WO2009108752A3 - Laser-induced structuring of substrate surfaces - Google Patents
Laser-induced structuring of substrate surfaces Download PDFInfo
- Publication number
- WO2009108752A3 WO2009108752A3 PCT/US2009/035239 US2009035239W WO2009108752A3 WO 2009108752 A3 WO2009108752 A3 WO 2009108752A3 US 2009035239 W US2009035239 W US 2009035239W WO 2009108752 A3 WO2009108752 A3 WO 2009108752A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- fluid
- laser pulses
- substrate
- sized
- structures
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/34—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies not provided for in groups H01L21/0405, H01L21/0445, H01L21/06, H01L21/16 and H01L21/18 with or without impurities, e.g. doping materials
- H01L21/42—Bombardment with radiation
- H01L21/423—Bombardment with radiation with high-energy radiation
- H01L21/428—Bombardment with radiation with high-energy radiation using electromagnetic radiation, e.g. laser radiation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/062—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam
- B23K26/0622—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses
- B23K26/0624—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses using ultrashort pulses, i.e. pulses of 1ns or less
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/12—Working by laser beam, e.g. welding, cutting or boring in a special atmosphere, e.g. in an enclosure
- B23K26/1224—Working by laser beam, e.g. welding, cutting or boring in a special atmosphere, e.g. in an enclosure in vacuum
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/40—Removing material taking account of the properties of the material involved
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
- H01L21/268—Bombardment with radiation with high-energy radiation using electromagnetic radiation, e.g. laser radiation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/3065—Plasma etching; Reactive-ion etching
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2101/00—Articles made by soldering, welding or cutting
- B23K2101/36—Electric or electronic devices
- B23K2101/40—Semiconductor devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/50—Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/70—Nanostructure
- Y10S977/762—Nanowire or quantum wire, i.e. axially elongated structure having two dimensions of 100 nm or less
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/70—Nanostructure
- Y10S977/813—Of specified inorganic semiconductor composition, e.g. periodic table group IV-VI compositions
- Y10S977/814—Group IV based elements and compounds, e.g. CxSiyGez, porous silicon
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/70—Nanostructure
- Y10S977/813—Of specified inorganic semiconductor composition, e.g. periodic table group IV-VI compositions
- Y10S977/815—Group III-V based compounds, e.g. AlaGabIncNxPyAsz
- Y10S977/816—III-N based compounds, e.g. AlxGayInzN
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/70—Nanostructure
- Y10S977/813—Of specified inorganic semiconductor composition, e.g. periodic table group IV-VI compositions
- Y10S977/824—Group II-VI nonoxide compounds, e.g. CdxMnyTe
Abstract
In one aspect, the present invention provides a method of processing a substrate, e.g., a semiconductor substrate, by irradiating a surface of the substrate (or at least a portion of the surface) with a first set of polarized short laser pulses while exposing the surface to a fluid to generate a plurality of structures on the surface, e.g., within a top layer of the surface. Subsequently, the structured surface can be irradiated with another set of polarized short laser pulses having a different polarization than that of the initial set while exposing the structured surface to a fluid, e.g., the same fluid initially utilized to form the structured surface or a different fluid. In many embodiments, the second set of polarized laser pulses cause the surface structures formed by the first set to break up into smaller-sized structures, e.g., nano-sized features such as nano-sized rods.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12/038,209 | 2008-02-27 | ||
US12/038,209 US7816220B2 (en) | 2008-02-27 | 2008-02-27 | Laser-induced structuring of substrate surfaces |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2009108752A2 WO2009108752A2 (en) | 2009-09-03 |
WO2009108752A3 true WO2009108752A3 (en) | 2010-01-07 |
Family
ID=40998254
