WO2010062853A3 - Scan error correction in low coherence scanning interferometry - Google Patents

Scan error correction in low coherence scanning interferometry Download PDF

Info

Publication number
WO2010062853A3
WO2010062853A3 PCT/US2009/065529 US2009065529W WO2010062853A3 WO 2010062853 A3 WO2010062853 A3 WO 2010062853A3 US 2009065529 W US2009065529 W US 2009065529W WO 2010062853 A3 WO2010062853 A3 WO 2010062853A3
Authority
WO
WIPO (PCT)
Prior art keywords
opd
detector
apparatus includes
error correction
increments
Prior art date
Application number
PCT/US2009/065529
Other languages
French (fr)
Other versions
WO2010062853A2 (en
Inventor
Mark Davidson
Jan Liesener
Peter De Groot
Xavier Colonna De Lega
Leslie L. Deck
Original Assignee
Zygo Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zygo Corporation filed Critical Zygo Corporation
Priority to KR1020127007041A priority Critical patent/KR101530898B1/en
Priority to EP09829736.9A priority patent/EP2238430B9/en
Priority to CN200980120703.5A priority patent/CN102057269B/en
Priority to JP2010540961A priority patent/JP5536667B2/en
Priority to KR1020107015982A priority patent/KR101191842B1/en
Publication of WO2010062853A2 publication Critical patent/WO2010062853A2/en
Publication of WO2010062853A3 publication Critical patent/WO2010062853A3/en

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/0209—Low-coherence interferometers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G01B11/2441—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures using interferometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02001—Interferometers characterised by controlling or generating intrinsic radiation properties
    • G01B9/02007—Two or more frequencies or sources used for interferometric measurement
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02001—Interferometers characterised by controlling or generating intrinsic radiation properties
    • G01B9/0201—Interferometers characterised by controlling or generating intrinsic radiation properties using temporal phase variation
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02015—Interferometers characterised by the beam path configuration
    • G01B9/02027—Two or more interferometric channels or interferometers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02034—Interferometers characterised by particularly shaped beams or wavefronts
    • G01B9/02038—Shaping the wavefront, e.g. generating a spherical wavefront
    • G01B9/02039—Shaping the wavefront, e.g. generating a spherical wavefront by matching the wavefront with a particular object surface shape
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02055—Reduction or prevention of errors; Testing; Calibration
    • G01B9/02056—Passive reduction of errors
    • G01B9/02057—Passive reduction of errors by using common path configuration, i.e. reference and object path almost entirely overlapping
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02055—Reduction or prevention of errors; Testing; Calibration
    • G01B9/02062—Active error reduction, i.e. varying with time
    • G01B9/02067—Active error reduction, i.e. varying with time by electronic control systems, i.e. using feedback acting on optics or light
    • G01B9/02068—Auto-alignment of optical elements
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02055—Reduction or prevention of errors; Testing; Calibration
    • G01B9/02075—Reduction or prevention of errors; Testing; Calibration of particular errors
    • G01B9/02076—Caused by motion
    • G01B9/02077—Caused by motion of the object
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/45—Multiple detectors for detecting interferometer signals
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/70—Using polarization in the interferometer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making

Abstract

An apparatus includes a broadband scanning interferometry system including optics for combining test light from a test object with reference light to form an interference pattern on a detector. The apparatus includes a stage configured to scan an optical path difference (OPD) between the test and reference light from a common source to the detector and a detector system including the detector for recording the interference pattern for each of a series of OPD increments, the frequency of each OPD increment defining a frame rate. The optics are configured to produce at least two monitor interferometry signals indicative of changes in the OPD as it's scanned, the detector system being configured to record the monitor interferometry signals. The apparatus includes a processor configured to determine information about the OPD increments with sensitivity to perturbations to the OPD increments at frequencies greater than the frame rate.
PCT/US2009/065529 2008-11-26 2009-11-23 Scan error correction in low coherence scanning interferometry WO2010062853A2 (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
KR1020127007041A KR101530898B1 (en) 2008-11-26 2009-11-23 Scan error correction in low coherence scanning interferometry
EP09829736.9A EP2238430B9 (en) 2008-11-26 2009-11-23 Scan error correction in low coherence scanning interferometry
CN200980120703.5A CN102057269B (en) 2008-11-26 2009-11-23 Scan error correction in low coherence scanning interferometry
JP2010540961A JP5536667B2 (en) 2008-11-26 2009-11-23 Scanning error correction in low coherence scanning interferometry
KR1020107015982A KR101191842B1 (en) 2008-11-26 2009-11-23 Scan error correction in low coherence scanning interferometry

