WO2009012752A1

WO2009012752A1 - Filter element that can be treated by uv radiation, and filter device, protective breathing mask, and protective breathing kit comprising such a filter element

Info

Publication number: WO2009012752A1
Application number: PCT/DE2008/001159
Authority: WO
Inventors: Karl F. Massholder
Original assignee: Massholder Karl F
Priority date: 2007-07-24
Filing date: 2008-07-18
Publication date: 2009-01-29
Also published as: DE102007034879A1

Abstract

A filter element (1) with a through-flow area for a fluid is proposed, which filter element (1) comprises a filter material (2). With a view to easier and improved antimicrobial treatment of the filter material (2), and with a view to improved deposition of microorganisms, this filter element (1) is configured such that the filter material (2) transmits and/or conducts UV radiation with a wavelength of ca. 450 nm or less. A filter device, a protective breathing mask and a protective breathing kit are also proposed on the basis of the filter element (1) according to the invention.

Description

UV-RADIATION TREATABLE FILTER ELEMENT AND FILTER EQUIPMENT, RESISTANCE MASK AND

AIR PROTECTION SET WITH SUCH FILTER ELEMENT

The invention relates to a filter element with a flow-through zone for a fluid, wherein the filter element comprises a filter material. The invention further relates to a filter device with such a filter element and a UV radiation source. Moreover, the invention relates to a respirator with such a filter device. Finally, the invention also relates to a respirator set comprising a respirator and a UV base station.

Filter elements of the type mentioned are known from virtually every field of the art. Such filters are generally used for cleaning fluids, such as air. The air flows through the flow zone from the inlet to the outlet of the filter. Such a filter generally has a predetermined transmission characteristic. Depending on this transmission characteristic, the filter retains impurities of the fluid flowing through, which exceed a predetermined size or have specific electrostatic properties.

The impurities mentioned may have dirt particles or the like. Foreign body. These foreign bodies should be retained in the filter, so that at the outlet of the filter, a fluid freed from certain ingredients can be obtained. In some applications, the filter should also retain microorganisms, in particular bacterial cell agglomerates which adhere to dust or water droplets, but also spores, individual bacteria, viruses and the like.

Such a cleaning effect is expected in particular in filters which are designed for the purification of breathing air, for example in respirators. In practice, however, it has been found that the cleaning effect of filter elements comprising a conventional filter material is limited, in particular with regard to protection against microorganisms. For example. For example, microorganisms may settle in the filter material and even form cultures that can re-contaminate the effluent air. On the surface of the filter material, it can lead to the formation of a so-called. Biofilm. In the worst case, a so-called "breakthrough" of the microorganisms through the filter element finally occurs.Furthermore, such filters can release microorganisms for a long time after discontinuous loading after a particularly large load thrust Filter leaving air is even more heavily loaded than the incoming, to be cleaned air.

In general, filter elements with a conventional filter material can only achieve a satisfactory separation efficiency for microorganisms by reducing the pore size, i. the diameter of the flow paths for the fluid to be cleaned, is reduced to a very low value (generally less than 1 micron). With such a small pore diameter, however, the flow rate of the filter element decreases rapidly, which must be compensated by a very large pressure difference between inlet and outlet.

Furthermore, the manual maintenance of microorganism-loaded filters of conventional filter material poses an increased risk of infection for the maintenance personnel as well as the entire environment, which is highly undesirable, especially in the healthcare sector.

From DE 197 16 277 A1 a filter element is known, which has a filter material that is permeable or conductive for UV radiation in a limited wavelength range. In the process, microorganisms present in the filter material can be killed by exposure to UV radiation.

The generic filter element is disadvantageous in that it is not permeable to a large part of the wavelength spectrum of the incident light. This hinders optimal antimicrobial treatment of the filter material. on the other hand is disadvantageous that the applied UV radiation in the generic filter element does not reach into the interior of the filter material. Therefore, in the generic filter element, a UV radiation source must either be positioned within the filter material, or it must be a small size filter element, so that irradiated UV light can penetrate into all areas of the filter element.

