WO2009108136A1 - Substrate cavity semiconductor package - Google Patents

Substrate cavity semiconductor package Download PDF

Info

Publication number
WO2009108136A1
WO2009108136A1 PCT/SG2009/000076 SG2009000076W WO2009108136A1 WO 2009108136 A1 WO2009108136 A1 WO 2009108136A1 SG 2009000076 W SG2009000076 W SG 2009000076W WO 2009108136 A1 WO2009108136 A1 WO 2009108136A1
Authority
WO
WIPO (PCT)
Prior art keywords
substrate
semiconductor package
semiconductor chip
semiconductor
top surface
Prior art date
Application number
PCT/SG2009/000076
Other languages
French (fr)
Inventor
Wei Fan
Chee Wai Albert Lu
Kai Meng Chua
Boon Keng Lok
Original Assignee
Agency For Science, Technology And Research
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency For Science, Technology And Research filed Critical Agency For Science, Technology And Research
Publication of WO2009108136A1 publication Critical patent/WO2009108136A1/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L25/00Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
    • H01L25/03Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes
    • H01L25/04Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers
    • H01L25/075Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L33/00
    • H01L25/0753Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L33/00 the devices being arranged next to each other
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/34Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
    • H01L23/36Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
    • H01L23/367Cooling facilitated by shape of device
    • H01L23/3677Wire-like or pin-like cooling fins or heat sinks
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/52Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
    • H01L23/538Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames the interconnection structure between a plurality of semiconductor chips being formed on, or in, insulating substrates
    • H01L23/5389Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames the interconnection structure between a plurality of semiconductor chips being formed on, or in, insulating substrates the chips being integrally enclosed by the interconnect and support structures
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/18High density interconnect [HDI] connectors; Manufacturing methods related thereto
    • H01L24/23Structure, shape, material or disposition of the high density interconnect connectors after the connecting process
    • H01L24/24Structure, shape, material or disposition of the high density interconnect connectors after the connecting process of an individual high density interconnect connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L24/82Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected by forming build-up interconnects at chip-level, e.g. for high density interconnects [HDI]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/18High density interconnect [HDI] connectors; Manufacturing methods related thereto
    • H01L2224/23Structure, shape, material or disposition of the high density interconnect connectors after the connecting process
    • H01L2224/24Structure, shape, material or disposition of the high density interconnect connectors after the connecting process of an individual high density interconnect connector
    • H01L2224/241Disposition
    • H01L2224/24101Connecting bonding areas at the same height
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/18High density interconnect [HDI] connectors; Manufacturing methods related thereto
    • H01L2224/23Structure, shape, material or disposition of the high density interconnect connectors after the connecting process
    • H01L2224/24Structure, shape, material or disposition of the high density interconnect connectors after the connecting process of an individual high density interconnect connector
    • H01L2224/241Disposition
    • H01L2224/24151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/24221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/24225Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/24227Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation the HDI interconnect not connecting to the same level of the item at which the semiconductor or solid-state body is mounted, e.g. the semiconductor or solid-state body being mounted in a cavity or on a protrusion of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32151Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/32221Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/32225Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73267Layer and HDI connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/74Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies and for methods related thereto
    • H01L2224/76Apparatus for connecting with build-up interconnects
    • H01L2224/7615Means for depositing
    • H01L2224/76151Means for direct writing
    • H01L2224/76155Jetting means, e.g. ink jet
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/82Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected by forming build-up interconnects at chip-level, e.g. for high density interconnects [HDI]
    • H01L2224/821Forming a build-up interconnect
    • H01L2224/82101Forming a build-up interconnect by additive methods, e.g. direct writing
    • H01L2224/82102Forming a build-up interconnect by additive methods, e.g. direct writing using jetting, e.g. ink jet
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/91Methods for connecting semiconductor or solid state bodies including different methods provided for in two or more of groups H01L2224/80 - H01L2224/90
    • H01L2224/92Specific sequence of method steps
    • H01L2224/922Connecting different surfaces of the semiconductor or solid-state body with connectors of different types
    • H01L2224/9222Sequential connecting processes
    • H01L2224/92242Sequential connecting processes the first connecting process involving a layer connector
    • H01L2224/92244Sequential connecting processes the first connecting process involving a layer connector the second connecting process involving a build-up interconnect
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01027Cobalt [Co]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01033Arsenic [As]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01047Silver [Ag]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01079Gold [Au]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01082Lead [Pb]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/095Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00 with a principal constituent of the material being a combination of two or more materials provided in the groups H01L2924/013 - H01L2924/0715
    • H01L2924/097Glass-ceramics, e.g. devitrified glass
    • H01L2924/09701Low temperature co-fired ceramic [LTCC]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/12Passive devices, e.g. 2 terminal devices
    • H01L2924/1204Optical Diode
    • H01L2924/12041LED
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/14Integrated circuits
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/146Mixed devices
    • H01L2924/1461MEMS
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/1515Shape
    • H01L2924/15153Shape the die mounting substrate comprising a recess for hosting the device
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/15165Monolayer substrate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/181Encapsulation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/19Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
    • H01L2924/1901Structure
    • H01L2924/1904Component type
    • H01L2924/19041Component type being a capacitor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/19Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
    • H01L2924/1901Structure
    • H01L2924/1904Component type
    • H01L2924/19043Component type being a resistor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/30Technical effects
    • H01L2924/301Electrical effects
    • H01L2924/30107Inductance
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/48Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • H01L33/483Containers