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
US11815108P 2008-11-26 2008-11-26
US61/118,151 2008-11-26
US12/509,098 US8004688B2 (en) 2008-11-26 2009-07-24 Scan error correction in low coherence scanning interferometry
US12/509,083 US8120781B2 (en) 2008-11-26 2009-07-24 Interferometric systems and methods featuring spectral analysis of unevenly sampled data
US12/509,083 2009-07-24
US12/509,098 2009-07-24

Publications (2)

Publication Number Publication Date
WO2010062853A2 WO2010062853A2 (en) 2010-06-03
WO2010062853A3 true WO2010062853A3 (en) 2010-08-19

Family

ID=42195958

Family Applications (2)

Application Number Title Priority Date Filing Date
PCT/US2009/065572 WO2010062860A2 (en) 2008-11-26 2009-11-23 Fiber-based interferometer system for monitoring an imaging interferometer
PCT/US2009/065529 WO2010062853A2 (en) 2008-11-26 2009-11-23 Scan error correction in low coherence scanning interferometry

Family Applications Before (1)

Application Number Title Priority Date Filing Date
PCT/US2009/065572 WO2010062860A2 (en) 2008-11-26 2009-11-23 Fiber-based interferometer system for monitoring an imaging interferometer

Country Status (7)

Country Link
US (5) US8120781B2 (en)
EP (1) EP2238430B9 (en)
JP (1) JP5536667B2 (en)
KR (2) KR101530898B1 (en)
CN (1) CN102057269B (en)
TW (1) TWI425184B (en)
WO (2) WO2010062860A2 (en)