The present invention is therefore based on the object to design a filter element of the type mentioned and further, that a simplified and improved antimicrobial treatment of the filter material and an improved separation efficiency of the filter element for microorganisms is achieved during exposure to UV radiation. Furthermore, the present invention has for its object to provide a filter device, a respirator and a respirator with such a filter element.

The above object is achieved with respect to a filter element having the features of claim 1. Thereafter, a generic filter element is characterized in that the filter material for UV radiation having a wavelength of about 450 nm or less is permeable and / or conductive.

According to the invention, it has first been recognized that UV radiation having a wavelength of about 450 nm or less provides a particularly advantageous effect in the treatment of microbial contaminants. Consequently, the filter element according to the invention has a filter material which is permeable and / or conductive for radiation in this wavelength range.

Furthermore, it has been recognized in the present invention that a combination of transmissivity and conductivity of the incoming UV light filtering material allows a UV radiation source to be positioned outside the filter element. In the filter element according to the invention, it is still possible to reach each point of the filter material with irradiated UV light. Regions of the filter material located near the UV radiation source are achieved because the filter material is transparent to UV radiation. However, further spaced areas of the filter material are also achieved, since the filter material at the same time - A -

having photoconductive properties, whereby the UV radiation can penetrate the surface of the filter material and is passed through the material to shaded areas of the filter element.

The inventive combination of radiation transmission and radiation conductivity represents a departure from the generic state of the art, which only provides a respective permeability or conductivity.

With the filter element according to the invention, even large-volume or large-area filter materials with a UV radiation source positioned outside the filter element can be treated simply and safely antimicrobially. Thus, an improved separation performance of the filter element for microorganisms is achieved during exposure to UV radiation.

In a first embodiment of the invention, the filter material for UV radiation having a wavelength of about 380 nm to about 420 nm, in particular for UV radiation having a wavelength of about 400 nm to about 420 nm, permeable and / or conductive. In these wavelength ranges, a particularly effective antimicrobial effect of UV radiation has been found.

In a further development of the inventive concept, the pore diameter within the flow-through zone is approximately 1 μm to approximately 10 μm, and in a particularly preferred manner is approximately 1 μm to approximately 2 μm. As already mentioned, a conventional filter which is suitable for the deposition of microorganisms, in particular of viruses, must have a pore diameter of about 1 μm or less. The pore diameter within the flow-through zone indicates the diameter of the flow path for the fluid to be filtered. With the filter element according to the invention it is now possible to increase this diameter significantly, whereby the flow rate increases and the pressure drop across the filter seen decreases significantly. In this case, the filter material preferably has a defined pore size, wherein the size of the pores varies only slightly compared to adjacent pores. In the case of the filter element according to the invention, in addition to the conventional mechanical filtering effect, the antimicrobial treatment by UV radiation is made possible. The fluid flowing through the filter occurs as in a conventional one Filter through the pores of the flow zone. Larger particles are retained mechanically. Although smaller microorganisms can theoretically pass through the filter, they are killed during passage through the penetrating UV light. The same applies to the mechanically retained larger microorganisms. In other words, microorganisms of any size are inactivated even if the smallest pore diameter of the flow area of the filter element is larger than the diameter of the smallest microorganism found in the fluid to be treated.

In a particularly preferred manner, the filter material has photoconductive properties. This means that conduction paths for the irradiated light are formed within the filter material, for example by means of light conductors arranged in the filter material or in that the filter material has light-conducting particles. These may in particular be elongated elements, for example fibers.

Preferably, the filter material comprises a polymer or a polymer mixture. Such a material is easy to manufacture and handle. The pores of the flow-through zone or the flow paths for the fluid can be formed by foaming the polymer. Alternatively, a porous polymer may be used. In the case of the materials mentioned, the pore diameter can generally be adjusted well and shows only slight fluctuations over the entire filter material.

