unit 180 transmits data to the external device, e.g., a high rank server or system. Accordingly, the central controlled unit 180 can include a central processing unit 182 for controlling and analyzing thereof and a memory 181 for storing data and application for operation. The central controlled unit 180 stores points per wavelength of the emission light spectrumized from the spectrometer and transforms the points per wavelength into a numerated signal. The central controlled unit 180 is coupled via an external device (not shown) by an IO cable 197 and an input-output port of the second case 103, thereby transmitting the numerated signal to the external device. The central controlled unit 180 can be embodied by a few boards or modules having a process capability of similar level to that of a general personnel computer. In other words, the central controlled unit 180 can have a graphic card, all sorts of input-output devices, a communication device with a central processing unit and a storage device contained in a few boards and received in the analyzer. Accordingly, the central controlled unit 180 analyzes, processes, and stores the electric signal supplied from the spectrometer by a programmed process, and outputs and provides it by a display device, a communication line, a printer, etc., coupled via the input-output device. In addition, the central controlled unit 180 can be programmed by a mouse, a keyboard, an external memory, etc., coupled via the input-output port 190 to analyze and process data in a way which a user wants, provide the data to the user. The central controlled unit 180 can includes output devices such as a monitor and a printer according to environment and purpose in using them. To this end, the shape of the second case 103 can be slightly changed.
A plasma generator will now be described in more detail according to embodiments of the present invention. FIG. 4 is a sectional view showing perpendicular section of a plasma generator, and FIG. 5 is a top projective view showing the plasma generator downward.
Referring FIG. 4 to FIG. 5, the plasma generator 110 comprises a first case 102, a pan 112, an external coupling unit 115, an adaptor 117, a sapphire tube 120, a coil 121 , a high frequency generating unit 122, and a magnetic field generator 125.
The first case 102 is approximately formed in the shape of box, contains a pan 112, a sapphire 120, a coil 121 , and a high frequency generating unit 122 therein, and fixes an adaptor 117 and an external coupling unit 115 thereto. The first case 102 prevents heat and electromagnetic noise generated therein from being transferred to the outside, in particular, a spectrometer 160 and a central controlled unit 180. Accordingly, a shielding plate 107 for shielding radiation and electromagnetic noise can be disposed on the upper surface of the first case 102 on which the spectrometer 160 and the central controlled unit is disposed, that is, on the upper surface of a second case 103. In addition, the shielding plate 107 can be formed on both sides, a front side, and a rear side for efficiently shielding radiation and electromagnetic noise as well as the upper surface of the plasma generator 110. The first case 102 can have the pan 112 fixed thereto for cooling, and numerous holes can be formed in the vicinity of a place to which the pan 112 is attached for flow of air. In addition, the first case 102 can have a heat sink 111 as a structure for radiation. The heat sink 111 is for radiating heat generated in the plasma generator 110, and its form and arrangement can be various for fine radiation. The heat sink 111 can be made of the same material as the first case 102, or a material with higher thermal conductivity than that of the fist case 102. The first case 102 has the external coupling unit 115 passed through one surface thereof to be fixed thereto. In addition, the first case 102 has the adaptor passed through the other surface thereof to be fixed thereto. The first case 102 includes the high frequency generating unit 122 disposed therein. Accordingly, the first case 102 can have a groove-shaped setting part 118 for arrangement of the high frequency generating unit 122.
The pan 112 prevents the temperature of the inside of the plasma generator 110 from being risen by inhaling air into the plasma generator 110 or exhausting the internal air. As shown in FIG. 3, while the pan 112 is attached to the first case, the pan can be disposed appropriately considering radiation efficiency and constituted as a plurality of pans.
The external coupling unit 115 couples a process facility and a plasma generator 110, in particular, the manufacture facility and a sapphire tube 120 to provide a path for gas supply so that gas flowed from a process facility can flow into the sapphire tube 120. Accordingly, the external coupling unit 115 is mounted in a form passing through a first case 102, and the part of the external coupling unit 115 exposed to the outside of the first case 102 is manufactured to be capable of being coupled to the process facility, i.e., a outlet line of waste gas or a supply line of gas from the process facility. In addition, the external coupling unit 115 supports one end of the sapphire tube 120 at the inside of the first case 102. The external coupling unit 115 has a gas inlet 116 formed therein for inflow of gas.