Families Citing this family (180)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102006033229B4 (en) * 2006-07-18 2013-05-08 Ezono Ag Ultrasonic probe and method for the optical detection of ultrasonic waves
US10426348B2 (en) 2008-03-05 2019-10-01 Purdue Research Foundation Using differential time-frequency tissue-response spectroscopy to evaluate living body response to a drug
US7839496B2 (en) * 2008-04-24 2010-11-23 Araca Incorporated Confocal microscopy pad sample holder and method of hand using the same
US8120781B2 (en) * 2008-11-26 2012-02-21 Zygo Corporation Interferometric systems and methods featuring spectral analysis of unevenly sampled data
DE102008060621B3 (en) * 2008-12-05 2010-08-12 Carl Zeiss Ag Optical arrangement for the contactless measurement or testing of a body surface
US8107084B2 (en) * 2009-01-30 2012-01-31 Zygo Corporation Interference microscope with scan motion detection using fringe motion in monitor patterns
JP5426901B2 (en) * 2009-02-26 2014-02-26 株式会社日立製作所 Spectral optical system in DUV-UV band and spectroscopic measurement apparatus using the same
US7869027B2 (en) * 2009-04-20 2011-01-11 Araca, Inc. Confocal microscopy pad sample holder that measures displacement and method of using the same
GB2516781B (en) * 2009-05-27 2015-08-26 Silixa Ltd Method and apparatus for optical sensing
FI20095619A0 (en) * 2009-06-04 2009-06-04 Gasera Ltd A system and method for measuring relative motion
US9025156B2 (en) * 2009-12-14 2015-05-05 Konica Minolta Holdings, Inc. Interferometer and fourier spectrometer using same
US8508746B2 (en) * 2010-03-30 2013-08-13 Duke University Interferometric systems having reflective chambers and related methods
WO2011135698A1 (en) * 2010-04-28 2011-11-03 キヤノン株式会社 Method of measuring deformation
US8705041B2 (en) * 2010-05-27 2014-04-22 Promet International, Inc. Coaxial interferometer and inspection probe
US9514271B2 (en) * 2010-06-17 2016-12-06 Purdue Research Foundation Digital holographic method of measuring cellular activity and measuring apparatus with improved stability
US10401793B2 (en) 2010-06-17 2019-09-03 Purdue Research Foundation Digital holographic method of measuring cellular activity and measuring apparatus with improved stability
TWI500963B (en) * 2010-06-29 2015-09-21 Chroma Ate Inc An image capturing device and method
JP4912504B1 (en) * 2010-09-16 2012-04-11 キヤノン株式会社 Refractive index measurement method and measurement apparatus
CN102554709A (en) * 2010-12-10 2012-07-11 通用电气公司 Distance measuring system and distance measuring method
JP5794664B2 (en) * 2011-01-20 2015-10-14 キヤノン株式会社 Tomographic image generating apparatus and tomographic image generating method
DE102011003807A1 (en) * 2011-02-08 2012-08-09 Leica Microsystems Cms Gmbh Microscope with autofocus device and autofocusing method for microscopes
US10359361B2 (en) * 2011-02-18 2019-07-23 The General Hospital Corporation Laser speckle micro-rheology in characterization of biomechanical properties of tissues
NL2008111A (en) * 2011-02-18 2012-08-21 Asml Netherlands Bv Optical apparatus, method of scanning, lithographic apparatus and device manufacturing method.
KR101186464B1 (en) * 2011-04-13 2012-09-27 에스엔유 프리시젼 주식회사 Interferometric system for measuring tsv and method using the same
US8817269B2 (en) * 2011-04-26 2014-08-26 Carl Zeiss Meditec, Inc. Fizeau reference arm using a chirped fiber bragg grating
TWI472822B (en) * 2011-05-20 2015-02-11 Univ Feng Chia Parallelism inspection apparatus and method thereof
JP6193218B2 (en) * 2011-05-20 2017-09-06 ユニベルシタート ポリテクニカ デ カタルーニャ Method and apparatus for non-contact measurement of surfaces
US20120300040A1 (en) * 2011-05-25 2012-11-29 Microsoft Corporation Imaging system
TWI447352B (en) * 2011-07-08 2014-08-01 私立中原大學 Optical tomography system
JP5787255B2 (en) * 2011-07-12 2015-09-30 国立大学法人 筑波大学 Program for correcting measurement data of PS-OCT and PS-OCT system equipped with the program
US20130017762A1 (en) * 2011-07-15 2013-01-17 Infineon Technologies Ag Method and Apparatus for Determining a Measure of a Thickness of a Polishing Pad of a Polishing Machine
JP2013036848A (en) * 2011-08-08 2013-02-21 Nikon Corp Height measuring device and method