In a preferred embodiment, the filter material comprises fibers. These may be polymer fibers. Furthermore, the filter material may consist of a polymer in which fibers are dispersed. The fibers preferably have photoconductive properties. The fibers can form a plurality of points of contact with each other. Irradiated UV light can then pass from fiber to fiber at the interfaces between individual fibers as the fibers pass UV radiation. At the points of contact, the direct transfer of UV radiation from one fiber to the next takes place. As a result, the UV radiation can also reach areas which have a greater distance from the surface of the filter element. The UV radiation can enter the fibers at the surface of the filter element according to the invention As a result, the available filter cross-sectional area can be made large without fear that the deactivating effect of the filter device will be at a greater distance from the UV radiation source falls below a minimum value.

With respect to the aforementioned embodiment, as the optical fiber, fibers having a diameter of about 0.5 μm to about 500 μm are preferred. Such fibers are particularly suitable for forming the filter material for the filter element according to the invention. The pores for the fluid flowing through form between the fibers lying close together.

In general, an embodiment of the invention is preferred in which the filter material comprises a nonwoven material, in particular a nonwoven. Such a nonwoven material is particularly suitable for simultaneously providing a transmittance of irradiated UV light and also a certain optical conductivity. In this case, a nonwoven material is preferably used which comprises the aforementioned fibers. Accordingly, emitted light from an adjacent UV radiation source may penetrate into the translucent structure of the nonwoven material, whereby antimicrobially treatable adjacent portions of the filter material to the UV radiation source. On the other hand, within the nonwoven material, the UV radiation can be transmitted to remote areas which are actually located in the shadow of the UV radiation source.

In a very particularly preferred development, the filter material according to the invention comprises a semiconductor material, in particular a photosemiconductor material. In addition to the mechanical filtering effect of the filter material and any existing direct irradiation of UV light, the semiconductor material causes a further inactivation of microorganisms. By incident UV radiation, the semiconductor material is excited, that is photoactivated. Photo activation means here that the light absorption in the semiconductor material raises electrons from the valence band into the conduction band. This results in a redox potential, which leads to the destruction of microorganisms or to the hindrance of their multiplication via the formation of radicals. The semiconductor changes in chemical terms Not, therefore acts as a catalyst. In addition or as an alternative to inactivating the microorganisms, unwanted oxidizable ingredients of the fluid to be purified can also be broken down, such as, for example, nicotine, solvents, formaldehyde and the like.

The proportion of the semiconductor material to the filter material may be about 0.5 wt .-% to about 2 wt .-%, and may be in particular about 1 wt .-%. Consequently, the semiconductor material can already develop a beneficial effect at low concentration.

The semiconductor material may be distributed on the surface of the filter material and / or dispersed in filter material. In other words, it is possible to subsequently treat the usable filter material with the semiconductor material so that the semiconductor molecules deposit on the surface of fibers of the filter material. In particular, the flow paths or pores for the fluid can be treated, whereby an economical use of semiconductor material is possible. Furthermore, there is the least possible effect on the permeability and conductivity of the filter material with respect to incident UV light. Alternatively, the semiconductor material can already be dispersed therein during the production of the filter material. Accordingly, the semiconductor material is found both in and on the particles which form the filter material. These particles are in particular polymer fibers. Consequently, the semiconductor material can be added before an injection molding process, so that polymer fibers containing semiconductor material are produced from the outset. In general, it is sufficient if the semiconductor material is present in a thin layer whose thickness may be a few molecules. It may also be sufficient to attach the semiconductor material only in certain areas of the filter material, as long as it is ensured that all portions of the fluid to be cleaned come into contact with the semiconductor material when passing through the filter element.