The adaptor 117 couples the other end of the sapphire tube 120 and optical fiber 170. To this end, the adaptor 117 is mounted in a form passing through the first case 102 with its one end coupled to a connecting terminal of the optical fiber 170 and its other end coupled to an end of the sapphire tube 120.
The sapphire tube 120 has formed with its one end in the direction toward the external coupling unit 115 being opened to be capable of inflowing gas and its other end coupled to the optical fiber 170 being covered. In addition, the sapphire tube 120 has a coil 121 wound to the outside thereof at a predetermined width. The other end of the sapphire tube 120 is used as a transmittance part 119, and emission light generated at the inside of the sapphire tube 120 is transferred to the optical fiber 170 via the transmittance part 119. Accordingly, the sapphire tube 120 not only provides a space which gas flowed thereinto can be transformed into plasma but also transfers emission light generated when gas is transformed into plasma state to the optical fiber 170. Since the sapphire tube 120 has better corrosion resistance and thermal resistance for gas and plasma than a conventional quartz tube, and the same or more emission light transmission as the quartz tube, the sapphire tube 120 stably transmits emission light generated therein to the optical fiber 170. The coil 121 provides a high frequency signal by a high frequency power supplied from a high frequency generating unit 122 in the inside of the sapphire tube 120 and forms a magnetic field. The coil 121 is wound more than one time in the near middle of the longitudinal direction of the sapphire tube 120. Gas flowed in the sapphire tube 120 or by-products contained in the gas are supplied with energy by the high frequency signal and the magnetic field supplied via the coil 121 to be ionized.
The high frequency generating unit 122 provides the high frequency power to the coil 121 according to control of a central controlled unit 180. The high frequency generating unit 122 can be electrically coupled to the coil 121 , and fixed to the setting part 118 mounted at the inside of the first case 102. The high frequency generating unit 122 provides the high frequency power of approximately 440MHz to the coil 121 for improving the efficiency of ionization. In addition, the high frequency generating unit 122 can provides the high frequency power with other wavelength.
The magnetic field generator 125 is disposed in the vicinity of a transmittance part 119 of the sapphire tube 120 to provide a repulsion field by the magnetic field to the sapphire tube 120. The magnetic field generator 125 prevents by-products generated according to ionization of gas in the sapphire tube 120 by the repulsion field or by-products flowed with the gas from being deposited on the transmittance part 119. When the by-products are deposited on the transmittance part 119 of the sapphire tube 120, the efficiency, which emission light generated during ionization of process gas is transmitted to optical fiber, becomes lower. Accordingly, the magnetic field generator 125 prevents by-products from being deposited on the transmittance part 119, thereby preventing the efficiency of transmitting the emission light from being lower. Particles ionized in the plasma state are existed in positive particles from which electrons are separated. In addition, the activation of the gas transformed into the plasma state is lowered as time goes by, so that the gas is deposited in the sapphire tube 120. The magnetic field generator 125 provides the repulsion field to the inside of the sapphire tube 120, thereby maintaining or increasing activation of the particles. The magnetic field generator 125 prevents particles of by-products by the repulsion field from being flowed into the transmittance part 119. Accordingly, the particles in the sapphire tube 120 are not deposited in the sapphire tube 120, so that life span of the sapphire tube 120 is prolonged.
The magnetic field generator 125 includes more than two magnets mounted in the vicinity of the transmittance part 119 of the sapphire tube 120, and prevents particles of gas by-products from being deposited on the transmittance part 119. Accordingly, the efficiency of transmitting emission light of the transmittance part 119 can be maintained in the stable level for long periods, so that it is possible to improve the reliability of the plasma analyzer. The magnetic field generator 125 is constituted of at least more than two electromagnets or permanent magnets, and is disposed in the vicinity of the transmittance parti 19. The magnetic field generator 125 can be disposed in the vicinity of the transmittance part 119 of the sapphire tube 120 by a separate support 124. The support 124 can be formed in various shapes as well as the shape shown in the drawing. In the case that the magnetic field generator 125 is constituted of two magnets, each magnet is opposite to each other in the same pole direction with placing the sapphire tube 120 therebetween. In addition, in the case that the magnetic field generator 125 is constituted of more than three magnets, the magnets are disposed in an equilateral triangle or a square shape around the sapphire tube 120 so that uniform magnet fields are generated in the sapphire tube 120. While the permanent magnet is used as the magnetic field generator 125 in the present invention, the electromagnet can be used instead. In the case that the electromagnets are used, a circuit for driving the electromagnet can be further included. In the case that the magnetic field generator 125 is constituted of the electromagnet, it needs a separate power, so that the structure of the plasma generator 110 can be complicated. Therefore, it is preferable for the plasma generator 100 to be formed simply by the permanent magnet. However, it is not limited in the present invention. The permanent magnet comprises at least one chosen from or a group comprising rare-earth elements including Samarium Cobalt (Sm-Co) and neodymium (Nd-Fe-B), ferrite including Barium (Ba) and strontium (Sr), rubber magnet, and plastics. However, it is preferable to use any substance with capability to form predominantly a magnetic field, considering the increasing temperature of the inside of the plasma generator 110. In addition, while the magnetic generator 125 is disposed in the vicinity of the transmittance part 119 as shown in an embodiment of the present invention, it is possible for the magnetic generator 125 to be mounted on any place in the longitudinal direction of the sapphire tube 120 for preventing the inside of the sapphire tube 120 from being deposited.