DE102011115027A1 (en) * 2011-10-07 2013-04-11 Polytec Gmbh Coherence grid interferometer and method for spatially resolved optical measurement of the surface geometry of an object
CN103033129B (en) * 2011-10-07 2015-10-21 财团法人工业技术研究院 Optical apparatus and optical addressing method
TWI466112B (en) * 2011-10-07 2014-12-21 Ind Tech Res Inst Optical equipment and registration method
EP2776791A4 (en) * 2011-11-09 2015-06-24 Zygo Corp Low coherence interferometry using encoder systems
WO2013070957A1 (en) 2011-11-09 2013-05-16 Zygo Corporation Compact encoder head for interferometric encoder system
EP2776792B1 (en) * 2011-11-09 2016-08-10 Zygo Corporation Double pass interferometric encoder system
JP5527625B2 (en) * 2011-11-22 2014-06-18 横河電機株式会社 Microscope equipment
US20130153552A1 (en) * 2011-12-14 2013-06-20 Gwangju Institute Of Science And Technology Scribing apparatus and method for having analysis function of material distribution
US9360302B2 (en) 2011-12-15 2016-06-07 Kla-Tencor Corporation Film thickness monitor
US10298833B2 (en) 2011-12-19 2019-05-21 Hamamatsu Photonics K.K. Image capturing apparatus and focusing method thereof
WO2014112086A1 (en) * 2013-01-17 2014-07-24 浜松ホトニクス株式会社 Image acquisition device and focus method for image acquisition device
CN102589463B (en) * 2012-01-10 2014-01-15 合肥工业大学 Two-dimensional and three-dimensional integrated imaging measurement system
JP5984406B2 (en) * 2012-02-01 2016-09-06 キヤノン株式会社 measuring device
TWI502549B (en) * 2012-02-20 2015-10-01 Univ Nat Kaohsiung Applied Sci Recognition method and system for component images
JP2013200182A (en) * 2012-03-23 2013-10-03 Toshiba Corp Defect inspection device and defect inspection method
NL2010215A (en) * 2012-03-29 2013-10-01 Asml Holding Nv Compact self-contained holographic and interferometric apparatus.
TWI516746B (en) 2012-04-20 2016-01-11 賽格股份有限公司 Method, apparatus, and computer-program product for performing non-harmonic cyclic error compensation in interferometric encoder systems and lithography systems
EP2662661A1 (en) 2012-05-07 2013-11-13 Leica Geosystems AG Measuring device with an interferometer and an absorption medium defining a thick line spectrum
US9113782B2 (en) * 2012-06-01 2015-08-25 Joshua Noel Hogan Multiple reference OCT system
KR102330741B1 (en) * 2012-06-26 2021-11-23 케이엘에이 코포레이션 Scanning in angle-resolved reflectometry and algorithmically eliminating diffraction from optical metrology
JP5975785B2 (en) * 2012-08-14 2016-08-23 株式会社アドテックエンジニアリング Drawing apparatus, exposure drawing apparatus, program, and drawing method
JP6006053B2 (en) * 2012-09-06 2016-10-12 アストロデザイン株式会社 Laser scanning fluorescence microscope
FR2995677B1 (en) * 2012-09-14 2014-08-29 Thales Sa OPTICAL INSTRUMENT WITH WAVE FRONT ANALYZER
WO2014055749A1 (en) 2012-10-04 2014-04-10 Zygo Corporation Position monitoring system with reduced noise
US9915565B2 (en) 2012-10-26 2018-03-13 Applied Spectral Imaging Ltd. Method and system for spectral imaging
US9097612B2 (en) * 2012-11-30 2015-08-04 Qed Technologies International, Inc. Integrated wavefront sensor and profilometer
US20150157199A1 (en) * 2012-12-06 2015-06-11 Noam Sapiens Method and apparatus for scatterometric measurement of human tissue
US9291505B2 (en) * 2012-12-07 2016-03-22 Baker Hughes Incorporated Polarization scrambling in interferometer systems
TWI623776B (en) * 2012-12-17 2018-05-11 Ｌｇ伊諾特股份有限公司 Method of designing and optical substrate
CN104919351B (en) 2013-01-17 2017-05-24 浜松光子学株式会社 Image acquisition device and focus method for image acquisition device
EP2947488B1 (en) 2013-01-17 2019-02-27 Hamamatsu Photonics K.K. Image acquisition device and focus method for image acquisition device
CN103105236B (en) * 2013-01-18 2014-08-20 电子科技大学 Method used for liquid crystal optical phase modulator phase detection
US9541381B2 (en) * 2013-02-12 2017-01-10 Zygo Corporation Surface topography interferometer with surface color
US9305753B2 (en) * 2013-03-06 2016-04-05 Kla-Tencor Corporation Thickness change monitor wafer for in situ film thickness monitoring
US9052190B2 (en) * 2013-03-12 2015-06-09 Kla-Tencor Corporation Bright-field differential interference contrast system with scanning beams of round and elliptical cross-sections