In a preferred embodiment, the semiconductor material comprises titanium dioxide. Titanium dioxide is thermally stable and extremely inert chemically. It is also lightfast, inexpensive and completely non-toxic, making it ideal for use in filters suitable for breathing air. The effect of titanium dioxide as a photo semiconductor material can be significantly enhanced by an oxidizing agent such as, for example, hydrogen peroxide.

With regard to the aforementioned embodiment, a development is preferred in which the proportion of the modification of anatase on the titanium dioxide is about 75% by weight to about 95% by weight, in particular about 85% by weight. Titanium dioxide occurs in nature in three modifications. The most common modifications are anatase and rutile. It has been found that titanium dioxide with the above-mentioned content of anatase provides surprisingly good results in the above-described antimicrobial treatment with the aid of UV radiation. Accordingly, the semiconductor material of a particularly preferred embodiment contains about 85% by weight of anatase and about 15% by weight of rutile. However, the exact composition may vary, so that a particularly effective formulation may also contain a small proportion of the third modification brookite.

With regard to a filter device, the above-indicated object is achieved with the features of patent claim 14. Thereafter, a filter device according to the invention comprises a filter element according to the invention and a UV radiation source, wherein the UV radiation source is arranged so that the filter element can be acted upon by UV radiation. With the filter device according to the invention, a ready-to-use device is specified in which a filter element according to the invention can be treated antimicrobially with the intended UV radiation source. Furthermore, fluids flowing through can be treated antimicrobially. These can be both gases and liquids.

In a first embodiment, the UV radiation source emits UV radiation having a wavelength of about 253 nm to about 450 nm, and in particular emits UV radiation having a wavelength of about 380 nm to about 420 nm , larger range is advantageous in that the inactivation effect is enhanced. It has been found that the wavelength range around 254 nm has its own biocidal effect and thus can inactivate germs in addition to the longer waves. To realize this wavelength spectrum can also several UV radiation sources are used. Said narrower wavelength range is preferred in view of a particularly defined inactivation effect as well as with regard to a defined passage of the light and a defined light conduction within the filter material. This range corresponds approximately to that emitted by available UV light emitting diodes (LED).

Accordingly, the UV radiation source may comprise one or more mercury (Hg) low pressure radiators and / or one or more UV light emitting diodes (LED). With a Hg low-pressure radiator shorter wavelengths and a wider wavelength spectrum can be realized. UV LEDs are preferred for smaller size and lower power consumption.

According to a particularly preferred development of the filter device, the UV radiation source is arranged outside the filter element. Reference is made to avoid repetition on the comments in relation to the filter element.

The UV radiation source may be arranged adjacent to the filter element. In this case, in the area of the filter material which is directly exposed to UV radiation, light in the manner according to the invention is shaded areas. Since at the same time there is a permeability to UV radiation, the UV radiation can at the same time penetrate directly into the filter material. As a result, enforcement of the entire filter element with UV light can be achieved. The UV radiation source can also be arranged so that it touches the surface of the filter element at least partially, whereby a particularly effective coupling of UV radiation is made possible in the filter material.

In an alternative embodiment, the UV radiation source is arranged at a distance from the filter element, with a light guide extending between the UV radiation source and the filter element being provided. In this way, it is possible, for example for microbially particularly heavily loaded areas, to decouple the UV radiation source and the actual filter element. The filter element can be encapsulated so that no microbial contamination of the environment is to be feared. At the same time, the UV radiation source remains for the operating personnel accessible. Furthermore, it is achieved that heat radiated from the UV radiation source does not act on the filter element.

The above object is achieved with respect to a respirator with the features of claim 20. Thereafter, a respirator with a housing and a holding device is specified, which is characterized by a filter device according to the invention. The housing is to be understood as meaning that part of a respiratory mask which on the one hand holds the filter device and on the other hand encloses at least the mouth and nose region of the user. Furthermore, usually a holding device is provided, which encloses the back of the head of the user and is connected to the housing, that the housing is pressed onto the oral or facial area.