Abstract

A semiconductor package (10), said package comprising: a substrate (12); a cavity (14) formed within the substrate; a semiconductor chip (16) situated in the cavity. The semiconductor chip comprises a plurality of circuit contacts (30) extending from the semiconductor chip, proximate a periphery of the cavity. Conductive traces (32) are formed on the top surface of the substrate, and electrical interconnections (34) bridge the circuit contacts of the semiconductor chip to the conductive traces of the substrate. Conveniently, the semiconductor chip may be flush with the top surface of the substrate. The circuit contacts may extend from the top surface of the semiconductor chip.

Description

SUBSTRATE CAVITY SEMICONDUCTOR PACKAGE
CROSS-REFERENCE TO RELATED APPLICATIONS
[0001] This application claims benefits from U.S. Provisional Patent
Application No. 61/064,316 filed February 27, 2008, the contents of which are hereby incorporated herein by reference.
FIELD OF THE INVENTION
[0002] The present invention relates to semiconductor packages, and more particularly to a semiconductor package with a semiconductor chip mounted within a cavity of a substrate.
BACKGROUND OF THE INVENTION
[0003] Numerous semiconductor packages are known. Typical packages include a semiconductor chip - typically an integrated circuit - attached to a substrate.
[0004] Example attachment techniques include wire bonding the semiconductor chip to the substrate; flip-chip attachment of the semiconductor chip to the substrate; or a building up the substrate to the semiconductor chip.
[0005] Each of these attachment techniques is imperfect. For example, wire bonding requires relatively lengthy interconnects between the semiconductor chip and the substrate. These introduce parasitic inductance interfering with the signal path.
[0006] Similarly, flip-chip attachment introduces capacitive interconnection paths between the semiconductor chip and substrate.
[0007] Substrate build-up around the integrated circuit requires complex process steps and is not suitable for use with many types of integrative circuits such as sensors and organic electronic devices.
[0008] Accordingly, there is a need for a new semiconductor package.
SUMMARY OF THE INVENTION
[0009] In an exemplary embodiment of the present invention, a semiconductor package, includes a substrate; a cavity formed within the substrate; a semiconductor chip situated in the cavity; the semiconductor chip comprising a plurality of circuit contacts extending from the semiconductor chip, proximate a periphery of the cavity; a conductive layer formed on a top surface of the semiconductor chip; and electrical interconnections bridging the circuit interconnects to the conductive layer. Conveniently, the semiconductor chip may be flush with the top surface of the substrate. The circuit contacts may extend from the top surface of the semiconductor chip.
[0010] Other aspects and features of the present invention will become apparent to those of ordinary skill in the art upon review of the following description of specific embodiments of the invention in conjunction with the accompanying figures.
BRIEF DESCRIPTION OF THE DRAWINGS
[0011] In the figures which illustrate by way of example only, embodiments of the present invention,
[0012] FIG. 1 is cross-sectional view of a semiconductor package, exemplary of an embodiment of the present invention;
[0013] FIG. 2 is top view of a semiconductor package, exemplary of an embodiment of the present invention;
[0014] FIG. 3 is cross-sectional view of another semiconductor package, exemplary of an embodiment of the present invention; and
[0015] FIG. 4 is cross-sectional view of another semiconductor package, exemplary of an embodiment of the present invention.
DETAILED DESCRIPTION
[0016] FIG.1 illustrates, in cross-section, a semiconductor package 10 exemplary of an embodiment of the present invention. Semiconductor package 10 includes a substrate 12 in which a cavity 14, extending from a top surface 26 is formed. An integrated circuit in the form of a semiconductor chip 16 is inserted into cavity 14. A thin adhesive layer 18 may be used to physically bond the integrated circuit 16 into cavity 14.