KR101462848B1 (en) * 2013-03-18 2014-11-18 에스엔유 프리시젼 주식회사 Three dimensional shape measurment apparatus for recogniting color
US9313418B2 (en) * 2013-05-30 2016-04-12 Toshiba America Electronic Components, Inc. Method and apparatus for detection of biological conditions
US20150002852A1 (en) * 2013-06-26 2015-01-01 Zygo Corporation Coherence scanning interferometry using phase shifted interferometrty signals
CN104375383B (en) * 2013-08-13 2017-08-29 上海微电子装备有限公司 Focusing-levelling detection device and method for lithographic equipment
JP6250329B2 (en) * 2013-08-19 2017-12-20 株式会社ディスコ Processing equipment
US9116038B2 (en) 2013-08-19 2015-08-25 International Business Machines Corporation Integrated optical illumination reference source
US9857159B1 (en) 2013-09-24 2018-01-02 TVS Holdings, LLC Velocity compensated frequency sweeping interferometer and method of using same
JP6257072B2 (en) * 2013-10-16 2018-01-10 国立大学法人 筑波大学 Surface shape measurement method using a white interferometer
JP2015085398A (en) * 2013-10-28 2015-05-07 株式会社ディスコ Cutting device
JP6305013B2 (en) * 2013-10-28 2018-04-04 株式会社ディスコ Processing equipment
US9874628B2 (en) * 2013-11-12 2018-01-23 The Boeing Company Dual hidden point bars
CN104730279B (en) * 2013-12-20 2018-04-10 中国工程物理研究院激光聚变研究中心 A kind of chirped pulse velocity interferometer
SG11201605108VA (en) 2014-01-09 2016-07-28 Zygo Corp Measuring topography of aspheric and other non-flat surfaces
US10317189B2 (en) * 2014-01-23 2019-06-11 Kabushiki Kaisha Topcon Detection of missampled interferograms in frequency domain OCT with a k-clock
US10185299B2 (en) 2014-03-11 2019-01-22 Ametek Precitech, Inc. Edge treatment process
US9719777B1 (en) * 2014-05-30 2017-08-01 Zygo Corporation Interferometer with real-time fringe-free imaging
US9282304B1 (en) 2014-06-02 2016-03-08 Bruker Nano Inc. Full-color images produced by white-light interferometry
NL2014773A (en) * 2014-06-10 2016-03-31 Asml Netherlands Bv A Lithographic Device and a Method of Manufacturing a Lithographic Device.
RU2572412C1 (en) * 2014-06-27 2016-01-10 Общество с ограниченной ответственностью "Фурье фотоникс" High-precision interferometer with active suppression of spurious vibrations
EP3169969B1 (en) * 2014-07-14 2019-06-19 Zygo Corporation Interferometric encoders using spectral analysis
US9958254B2 (en) 2014-08-12 2018-05-01 Zygo Corporation Calibration of scanning interferometers
WO2016027874A1 (en) * 2014-08-21 2016-02-25 公立大学法人大阪市立大学 Stress visualization device, and mechanical property value visualization device
CN104219463B (en) * 2014-09-17 2017-05-31 中国科学院苏州生物医学工程技术研究所 Laser scanning confocal micro- scope imaging data processing method based on integration sampling
TWI522979B (en) 2014-09-19 2016-02-21 群創光電股份有限公司 Liquid display panel and method for detecting potentials generated from ions of liquid crystal layer and alignment layer comprised therein
CN104345168A (en) * 2014-11-07 2015-02-11 中国工程物理研究院激光聚变研究中心 Scanning frequency domain interferometer
US9976947B1 (en) 2014-11-24 2018-05-22 TVS Holdings, LLC Position measurement device
DE102014118151A1 (en) * 2014-12-08 2016-06-09 Universität Kassel White-light interference microscope and method for operating a white-light interference microscope
TWI546841B (en) 2014-12-10 2016-08-21 財團法人工業技術研究院 Electron microscope having carrier
CN107407798B (en) * 2015-01-26 2020-03-27 统雷有限公司 Microscope system with automatic focus adjustment by low coherence interferometry
TWI550982B (en) * 2015-03-06 2016-09-21 智泰科技股份有限公司 Real-time wavelength correction system for visible light
DE102015108912A1 (en) * 2015-06-05 2016-12-08 Carl Zeiss Microscopy Gmbh Apparatus and method for detecting surface topographies
US9759555B2 (en) * 2015-07-09 2017-09-12 Camtek Ltd. High throughput triangulation system
DE102015113465B4 (en) * 2015-08-14 2018-05-03 Medizinisches Laserzentrum Lübeck GmbH Method and device for scanning at least one cut surface in the interior of a light-scattering object
US20170067735A1 (en) * 2015-09-09 2017-03-09 Vishal Khosla Apparatus for In-Line Test and Surface Analysis on a Mechanical Property Tester