The proposed respirator mask comprises both a filter element according to the invention and a UV radiation source, so that a mobile use of the filter device is made possible. Thus, the filter element contained in the respirator mask can be applied periodically or continuously with UV radiation, in one of the aforementioned types. Due to the particularly advantageous passage characteristic of the filter element according to the invention, breathing is significantly easier than with a conventional respirator mask. At the same time, the possibility of UV irradiation of the filter element ensures reliable protection of the user from contamination by microorganisms.

The UV radiation source may include one or more UV LEDs. UV LEDs are particularly small and can be easily placed in a housing. In addition, the power consumption of these LEDs is relatively low, creating a mobile use is possible. The one or more UV LEDs can be arranged, for example, in the transition between the housing and the filter element and act on the filter element in one of the aforementioned types with UV radiation. If several UV LEDs are provided, they can completely surround the filter element at a certain distance from each other, so that a particularly effective irradiation can be realized. According to a particularly preferred development, the UV radiation source of the respirator mask is powered by an accumulator or by a battery. As a result, the greatest possible mobility when wearing the respirator according to the invention is achieved. The accumulator or the battery can be arranged in the housing of the respiratory mask, for example below the filter element. Furthermore, the respirator may have a charge indicator for the accumulator or a voltage indicator for the battery. This reliably prevents the device from being unnoticed by the user due to a too low voltage. Furthermore, an acoustic signal can be provided which warns the user when a predetermined minimum value of the supply voltage is undershot.

As an alternative or in addition to the proposed UV LED, the UV radiation source of the respiratory mask can have one or more mercury (Hg) low-pressure lamps. Although these radiators require more space than the LED and have a higher power consumption, but also have a higher radiation power and emit a broader wavelength spectrum of UV radiation. The use of Hg low-pressure jet in the respirator according to the invention is particularly advantageous if the surrounding air is contaminated with particularly dangerous germs and necessarily a complete inactivation of these germs must be ensured. Therefore, in particular, the use in safety laboratories, where the respirator may possibly be equipped with a power cable to supply the Hg low-pressure lamps and can be worn by the user without major restrictions on his mobility is particularly suitable.

Accordingly, an embodiment is preferred in which in the respirator, in particular in the housing, a connection for the power supply of the UV radiation source is formed. On the one hand, this can be the connection for a power cable. On the other hand, a connection for a charger can be provided with which an accumulator arranged in the respiratory mask can be recharged after use, without having to remove the accumulator from the respiratory mask. Finally, the above-mentioned object with respect to a breathing protection set with the features of claim 25 is achieved. Thereafter, a respiratory protective set comprises a respiratory mask with a filter element according to the invention and a UV base station which has at least one UV radiation source, wherein the respirator can be positioned on or in the UV base station so that the filter element can be exposed to UV radiation.

With the respiratory protection set according to the invention, it is possible to treat a respiratory mask periodically with UV radiation in order to inactivate microorganisms contained in the filter element. The respirator can be used in a conventional manner, for example to protect against microbial contamination in a laboratory. After a certain useful life has elapsed, the respirator can now be placed on or in the UV base station and treated with UV radiation. This prevents the growth of mechanically retained microorganisms in the filter. The mask is always germ-free for reuse. An accumulation or even a breakthrough of microorganisms due to a long life in the contaminated state is excluded.

The UV radiation source of the respiratory protection set according to the invention may comprise one or more low-pressure mercury radiators and / or one or more UV LEDs. With respect to the features and advantages of the respective radiation sources, reference is made to the above statements.

In a preferred embodiment, the UV base station of the respirator kit has a housing shielding the UV radiation source. This protects the environment from UV rays. Furthermore, the largest possible proportion of the emitted radiation is available for the treatment of the filter element.