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2009/035239 WO2009108752A2 (en) | 2008-02-27 | 2009-02-26 | Laser-induced structuring of substrate surfaces |
Country Status (2)
Country | Link |
---|---|
US (3) | US7816220B2 (en) |
WO (1) | WO2009108752A2 (en) |
Families Citing this family (42)
Publication number | Priority date | Publication date | Assignee | Title |
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US7442629B2 (en) | 2004-09-24 | 2008-10-28 | President & Fellows Of Harvard College | Femtosecond laser-induced formation of submicrometer spikes on a semiconductor substrate |
US7057256B2 (en) | 2001-05-25 | 2006-06-06 | President & Fellows Of Harvard College | Silicon-based visible and near-infrared optoelectric devices |
US8846551B2 (en) | 2005-12-21 | 2014-09-30 | University Of Virginia Patent Foundation | Systems and methods of laser texturing of material surfaces and their applications |
US8753990B2 (en) * | 2005-12-21 | 2014-06-17 | University Of Virginia Patent Foundation | Systems and methods of laser texturing and crystallization of material surfaces |
US20080299408A1 (en) | 2006-09-29 | 2008-12-04 | University Of Rochester | Femtosecond Laser Pulse Surface Structuring Methods and Materials Resulting Therefrom |
US10876193B2 (en) * | 2006-09-29 | 2020-12-29 | University Of Rochester | Nanostructured materials, methods, and applications |
US20100143744A1 (en) * | 2007-03-09 | 2010-06-10 | University Of Virginia Patent Foundation | Systems and Methods of Laser Texturing of Material Surfaces and their Applications |
JP2011514664A (en) * | 2008-01-31 | 2011-05-06 | プレジデント アンド フェローズ オブ ハーバード カレッジ | Engineering flat surfaces of materials doped via pulsed laser irradiation |
WO2009100023A2 (en) * | 2008-02-01 | 2009-08-13 | President & Fellows Of Harvard College | A multijunction photovoltaic device |
US7816220B2 (en) * | 2008-02-27 | 2010-10-19 | President & Fellows Of Harvard College | Laser-induced structuring of substrate surfaces |
WO2010028177A1 (en) * | 2008-09-03 | 2010-03-11 | Sionyx, Inc. | High sensitivity photodetectors, imaging arrays, and high efficiency photovoltaic devices produced using ion implantation and femtosecond laser irradiation |
US9993895B2 (en) | 2009-03-30 | 2018-06-12 | Boegli-Gravures Sa | Method and device for structuring the surface of a hard material coated solid body by means of a laser |
US8207051B2 (en) * | 2009-04-28 | 2012-06-26 | Sionyx, Inc. | Semiconductor surface modification |
WO2010127298A2 (en) * | 2009-04-30 | 2010-11-04 | Sionyx, Inc. | Low oxygen content semiconductor material for surface enhanced photonic devices associated methods |
WO2011022687A2 (en) * | 2009-08-20 | 2011-02-24 | Sionyx, Inc. | Laser processed heterojunction photovoltaic devices and associated methods |
US8476598B1 (en) | 2009-08-31 | 2013-07-02 | Sionyx, Inc. | Electromagnetic radiation imaging devices and associated methods |
US8309389B1 (en) | 2009-09-10 | 2012-11-13 | Sionyx, Inc. | Photovoltaic semiconductor devices and associated methods |
US9673243B2 (en) | 2009-09-17 | 2017-06-06 | Sionyx, Llc | Photosensitive imaging devices and associated methods |
US9911781B2 (en) | 2009-09-17 | 2018-03-06 | Sionyx, Llc | Photosensitive imaging devices and associated methods |
US8476681B2 (en) | 2009-09-17 | 2013-07-02 | Sionyx, Inc. | Photosensitive imaging devices and associated methods |
JP5961332B2 (en) | 2009-09-17 | 2016-08-02 | サイオニクス、エルエルシー | Photosensitive imaging device and related method |
WO2011050336A2 (en) * | 2009-10-22 | 2011-04-28 | Sionyx, Inc. | Semiconductor devices having an enhanced absorption region and associated methods |
US9268061B2 (en) * | 2010-02-22 | 2016-02-23 | Vaisala Oyj | Method for calibrating or testing a detector surface of a device for detecting hydrometeors and a calibration and testing device |
US8692198B2 (en) | 2010-04-21 | 2014-04-08 | Sionyx, Inc. | Photosensitive imaging devices and associated methods |
EP2583312A2 (en) | 2010-06-18 | 2013-04-24 | Sionyx, Inc. | High speed photosensitive devices and associated methods |
KR20140014121A (en) | 2010-12-21 | 2014-02-05 | 사이오닉스, 아이엔씨. | Semiconductor devices having reduced substrate damage and associated methods |
KR102025522B1 (en) | 2011-03-10 | 2019-11-26 | 사이오닉스, 엘엘씨 | Three dimensional sensors, systems, and associated methods |
US9496308B2 (en) | 2011-06-09 | 2016-11-15 | Sionyx, Llc | Process module for increasing the response of backside illuminated photosensitive imagers and associated methods |