A spectrometer will now be described according to embodiments of the present invention.
FIG. 6 is a schematic diagram showing an inner structure of a spectrometer and a spectroscopy of FIG. 1. Referring to FIG. 6, the spectrometer 160 according to the present invention comprises a third case 161 , a first reflector to a third reflector 162, 163, 164, an imaging device 165, and a port 179.
The third case 161 has an enclosed space formed therein to prevent emission light from the outside from being flowed into, and fix and support the reflectors 162, 163, 164 and the imaging device 165. In addition, the third case 161 has an optical nozzle 172 of optical fiber 170 attached to one side thereof, and emission light is emitted to the first reflector 162 via the optical nozzle.
The first reflector to third reflector 162, 163, 164 form emission light spectrum by reflecting repeatedly and diffusing the emission light examined via the optical nozzle to provide the emission spectrum to the imaging device 165.
Accordingly, the first reflector to third reflector 162, 163, 164 are disposed in a predetermined angle around a path of the emission light examined via the optical nozzle 172. Herein, the number of the reflector constituting the spectrometer is not limited to three, and the number can be more or less. In addition, while the spectrometer forms the emission spectrum by using the reflector according to an embodiment of the present invention, a spectroscope by lens integrated device can be used.
The imaging device 165 transforms the emission light spectrum formed on the first reflector to third reflector 162, 163, 164 into an electric signal. The imaging device 165 transfers the electric signal to a central controlled unit 180 via a port 179 and a data cable 198 coupled to the port 179. The imaging device 165 can be formed of CCD (Charge-coupled Device) or CMOS image device.
The coupling relation of a plasma generator and cases according to an embodiment of the present invention will now be described in more detail. FIG. 7 is a schematic diagram illustrating coupling of the spectrometer, plasma generator, and cases.
Referring to FIG. 7, a first case 102 of the plasma generator 110 has numerous wings 126 formed on its side coupled to a second case 103 for being coupled to the second case 103. In addition, the wings 126 has more than one coupling hole 127a formed on a position corresponding to that of a coupling hole 127b of the second case 103. The wings 126 are positioned in the inside of the second case 103 and are coupled to the second case 103 by coupling members such as a volt and a screw added to the coupling hole 127a.
While the wings 126 are extended along the three sides of the upper edge 129 of the first case 102 as shown in FIG. 7, it is not limited in the present invention. The shape of the wings 126 can be transformed into a shape for easy coupling and separation thereof. While the wings 126 formed in the first case 102 are illustrated in FIG. 7, it is possible for the wings 126 to be coupled to the second case 103 by other published methods for mechanical coupling. In addition, it is possible that the wings 126 are wound more than one time to be used as a guide for coupling with the second case 103.
The spectrometer 160 is shown as a broken line in FIG. 7. The spectrometer 160 can be slightly smaller than the plasma generator 110, and is coupled to the upper surface 129 of the first case 102 including the wings 126 of the plasma generator 110 formed therein. In the case that the first case 102 and second case 103 are coupled, the spectrometer 160 is contained in the second case 103. In addition, the first case 102 can have more than one supporter 128 formed on the upper edge thereof for fixing the spectrometer 160. The supporter 128 can have more than one coupling hole 127c formed thereon for coupling by a coupling member.
