WO2010048237A3 - Ultraviolet reflector with coolant gas holes and method - Google Patents

Ultraviolet reflector with coolant gas holes and method Download PDF

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Publication number
WO2010048237A3
WO2010048237A3 PCT/US2009/061391 US2009061391W WO2010048237A3 WO 2010048237 A3 WO2010048237 A3 WO 2010048237A3 US 2009061391 W US2009061391 W US 2009061391W WO 2010048237 A3 WO2010048237 A3 WO 2010048237A3
Authority
WO
WIPO (PCT)
Prior art keywords
coolant gas
reflector
ultraviolet lamp
gas holes
ultraviolet reflector
Prior art date
Application number
PCT/US2009/061391
Other languages
French (fr)
Other versions
WO2010048237A2 (en
Inventor
Yao-Hung Yang
Tuan Anh Nguyen
Sanjeev Baluja
Andrzej Kaszuba
Juan Carlos Rocha
Thomas Nowak
Dustin W. Ho
Original Assignee
Applied Materials, Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials, Inc. filed Critical Applied Materials, Inc.
Priority to JP2011532341A priority Critical patent/JP5401551B2/en
Priority to KR1020117011748A priority patent/KR101244243B1/en
Priority to CN2009801423975A priority patent/CN102187441B/en
Publication of WO2010048237A2 publication Critical patent/WO2010048237A2/en
Publication of WO2010048237A3 publication Critical patent/WO2010048237A3/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67115—Apparatus for thermal treatment mainly by radiation
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G21K1/062—Devices having a multilayer structure
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/67034—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/064—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements having a curved surface
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/065—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements provided with cooling means
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/067—Construction details

Abstract

A reflector for an ultraviolet lamp can be used in a substrate processing apparatus. The reflector comprises a longitudinal strip extending the length of the ultraviolet lamp. The longitudinal strip has a curved reflective surface and comprises a plurality of through holes to direct a coolant gas toward the ultraviolet lamp. A chamber that uses an ultraviolet lamp module with the reflector, and a method of ultraviolet treatment are also described.
PCT/US2009/061391 2008-10-21 2009-10-20 Ultraviolet reflector with coolant gas holes and method WO2010048237A2 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2011532341A JP5401551B2 (en) 2008-10-21 2009-10-20 Ultraviolet reflector with holes for cooling gas and method
KR1020117011748A KR101244243B1 (en) 2008-10-21 2009-10-20 Ultraviolet reflector with coolant gas holes and method
CN2009801423975A CN102187441B (en) 2008-10-21 2009-10-20 Ultraviolet reflector with coolant gas holes and method

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US12/255,609 US7964858B2 (en) 2008-10-21 2008-10-21 Ultraviolet reflector with coolant gas holes and method
US12/255,609 2008-10-21

Publications (2)

Publication Number Publication Date
WO2010048237A2 WO2010048237A2 (en) 2010-04-29
WO2010048237A3 true WO2010048237A3 (en) 2010-07-15

Family

ID=42107912

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2009/061391 WO2010048237A2 (en) 2008-10-21 2009-10-20 Ultraviolet reflector with coolant gas holes and method

Country Status (6)

Country Link
US (2) US7964858B2 (en)
JP (1) JP5401551B2 (en)
KR (1) KR101244243B1 (en)
CN (3) CN103337274A (en)
TW (1) TWI374452B (en)
WO (1) WO2010048237A2 (en)

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