CN105509638A (en) * 2015-12-01 2016-04-20 中国科学院长春光学精密机械与物理研究所 Phase-shift interference information processing method based on error compensation
CN105655267A (en) * 2016-01-04 2016-06-08 京东方科技集团股份有限公司 Early-warning system for detecting substrates, and production equipment
EP3411657A1 (en) * 2016-02-03 2018-12-12 Yizheng Zhu Methods, systems and apparatus of interferometry for imaging and sensing
WO2017139774A1 (en) 2016-02-12 2017-08-17 The General Hospital Corporation Laser speckle micro-rheology in characterization of biomechanical properties of tissues
DE102016204535A1 (en) * 2016-03-18 2017-09-21 Carl Zeiss Smt Gmbh Measuring microscope for measuring masks for lithographic processes and measuring methods and calibration methods therefor
FR3050023B1 (en) * 2016-04-11 2020-02-14 Unity Semiconductor METHOD AND SYSTEM FOR OPTICAL INSPECTION AND MEASUREMENT OF A FACE OF AN OBJECT
CN105806236B (en) * 2016-05-11 2018-08-28 天津大学 Linnik type interference spectrums measure the nonlinear phase compensation method of film
CN107578986B (en) * 2016-07-04 2019-11-01 中芯国际集成电路制造(上海)有限公司 The measurement method of semiconductor structure and forming method thereof and photoetching offset
US10024776B2 (en) * 2016-07-20 2018-07-17 Rtec-Instruments, Inc. Apparatus for in-line testing and surface analysis on a mechanical property tester
DE102016213237A1 (en) * 2016-07-20 2018-01-25 Carl Zeiss Smt Gmbh Measuring device for the interferometric determination of a shape of an optical surface
WO2018053192A1 (en) 2016-09-15 2018-03-22 Kla-Tencor Corporation Systems and methods for optimizing focus for imaging-based overlay metrology
EP3542126A4 (en) * 2016-11-18 2020-07-29 Zygo Corporation Method and apparatus for optimizing the optical performance of interferometers
US10288408B2 (en) 2016-12-01 2019-05-14 Nanometrics Incorporated Scanning white-light interferometry system for characterization of patterned semiconductor features
CN106855521B (en) * 2017-03-06 2023-07-14 南京市计量监督检测院 Rail web surface crack micro-deformation detection device and detection method
US10753726B2 (en) 2017-03-26 2020-08-25 Cognex Corporation System and method for 3D profile determination using model-based peak selection
EP3396306B1 (en) * 2017-04-26 2019-11-27 Mitutoyo Corporation Method and system for calculating a height map of a surface of an object from an image stack in scanning optical 2.5d profiling of the surface by an optical system
DE102017114023A1 (en) * 2017-06-23 2018-12-27 SmarAct Holding GmbH Method and detector for interferometry-correlated imaging
JP6471274B1 (en) 2017-07-06 2019-02-13 浜松ホトニクス株式会社 Optical device
US10310085B2 (en) * 2017-07-07 2019-06-04 Mezmeriz Inc. Photonic integrated distance measuring pixel and method of distance measurement
DE102017115922C5 (en) * 2017-07-14 2023-03-23 Precitec Gmbh & Co. Kg Method and device for measuring and setting a distance between a machining head and a workpiece and associated method for regulation
CN109381189B (en) * 2017-08-04 2021-07-30 适着三维科技股份有限公司 Calibration device
US10365089B1 (en) 2017-08-04 2019-07-30 The United States Of America, As Represented By The Secretary Of The Navy Atmospheric infrasonic sensing from an array of aircraft
US10578440B1 (en) 2017-08-04 2020-03-03 The United States Of America, As Represented By The Secretary Of The Navy Atmospheric infrasonic sensing from an aircraft
JP6876576B2 (en) * 2017-08-17 2021-05-26 日本電子株式会社 3D image construction method
TWI791046B (en) * 2017-10-02 2023-02-01 美商奈米創尼克影像公司 Apparatus and method to reduce vignetting in microscopic imaging
US10502944B2 (en) 2017-10-02 2019-12-10 Nanotronics Imaging, Inc. Apparatus and method to reduce vignetting in microscopic imaging
CN108106973B (en) * 2017-12-18 2020-01-10 大连理工大学 Method for simultaneously measuring stress and displacement of saturated particle medium based on transparent photoelastic material
US10352690B2 (en) 2017-12-18 2019-07-16 Industrial Technology Research Institute Measuring apparatus
TWI650526B (en) * 2017-12-18 2019-02-11 財團法人工業技術研究院 Measuring apparatus
JP6851301B2 (en) * 2017-12-20 2021-03-31 浜松ホトニクス株式会社 Observing object cover, interference observation container, interference observation device and interference observation method