[0017] Filler 20, formed of the same or different material as adhesive layer 18 may fill any gap between the side walls of cavity 14 and semiconductor chip 16. Filler 20 may be formed of an epoxy.
[0018] A metal layer 24 including thermal vias 22 is formed at the bottom of cavity 14, and extends to an opposite outer surface 28 of package 10. Surface 28 may be covered with a metal layer.
[0019] Integrated circuit contacts 30, located at the periphery of semiconductor chip 16, proximate the interface between chip 16 and substrate 12, provide electrical connection to any circuit formed on semiconductor chip 16. The number of contacts 30 may depend on the nature of any circuit on chip 16, and may be limited by space available proximate the periphery of the top surface of chip 16. Circuit contacts 30 may be formed in number of ways. For example, they may be formed on the top surface of semiconductor chip 16, as conductive (e.g. metal) pads on semiconductor chip 16.
[0020] Conductive traces 32 may be printed on top surface 26 of substrate 12 to route electrical signals from and to semiconductor chip 16. Traces 32 on substrate 12 may interconnect a circuit on chip 16 to other circuits (also on semiconductor chips) provide input/outputs, electric power, or the like. Traces 32 may be formed of metal, such as silver, gold or the like. They may, for example, be ink, that is screen printed, deposited, or jet printed on surface 26.
[0021] An interconnecting material 34, such as silver may bridge the connection between contacts 30 on the top surface of integrated circuit chip 16 and traces 32 on top surface 26.
[0022] Optionally, an encapsulant (not shown) may be formed atop interconnecting material 34 to electrically insulate the interconnecting material, and optionally the entire top surface 26 (including conductive traces 32) of substrate 12. Alternatively, interconnecting material 34, and the remainder of top surface 26 may be separately coated. The encapsulant may be silicon, epoxy or another molding compound.
[0023] Substrate 12 may be formed as a low-temperature co-fired ceramic (LTCC) substrate. As will be appreciated, LTCC techniques allow multiple layers to be processed in parallel and aligned stack immediately prior to firing. Each layer may include conductive material arranged to interconnect chip 16 to an external circuit. Passive components, such as resistors and capacitors, may also be included in one or more of the layers. Conductive vias may interconnect multiple layers.
[0024] As will be appreciated, cavity 14 may be formed with a depth equal to the height (or thickness) of semiconductor chip 16, and a cross-sectional area equal to larger the size of chip 16. Cavity 14 may be formed by drilling, laser cutting or the like in one or more of the multiple layers used to form substrate 12. As such, chip 16 may in some embodiments be received to be substantially flush with the top surface 26 of substrate 12, and also generally flush with the interior wall(s) of cavity 14.
[0025] Conveniently, as the top surface of semiconductor chip 16 may be generally flush with the top surface 26 of substrate 12, the top surface of chip 16 may be exposed, allowing chip 16 to act as a light source (such as a light emitting diode, laser, or the like), a micro-electrical mechanical system (a MEMS device), a sensor or the like. Conveniently, heat generated by chip 16 may be dissipated through thermal vias 22, and metal layer 24 to surface 28.
[0026] As required, top surface 26 of substrate 12 may be encapsulated and thus hermetically sealed or waterproofed. Conveniently, inexpensive ink jetting/dispensing or screen printing may provide traces to interconnect the integrated circuit on the substrate.
[0027] As will be appreciated, substrate 12 may contain several integrated circuit chips, interconnected to each other by traces 32. To this end, FIG. 2 depicts a semiconductor package 110 (like package 10 - FIG. 1), exemplary of an embodiment of the present invention. Semiconductor package 110 includes a substrate 112 (like substrate 12), having a plurality of cavities 114. Each cavity 114 receives a semiconductor chip 116, and may be interconnected with the cavity 114 in the same way semiconductor chip 16 is interconnected with cavity 14 - FIG. 1. Each semiconductor chip 116 includes at least one contact point 130, bridged to traces 132 (like traces 32) formed atop the surface of substrate 112. The multiple semiconductor chips 116 are electrically interconnected by these traces 114. In the depicted embodiment, each semiconductor chip 116 contains one or more individual light emitting diodes (LED). In the depicted embodment, the multiple semiconductor chips 116 - and LEDs are interconnected in series, with the anode of one LED interconnected with the cathode of an adjacent LED. As will be readily appreciated, the nature or semi- conductor chips 116 and the number and types of interconnects may vary from application to application.