The plasma analyzer according to other embodiments of the present invention will now be described. The plasma analyzer according to other embodiments of the present invention has a difference in the magnetic field generator of the plasma generator with the plasma analyzer according to embodiments of FIG. 1 to FIG. 5. Accordingly, the magnetic field generator of the plasma analyzer according to other embodiments of the present invention will now be described in more detail.
FIG. 8 to 10 are top projective views showing the plasma generator downward according to other embodiments of the present invention.
Referring to FIG. 8 and FIG. 9, plasma generators 210, 310 according to other embodiments of the present invention comprise magnetic field generators 225, 325 constituted of numerous magnets, and each magnet is separated from each other in the longitudinal direction of the sapphire tube 120. The plasma generator 210 according to FIG. 8 has magnets of the magnet field generator 225 opposite to each other in the parallel direction to placing the sapphire tube 120 therebetween. In addition, the plasma generator 310 according to FIG. 9 has magnets of the magnet field generator 325 disposed in a zigzag form with placing the sapphire tube 120 therebetween.
In the case that the magnet field generators 225, 325 are formed of a plurality of magnets, the magnets are disposed in the orthogonal direction to the longitudinal direction of the sapphire tube 120 so that any one of an interval between the sapphire tube 120 and the magnets and an interval between the magnets each other is uniform. In the case that the magnets of the magnet field generators 225, 325 are disposed as above, magnetic fields are uniformly formed in the sapphire tube 120. In the case that the magnet field generators 225, 325 are formed of a plurality of magnets, the magnets are preferably disposed in the parallel direction to the sapphire tube 120 with uniform interval therebetween. In the case that the magnets of the magnet field generators 225, 325 are disposed with uniform interval, and magnetic fields are uniformly formed in the sapphire tube 120. In the case that the magnets of the magnet field generators 225, 325 are disposed as shown FIG. 8 and FIG. 9, a repulsion field is provided over the whole sapphire tube 120, thereby preventing gas and gas by-products from being deposited in the sapphire tube 120.
In the case that the magnets of the magnetic field generator 225, 325 are disposed as shown FIG. 8 and FIG. 9, the magnets should be opposite to each other in the same pole direction with placing the sapphire tube 120 therebetween. If the magnets of the magnetic field generator 225, 325 are opposite to each other in the different pole direction, particles flow according to the direction of the magnetic field, so that deposit can be formed in some part of the sapphire tube 120.
The magnetic field generators 225, 325 of the plasma generator 210, 310 has the advantage of forming the magnetic field enough to each need according to the number and density of the magnets and generating uniform magnetic fields. However, if the magnetic field generators 225, 325 of the plasma generator 210, 310 are constituted of numerous magnets, the inner structure of the plasma generators 210, 310 can be complicated. Referring to FIG. 10, a plasma generator 410 according to other embodiments of the present invention has a magnetic field generator 425 formed of a magnet which has approximately the same length with the sapphire tube 120. Accordingly, the inner structure of the plasma generator 410 can be simple by the magnet of the magnetic field generator 425 formed as a single unit. However, the magnetic field intensity of the magnetic field generator 425 of the plasma generator 410 can be weak according to the sort of the magnet, therefore, the magnet of the magnetic field generator 425 should be formed considering that.
Process of a plasma generator according to embodiments of the present invention will now be described. FIG. 11 is a schematic sectional view of the plasma generator including two permanent magnets disposed therein, and FIG. 12 is a schematic sectional view of the plasma generator including three electromagnets disposed therein. Hereinafter, the process of the plasma generator is described on the basis of the structure of the magnetic field generator according to embodiments of FIG. 1 to FIG. 5. Accordingly, FIG. 11 and FIG. 12 are sectional views showing section of the area including the magnetic field generator 125 in the perpendicular direction to the sapphire tube 120 in FIG. 5. Different sings from that of the magnets of the magnetic field generator according to embodiments of FIG. 1 to FIG. 5 are used herein for convenient description.