US10131086B2 (en) | 2011-06-30 | 2018-11-20 | University Of Virginia Patent Foundation | Micro-structure and nano-structure replication methods and article of manufacture |
CN103946867A (en) | 2011-07-13 | 2014-07-23 | 西奥尼克斯公司 | Biometric imaging devices and associated methods |
US8865507B2 (en) | 2011-09-16 | 2014-10-21 | Sionyx, Inc. | Integrated visible and infrared imager devices and associated methods |
WO2013074755A1 (en) * | 2011-11-15 | 2013-05-23 | B6 Sigma, Inc. | Medical implants with enhanced osseointegration |
US9064764B2 (en) | 2012-03-22 | 2015-06-23 | Sionyx, Inc. | Pixel isolation elements, devices, and associated methods |
DE102012025294A1 (en) | 2012-12-28 | 2014-07-03 | Laser Zentrum Hannover E.V. | Method for producing structures on a surface of a workpiece |
US9762830B2 (en) | 2013-02-15 | 2017-09-12 | Sionyx, Llc | High dynamic range CMOS image sensor having anti-blooming properties and associated methods |
US9939251B2 (en) | 2013-03-15 | 2018-04-10 | Sionyx, Llc | Three dimensional imaging utilizing stacked imager devices and associated methods |
WO2014209421A1 (en) | 2013-06-29 | 2014-12-31 | Sionyx, Inc. | Shallow trench textured regions and associated methods |
WO2016152938A1 (en) * | 2015-03-24 | 2016-09-29 | オーエム産業株式会社 | Method for producing plated article |
WO2017053198A2 (en) | 2015-09-17 | 2017-03-30 | The Regents Of The University Of Michigan | Femtosecond laser-induced formation of single crystal patterned semiconductor surface |
AT16668U1 (en) * | 2015-10-15 | 2020-04-15 | Zumtobel Lighting Gmbh | Process for the production of a scattering optics and scattering optics and luminaire with scattering optics |
US10276740B1 (en) | 2018-03-19 | 2019-04-30 | The United States Of America As Represented By The Secretary Of The Air Force | Co-deposition of black silicon |
US20220143748A1 (en) * | 2020-11-12 | 2022-05-12 | Nutech Ventures | Laser surface processing systems and methods for producing near perfect hemispherical emissivity in metallic surfaces |
Citations (4)
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US20050226287A1 (en) * | 2004-03-31 | 2005-10-13 | Imra America, Inc. | Femtosecond laser processing system with process parameters, controls and feedback |
US20060079062A1 (en) * | 2004-09-24 | 2006-04-13 | President & Fellows Of Harvard College | Femtosecond laser-induced formation of submicrometer spikes on a semiconductor substrate |
US7057256B2 (en) * | 2001-05-25 | 2006-06-06 | President & Fellows Of Harvard College | Silicon-based visible and near-infrared optoelectric devices |
US20080044943A1 (en) * | 2001-05-25 | 2008-02-21 | President & Fellows Of Harvard | Manufacture of silicon-based devices having disordered sulfur-doped surface layers |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6048588A (en) * | 1988-07-08 | 2000-04-11 | Cauldron Limited Partnership | Method for enhancing chemisorption of material |
US7163659B2 (en) * | 2002-12-03 | 2007-01-16 | Hewlett-Packard Development Company, L.P. | Free-standing nanowire sensor and method for detecting an analyte in a fluid |
US7816220B2 (en) * | 2008-02-27 | 2010-10-19 | President & Fellows Of Harvard College | Laser-induced structuring of substrate surfaces |
-
2008
- 2008-02-27 US US12/038,209 patent/US7816220B2/en active Active
-
2009
- 2009-02-26 WO PCT/US2009/035239 patent/WO2009108752A2/en active Application Filing
-
2010
- 2010-10-18 US US12/906,508 patent/US8143686B2/en active Active
-
2012
- 2012-02-15 US US13/396,980 patent/US20120145989A1/en not_active Abandoned
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7057256B2 (en) * | 2001-05-25 | 2006-06-06 | President & Fellows Of Harvard College | Silicon-based visible and near-infrared optoelectric devices |
US20080044943A1 (en) * | 2001-05-25 | 2008-02-21 | President & Fellows Of Harvard | Manufacture of silicon-based devices having disordered sulfur-doped surface layers |
US20050226287A1 (en) * | 2004-03-31 | 2005-10-13 | Imra America, Inc. | Femtosecond laser processing system with process parameters, controls and feedback |
US20060079062A1 (en) * | 2004-09-24 | 2006-04-13 | President & Fellows Of Harvard College | Femtosecond laser-induced formation of submicrometer spikes on a semiconductor substrate |
Also Published As
Publication number | Publication date |
---|---|
US20120145989A1 (en) | 2012-06-14 |
US20090213883A1 (en) | 2009-08-27 |
US7816220B2 (en) | 2010-10-19 |
US20110031471A1 (en) | 2011-02-10 |
WO2009108752A2 (en) | 2009-09-03 |
US8143686B2 (en) | 2012-03-27 |
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