In this case, an embodiment is preferred in which the respirator can be received in the housing. Alternatively, an embodiment of the housing is possible in which the filter element of the respiratory mask can be treated by applying or placing the mask on or on the housing. For this purpose, the housing may, for example, have a transparent pane onto which the respiratory mask can be placed. The housing expediently has a power connection or an internal power supply of the UV radiation source via an accumulator or a battery.

According to a preferred development, the UV base station of the respirator set has means for automatically carrying out a predetermined treatment cycle for the filter element. For this purpose, the housing may have an electronic component in which such a treatment cycle is stored and started at the user's option and then runs automatically. Definable parameters for such a treatment cycle are, for example, the treatment duration and the irradiation intensity. It may appear advantageous to vary the irradiation intensity during the treatment cycle.

There are now various possibilities for designing and developing the teaching of the present invention in an advantageous manner. For this purpose, on the one hand to refer to the subordinate claims and on the other hand to the following explanation in each case a preferred embodiment of the filter device according to the invention and the respirator according to the invention. In conjunction with the explanation of the preferred embodiments with reference to the drawings, generally preferred embodiments and developments of the teaching are explained. In the drawing show

1 is a schematic sectional view of an embodiment of the filter device according to the invention,

Fig. 2 is a side schematic sectional view of an embodiment of the respirator according to the invention, and

3 is a frontal schematic sectional view of the respirator of FIG. 2. Fig. 1 shows a schematic sectional view of a preferred embodiment of the filter device according to the invention. A filter element 1 according to the invention, which has a filter material 2, is arranged in a housing 3. Between the upper and the lower part of the housing 3, flow paths or pores for the fluid to be cleaned are formed in the filter material 2.

In this case, the fluid to be cleaned flows through the filter material 2 from left to right, which is indicated by the thick black arrows. Accordingly, the left edge of the filter element 1 serves as inlet 4 and the right edge of the filter element 1 as outlet 5 for the fluid. Between the upper and the lower part of the housing 3, the filter element 1 has a flow-through zone for the fluid. In this particular case, the fluid to be cleaned is air which is to be freed from microorganisms in particular.

In accordance with the invention, a UV radiation source 6 is arranged outside of the filter element 1, namely in the housing 3. With the UV radiation source 6, the filter material 2 can be acted upon by UV light.

The filter element 1 has a predetermined transmission characteristic. In other words, the pores or the flow paths for the fluid have a precisely defined maximum size, so that particles which exceed this maximum size are retained in the filter material 2. Other particles whose size is less than the pore diameter can pass through the filter, but are exposed to the UV radiation during this time and can thus be inactivated. Similarly, larger particles are inactivated, which are mechanically retained in the filter. As a result, an increase or culture formation of microorganisms in the filter and ultimately a "breakthrough" of microbes through the filter material 2 is prevented.

The UV radiation source 6 is supplied with electrical energy via an electrical connection, through an accumulator or through a battery (not shown). The filter material 2 is transparent and / or conductive to ultraviolet radiation having a wavelength of about 450 nm or less. For this purpose, the filter material 2 consists of polymer fibers, which are additionally provided on the surface with the photo semiconductor titanium dioxide. The fibers of the filter material 2 are close to each other and form a nonwoven material, namely a nonwoven.

The light emitted by the UV radiation source 6 can penetrate areas of the filter material 2 near the edge and thus kill microorganisms directly or by means of the photoactivation of the titanium dioxide. In addition, since the fibers of the filter material 2 have light-conducting properties, the UV radiation is simultaneously "coupled" into the filter element 1 on the surface of the filter material 2 and thereby transported into all regions of the filter element 1.

In addition, the fibers scatter a portion of the UV radiation so that some of the light also exits the fiber surface. There, the scattered UV light can impinge on the photo-semiconductor titania and activate it.

The oxidizing effect of the photoactivated semiconductor is not limited to microorganisms. Other contaminants such as nicotine, formaldehyde, aromatic solvents (in particular PCBs) and the like can thus be oxidized in such a way that they are no longer present in the outlet 5 or in a concentration which is no longer harmful.