Referring to FIG. 11 , magnets 525a, 525b of the magnetic field generator 525, are opposite to each other in the same pole direction with placing the sapphire tube 120 therebetween to form a magnetic field in the parallel direction to them. In this case, a repulsion field M1 formed by the magnets 525a, 525b is formed in the center C1 direction of a transmittance part 119. It is preferable that a point which magnetic flux density of the magnetic field formed by the magnetic field generator 525 is the highest becomes the center of the transmittance part 119. The distance between the magnets 525a, 525b and the sapphire tube 120 can be defined by specific numeral, and it is preferable that the numeral is decided considering magnetic flux density according to the density of the magnets 525a, 525b and the size of the sapphire tube 120. The magnets constituting the magnet field generators 225, 325 are disposed in a zigzag form as shown in FIG. 8 and FIG. 9. Accordingly, in the case that the magnetic field generators 225, 325 are formed of numerous magnets and are disposed in the longitudinal direction of the sapphire tube 120, it needs uniform magnetic fields over the whole sapphire tube 120, so that there can be a slight difference from the description of FIG. 11. In other words, FIG. 11 and FIG. 12 describe exemplarily disposition of the magnets for preventing the deposition of transmittance part 119, therefore, the available scope of the embodiments should be considered according to that.
FIG. 12 shows that a magnetic field generator 625 is constituted of three electromagnets 625a, 625b, 625c. The three electromagnets 625a, 625b, 625c are disposed on points corresponding to each vertex of an equilateral triangle. In this time, a winding direction thereof and a direction of electricity supply should be decided so that the electromagnets 625a, 625b, 625c are disposed with the same pole towards the sapphire tube 120. Accordingly, as FIG. 11 , the direction of the magnetic field supplied from the electromagnets 625a, 625b, 625c becomes the center direction of the transmittance part 119, and the distance on the disposition and the density on the magnetization of electromagnets 625 are decided so that the magnetic flux density is maximized in the center of the transmittance part 119.
It is to be appreciated that the above described embodiments are for purpose of illustration only, and the scope of the invention are not defined by the above described embodiments but the appended claims. Therefore, it should be understood by those of ordinary skill in the art that various modifications, additions, and substitutions are possible, without departing from the scope and spirit of the invention.

Claims

Claims
1. A plasma analyzer comprising: a plasma generator which is coupled to a process facility to be supplied with gas, and transforms the gas into a plasma state, thereby generating emission light; a spectrometer which is supplied with the emission light from the plasma generator to be spectrumized and form spectrum, and transforms the emission light spectrum into an electric signal; and a central controlled unit which is supplied with the electric signal from the spectrometer, thereby analyzing components of the gas.
2. The plasma analyzer as claimed in claim 1 , wherein the plasma generator comprises: a first case; an external coupling unit including a gas inlet which is fixed by passing through one surface of the first case, and coupled to the process facility to provide a path transferring the gas; a sapphire tube formed in the shape of tube forming a transmittance part with its one side opened and the other side covered, in which an opening receives gas via the gas inlet of the external coupling; an adaptor fixed on the transmittance part of the sapphire tube by passing through the other surface the first case; a magnetic field generator disposed in the parallel direction to the sapphire tube so as to form a magnetic field on the sapphire tube; a coil wound to the outside of the sapphire tube; and a high frequency generating unit which is electrically coupled to the coil to provide the high frequency power to the coil.
3. The plasma analyzer as claimed in claim 2, wherein the magnetic field generator includes a plurality of magnets, and the magnet is any one chosen from a permanent magnet and an electromagnet or a group comprising them.
4. The plasma analyzer as claimed in claim 3, wherein the plurality of magnets are disposed in the orthogonal direction to the longitudinal direction of the sapphire tube so that any one of an interval between the sapphire tube and the magnets and an interval between the magnets each other is uniform.
5. The plasma analyzer as claimed in claim 3, wherein the plurality of magnets of the magnetic field generator are disposed in the parallel direction to the sapphire tube with uniform interval.
6. The plasma analyzer as claimed in claim 3, wherein the plurality of magnets are disposed with the same pole towards the sapphire tube 120.
7. The plasma analyzer as claimed in claim 1 , wherein the first case includes any one chosen from a heat sink and a pan for radiation.
8. The plasma analyzer as claimed in claim 1 , wherein the spectrometer includes a plurality of magnifying reflectors and an imaging device.
9. The plasma analyzer as claimed in claim 1 , wherein the spectrometer is coupled by the plasma generator and optical fiber.
10. The plasma analyzer as claimed in claim 1 , wherein the spectrometer, the central controlled unit, and the plasma generator are assembled as a single module to be united.
11. The plasma analyzer as claimed in claim 1 , wherein a shielding plate is further disposed between the plasma generator and the spectrometer so as to shield any one chosen from heat and electromagnetic noise.
PCT/KR2007/001971 2007-03-14 2007-04-23 Plasma analyzer WO2008111701A1 (en)

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