[0028] Conveniently, a metal layer and metal vias (like metal layer 24 and vias 22 - FIG. 1) may be formed beneath each cavity 114 to guide heat from semiconductor chips 116 to the bottom surface of substrate 112.
[0029] In yet another alternate embodiment, depicted in FIG. 3, a semiconductor package 210 includes a substrate 212 in which a cavity 214 is formed. Again, an integrated circuit in the form of a semiconductor chip 216 is inserted into cavity 214 and a thin adhesive layer 218 may be used to bond the semiconductor chip 216 into cavity 214. Again, filler 220 (like filler 20), formed of the same or different material as adhesive layer 218 may fill any gap between the side walls of cavity 214 and semiconductor chip 216. Filler 220 may be formed of an epoxy.
[0030] Integrated circuit contacts 230 located at the periphery of chip 216, proximate the interface between chip 216 and substrate 212 provide electrical connection to any circuit formed on chip 216.
[0031] Conductive traces 232 may be printed on the top surface of substrate 212 to route electrical signals from and to chip 216. Traces 232, however, lead to metal vias 242 extending into substrate 212. Formed within substrate 212 is an inner conductive layer 240 that may interconnect integrated chip 216 to other integrated circuits, provide input/outputs, electric power, or the like.
[0032] An interconnecting material 234, such as silver, gold or other suitable conductive material may bridge the connection between contacts 230 on the top surface of integrated circuit chip 216 and traces 232 on the top surface of substrate 212. An encapsulant 250 may be formed atop interconnecting material 234 to electrically insulate the interconnecting material 234.
[0033] Further metal vias 248 may extend from layer 240 to interconnection points on the top or bottom surface of substrate 212, at a location distant from chip 216. These may allow for interconnection of semiconductor package to an external circuit. In the depicted embodiment, vias 248 extend to connectors 252 proximate an edge of semiconductor package 210.
[0034] Substrate 212 may again be formed as an LTCC substrate. As will be appreciated, cavity 214 may again be formed with a size equal to chip 216 - and in particular having a depth equal to the height (or thickness) of chip 216. As such, chip 216 may be received to be flush with the top surface of substrate 212. In the depicted embodiment, semiconductor chip 216 may take the form of a sensor, having a sensing area exposed on the top surface of semiconductor package 200. The sensor may be an optical, chemical, or other sensor.
[0035] Again, semiconductor package 200 may be generally waterproof - heremetically sealed by encapsulant 250, while layer 240 is sealed by the remainder of substrate 212.
[0036] In yet a further embodiment depicted in FIG. 4, a semiconductor package 200' like semiconductor package 200 (FIG. 3) may include a semiconductor chip 216' in a cavity 214' retained by adhesive layer 218' and filler 220'. A conducting layer 240' (like conducting layer 240) is formed within substrate 212'. Vias 242' extend from the top surface 226' of substrate 210' to layer 240'. A further set of vias 260 extend from layer 240' to the opposite (bottom) surface 228' to a connector 262. Connector 262 may be a surface mount (SMT) connector.
[0037] Of course, the above described embodiments, are intended to be illustrative only and in no way limiting. The described embodiments of carrying out the invention, are susceptible to many modifications of form, arrangement of parts, details and order of operation. The invention, rather, is intended to encompass all such modification within its scope, as defined by the claims.