With the proposed filter device can be achieved excellent results in the sterilization of gases. In this case, the UV radiation source 6 can also be arranged in a (not shown) side wall of the housing 3. Alternatively, the UV radiation source 6 can also be arranged outside the housing 3, and it can be provided between the UV radiation source 6 and the filter element 1, a light guide with which the filter material 2 is still acted upon by the UV radiation.

Fig. 2 shows a lateral schematic sectional view of a preferred embodiment of the respirator according to the invention. The respirator has a filter element 1, which is fixed in a housing 3 ^' . The housing 3 ^' serves on the one hand for holding the filter element 1 and on the other hand for shielding at least the mouth and nose of the user from uncleaned ambient air. By the filter material 2 of the filter element 1, the ambient air of dirt, especially microorganisms, free. The filter material 2 is designed in such a way as has been described with reference to the filter device according to the invention in Fig. 1. Alternatively, the filter material 2 can be designed according to any of the embodiments described above for the filter element 1 according to the invention. The flow of supplied or discharged breathing air into the housing 3 ^' or out of the housing 3 ^' is clarified by the broad arrows. Here, the left edge of the filter element 1 is formed as an inlet 4 and the right edge as an outlet 5 for the supplied breathable air.

In accordance with the invention, a UV radiation source 6 is arranged in the housing 3 ^' , namely below the filter element 1. This UV radiation source 6 has a UV LED 7. The UV LED 7 is powered by the further below, but also in the housing 3 ^' arranged battery 8 with power. Alternatively, instead of the battery 8, an accumulator may be provided. Furthermore, the respirator can be connected directly to a power supply with a power cable.

By UV-LED 7 both in the filter material 2 retained and the filter element 1 passing microorganisms can be exposed to UV radiation and destroyed, namely as described above. In this case, the entire filter material 2 is achieved by the emitted UV radiation, namely on the one hand due to the permeability and on the other hand due to the conductivity of the filter material 2 for the irradiated UV light.

Fig. 3 shows a frontal schematic sectional view of the respirator according to the invention. On the housing 3 ^' , a holding device 9 is arranged, with which the respirator can be positioned and held in front of the mouth or nose area of the user. In this figure, the black arrows show particularly clearly how, due to the special design of the filter material 2 used, the irradiated UV light is distributed throughout the filter element 1. The directly illuminated surface of the filter material 2 can be small, due to the Penetration and passage of the UV light in the filter material 2, however, each point of the filter element 1 is achieved, with an immediate inactivation or an indirect inactivation of microorganisms via the action of the existing photo semiconductor material takes place.

For this reason, in the respiratory mask according to the invention, the pore width of the filter material 2 can be increased, whereby the breathing is significantly facilitated. It is achieved despite the larger pore size safe inactivation of microorganisms.

Finally, it should be emphasized that the embodiments described above discuss the claimed teaching, but do not limit it to the exemplary embodiments.

LIST OF REFERENCE NUMBERS

1 filter element

2 filter material

3 housing (filter device)

3 ^' housing (respirator)

4 inlet

5 outlet

6 UV radiation source

7 UV light emitting diode (UV LED)

8 battery

9 holding device

Claims

claims

1. Filter element (1) with a flow-through zone for a fluid, wherein the filter element (1) has a filter material (2), characterized in net that the filter material (2) for UV radiation having a wavelength of about 450 nm or less permeable and / or conductive.

2. Filter element (1) according to claim 1, characterized in that the filter material (2) for UV radiation having a wavelength of about 380 nm to about 420 nm, in particular for UV radiation having a wavelength of about 400 nm to about 420 nm, is permeable and / or conductive.

3. Filter element (1) according to claim 1 or 2, characterized in that the pore diameter within the flow zone about 1 .mu.m to about 10 .mu.m, in particular about 1 .mu.m to about 2 microns, is.

4. Filter element (1) according to one of claims 1 to 3, characterized in that the filter material (2) has light-conducting properties.

5. Filter element (1) according to one of claims 1 to 4, characterized in that the filter material (2) comprises a polymer or a polymer mixture.

6. Filter element (1) according to one of claims 1 to 5, characterized in that the filter material (2) comprises fibers.

7. Filter element (1) according to claim 6, characterized in that the fibers have a diameter of about 0.5 microns to about 500 microns.

8. Filter element (1) according to one of claims 1 to 7, characterized in that the filter material (2) comprises a nonwoven material, in particular a nonwoven.

9. Filter element (1) according to one of claims 1 to 8, characterized in that the filter material (2) comprises a semiconductor material, in particular a photo semiconductor material.

10. Filter element (1) according to claim 9, characterized in that the proportion of the semiconductor material to the filter material (2) about 0.5 wt .-% to about 2 wt .-%, in particular about 1 wt .-% , is.

11. Filter element (1) according to claim 9 or 10, characterized in that the semiconductor material on the surface of the filter material (2) distributed and / or dispersed in the filter material (2).

12. Filter element (1) according to any one of claims 9 to 11, characterized in that the semiconductor material comprises titanium dioxide.

13. Filter element (1) according to claim 12, characterized in that the proportion of the modification anatase in the titanium dioxide about 75 wt .-% to about 95 wt .-%, in particular about 85 wt .-%, is.

14. Filter device with a filter element (1) according to one of claims 1 to 13 and a UV radiation source (6), wherein the UV radiation source (6) is arranged so that the filter element (1) can be acted upon by UV radiation.

15. Filter device according to claim 14, characterized in that the UV radiation source (6) emits UV radiation having a wavelength of about 253 nm to about 450 nm, in particular from about 380 nm to about 420 nm.

16. Filter device according to claim 14 or 15, characterized in that the UV radiation source (6) has one or more Hg low-pressure radiators and / or one or more UV LEDs (7).

17. Filter device according to one of claims 14 to 16, characterized in that the UV radiation source (6) outside of the filter element (1) is arranged.

18. Filter device according to claim 17, characterized in that the UV radiation source (6) is arranged adjacent to the filter element (1).

19. Filter device according to claim 17, characterized in that the UV radiation source (6) from the filter element (1) is arranged at a distance, and that a light guide between the UV radiation source (6) and the filter element (1) is provided.

20. A respirator with a housing (3 ^' ) and a holding device (9), characterized by a filter device according to one of claims 14 to 19.

21. Respiratory mask according to claim 20, characterized in that the UV radiation source (6) has one or more UV LEDs (7).

22. Respiratory mask according to claim 20 or 21, characterized in that the UV radiation source (6) by an accumulator or a battery (8) is fed.

23. A respirator according to any one of claims 20 to 22, characterized in that the UV radiation source (6) has one or more Hg low-pressure lamps.

24. Respiratory mask according to one of claims 20 to 23, characterized in that in the respirator, in particular in the housing (3 ^' ), a connection for the power supply of the UV radiation source (6) is formed.

25. A respiratory protective set comprising a respiratory mask with a filter element (1) according to one of claims 1 to 13 and a UV base station, which has at least one UV radiation source (6), wherein the respirator can be positioned on or in the UV base station is that the filter element (1) can be acted upon by UV radiation.

26. Respiratory protection set according to claim 25, characterized in that the UV radiation source (6) has one or more Hg low-pressure radiators and / or one or more UV LEDs (7).

27. Respiratory protection set according to claim 25 or 26, characterized in that the UV base station has a UV radiation source (6) shielding housing.

28. Respiratory protection set according to claim 27, characterized in that the respirator can be received in the housing.

29. Breathing protector set according to one of claims 25 to 28, characterized in that the UV base station comprises means for automatically carrying out a predetermined treatment cycle for the filter element (1).