Claims

WHAT IS CLAIMED IS:
1. A semiconductor package, comprising:
a substrate;
a cavity formed within said substrate;
a semiconductor chip situated in said cavity; said semiconductor chip comprising a plurality of circuit contacts extending from said semiconductor chip, proximate a periphery of said cavity;
a conductive layer formed on a top surface of said semiconductor chip; and
electrical interconnections bridging said circuit interconnects to said conductive layer.
2. The semiconductor package of claim 1 , wherein said circuit contacts extend from a top surface of said semiconductor chip.
3. The semiconductor package of claim 1 or 2, wherein said cavity has a depth equal to the height of said semiconductor chip.
4. The semiconductor package of any one of claims 1 to 3, wherein said top surface of said semiconductor chip is generally flush with said top surface of said substrate.
5. The semiconductor package of any one of claims 1 to 4, wherein said circuit contacts are formed near a periphery of said semiconductor chip.
6. The semiconductor package of any one of claims 1 to 4, wherein said conductive layer is printed on said top surface of said substrate.
7. The semiconductor package of any one of claims 1 to 4, wherein said conductive layer is jet-printed on said top surface of said substrate.
8. The semiconductor package any one of claims 1 to 7, further comprising a metal layer extending from a bottom of said cavity to a bottom of said semiconductor package.
9. The semiconductor package of claim 8, wherein said bottom of said semiconductor package is covered with metal.
10. The semiconductor package of claim 8, wherein said metal layer comprises thermal vias.
11. The semiconductor package of any one of claims 1 to 10, comprising an encapsulant formed atop of said top surface of said substrate to insulate said electrical interconnections.
12. The semiconductor package of any one of claims 1 to 11 , wherein said semiconductor chip comprises an optical light source, a sensor, or a MEMs device.
13. The semiconductor package of any one of claims 1 to 12, wherein said substrate is formed as low temperature co-fired ceramic.
14. The semiconductor package of any one of claims 1 to 13, further comprising at least one additional cavity, and at least one additional semiconductor chip in said additional cavity, said additional semiconductor chip comprising a plurality of circuit interconnects extending from a top surface of said additional semiconductor chip, interconnected with said conductive layer.
15. The semiconductor package of claim 14, wherein said conductive layer electrically interconnects said semiconductor chip and said additional semiconductor chip.
16. The semiconductor package of any one of claims 1 to 15, further comprising a conductive layer formed within said substrate, and at least one conductive via extending from a said conductive layer formed on said top surface to said conductive layer formed within said substrate.
17. The semiconductor package of claim 16, further comprising at least one connector mounted on a top or bottom surface of said substrate, and interconnected with said conductive layer formed within said substrate.
18. The semiconductor package of any one of claims 1 to 17, further comprising an adhesive to glue said semiconductor chip to said substrate.
19. The semiconductor package of any one of claims 1 to 18, further comprising a filler to fill any volume between an outer wall of said cavity and said semiconductor chip.
PCT/SG2009/000076 2008-02-27 2009-02-27 Substrate cavity semiconductor package WO2009108136A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US6431608P 2008-02-27 2008-02-27
US61/064,316 2008-02-27

Publications (1)

Publication Number Publication Date
WO2009108136A1 true WO2009108136A1 (en) 2009-09-03

Family

ID=41016357

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/SG2009/000076 WO2009108136A1 (en) 2008-02-27 2009-02-27 Substrate cavity semiconductor package

Country Status (1)

Country Link
WO (1) WO2009108136A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2015112828A1 (en) * 2014-01-24 2015-07-30 Qualcomm Incorporated Integrated device comprising a substrate with aligning trench and/or cooling cavity

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4999740A (en) * 1989-03-06 1991-03-12 Allied-Signal Inc. Electronic device for managing and dissipating heat and for improving inspection and repair, and method of manufacture thereof
US5397917A (en) * 1993-04-26 1995-03-14 Motorola, Inc. Semiconductor package capable of spreading heat
EP0786806A1 (en) * 1996-01-23 1997-07-30 Montpellier Technologies High I/O density package for high power wire-bonded IC chips and method for making the same
US5991162A (en) * 1997-06-27 1999-11-23 Nec Corporation High-frequency integrated circuit device and manufacture method thereof
US6175497B1 (en) * 1998-09-30 2001-01-16 World Wiser Electronics Inc. Thermal vias-provided cavity-down IC package structure
EP1487019A1 (en) * 2003-06-12 2004-12-15 Koninklijke Philips Electronics N.V. Electronic device and method of manufacturing thereof
EP1727192A1 (en) * 2005-05-23 2006-11-29 Seiko Epson Corporation Electronic substrate manufacturing method comprising embedding component in substrate by application of heat and pressure and wiring formation by ink jet printing

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4999740A (en) * 1989-03-06 1991-03-12 Allied-Signal Inc. Electronic device for managing and dissipating heat and for improving inspection and repair, and method of manufacture thereof
US5397917A (en) * 1993-04-26 1995-03-14 Motorola, Inc. Semiconductor package capable of spreading heat
EP0786806A1 (en) * 1996-01-23 1997-07-30 Montpellier Technologies High I/O density package for high power wire-bonded IC chips and method for making the same
US5991162A (en) * 1997-06-27 1999-11-23 Nec Corporation High-frequency integrated circuit device and manufacture method thereof
US6175497B1 (en) * 1998-09-30 2001-01-16 World Wiser Electronics Inc. Thermal vias-provided cavity-down IC package structure
EP1487019A1 (en) * 2003-06-12 2004-12-15 Koninklijke Philips Electronics N.V. Electronic device and method of manufacturing thereof
EP1727192A1 (en) * 2005-05-23 2006-11-29 Seiko Epson Corporation Electronic substrate manufacturing method comprising embedding component in substrate by application of heat and pressure and wiring formation by ink jet printing

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2015112828A1 (en) * 2014-01-24 2015-07-30 Qualcomm Incorporated Integrated device comprising a substrate with aligning trench and/or cooling cavity

Similar Documents

Publication Publication Date Title
CN106024772B (en) Proximity and ranging sensor
US8704101B2 (en) Package carrier and manufacturing method thereof
US7521793B2 (en) Integrated circuit mounting for thermal stress relief useable in a multi-chip module
US7732829B2 (en) Optoelectronic device submount
US9532494B2 (en) Manufacturing method of package structure
US9847236B2 (en) Electrical interconnect structure for an embedded electronics package
CN105226035B (en) Wafer encapsulation body
CN103985683B (en) Chip package
US8895871B2 (en) Circuit board having a plurality of circuit board layers arranged one over the other having bare die mounting for use as a gearbox controller
CN104347536B (en) Wafer encapsulation body and its manufacturing method
US8921995B1 (en) Integrated circuit package including a three-dimensional fan-out/fan-in signal routing
US7436680B2 (en) Multi-chip build-up package of optoelectronic chip
CN105720040B (en) Chip package and method for manufacturing the same
US8580613B2 (en) Semiconductor chip arrangement with sensor chip and manufacturing method
TW200725852A (en) Build-up package and method of an optoelectronic chip
US20190043794A1 (en) Electronics package including integrated structure with backside functionality and method of manufacturing thereof
US10068817B2 (en) Semiconductor package
CN112542451A (en) Embedded packaging concept for integrated application specific integrated circuits and optical components
CN112259507A (en) Heterogeneous integrated system-in-package structure and packaging method
US9406590B2 (en) Chip package and manufacturing method thereof
EP2790214B1 (en) Device with a micro- or nanoscale structure
CN110691457A (en) Circuit board and circuit assembly
US9171770B2 (en) Electronic device and manufacturing method thereof
WO2009108136A1 (en) Substrate cavity semiconductor package
JP2017143126A (en) Electronic apparatus and light-emitting/receiving device

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 09714073

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 09714073

Country of ref document: EP

Kind code of ref document: A1