TWI647427B (en) * 2018-01-10 2019-01-11 緯創資通股份有限公司 Object distance estimation method and electronic device
TWI672493B (en) * 2018-03-07 2019-09-21 由田新技股份有限公司 An automatic optical inspection system and method to obtain mura defect from the panel
DE102018105877B3 (en) 2018-03-14 2019-02-28 Precitec Gmbh & Co. Kg Device for determining an alignment of an optical device of a coherence tomograph, coherence tomograph and laser processing system
CN108599849B (en) * 2018-04-14 2021-01-01 上海交通大学 Photon processing system and processing method for intelligent decision
EP3781014B1 (en) * 2018-04-18 2023-09-27 Carl Zeiss Meditec, Inc. Post-processing method to improve lso-based tracking in oct
DE102018113979A1 (en) * 2018-06-12 2019-12-12 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Device and method for the interferometric measurement of a surface of a moving test object
KR102019326B1 (en) * 2018-06-25 2019-09-06 케이맥(주) Vibration tolerant white light scanning interferometer and its vibration effect removal method
US11092425B2 (en) 2018-07-05 2021-08-17 University Of Rochester Telecentric and broadband achromatic objective lens systems
US11262191B1 (en) * 2018-07-12 2022-03-01 Onto Innovation Inc. On-axis dynamic interferometer and optical imaging systems employing the same
CN109223044B (en) * 2018-07-12 2021-08-24 郑州轻工业学院 Doppler flow velocity detection method of optical coherence tomography system
CN110726702A (en) * 2018-07-17 2020-01-24 锐准医光股份有限公司 Optical layer cutting device adopting advanced optical interference microscopy
TWI691700B (en) * 2018-07-18 2020-04-21 薩摩亞商銳準醫光股份有限公司 Optical slice device using advanced optical interference microscopy
DE102018119313B4 (en) * 2018-08-08 2023-03-30 Rogers Germany Gmbh Process for processing a metal-ceramic substrate and installation for carrying out the process
CN109211934B (en) * 2018-08-29 2021-01-26 南京理工大学 Micro-sphere surface defect detection device and method based on interference microscopy
US11788834B2 (en) * 2018-10-12 2023-10-17 Electric Power Research Institute, Inc. Method for measuring surface characteristics in optically distorting media
JP7036704B2 (en) * 2018-11-16 2022-03-15 ヤフー株式会社 Information processing equipment, information processing methods, and information processing programs
FR3089286B1 (en) * 2018-11-30 2022-04-01 Unity Semiconductor Method and system for measuring a surface of an object comprising different structures by low coherence interferometry
KR102129382B1 (en) * 2018-12-17 2020-07-02 주식회사 토모큐브 Method and apparatus for retrieving phase information of wave from interference pattern
US11493852B2 (en) 2018-12-21 2022-11-08 Asml Holdings N.V. Noise correction for alignment signal
TWI682150B (en) 2018-12-27 2020-01-11 財團法人工業技術研究院 Automatic calibration optical interferometer and automatic calibration method of optical interferometer
CN109780992B (en) * 2018-12-28 2020-01-10 西安交通大学 Interferometric system error calibration method based on optical plane fringe image processing
US10809048B2 (en) * 2019-01-08 2020-10-20 Formfactor Beaverton, Inc. Probe systems and methods for calibrating capacitive height sensing measurements
JP6804694B1 (en) * 2019-02-08 2020-12-23 株式会社日立ハイテク Etching equipment, etching methods and detectors
CN109828365B (en) * 2019-02-25 2021-05-04 南京理工大学 Mirau type super-resolution interference microscope objective
WO2020215050A1 (en) * 2019-04-19 2020-10-22 Arizona Board Of Regents On Behalf Of The University Of Arizona All-in-focus imager and associated method
WO2020215046A1 (en) 2019-04-19 2020-10-22 Arizona Board Of Regents On Behalf Of The University Of Arizona On-chip signal processing method and pixel-array sensor
DE102019114405A1 (en) 2019-05-29 2020-04-16 Polytec Gmbh Interferometric measuring device and interferometric method for determining the surface topography of a measurement object
CN110675451B (en) * 2019-09-17 2023-03-17 浙江荷湖科技有限公司 Digital self-adaptive correction method and system based on phase space optics
US11150195B2 (en) * 2019-09-25 2021-10-19 Onto Innovation Inc. Sample surface polarization modification in interferometric defect inspection
KR102269706B1 (en) * 2019-11-04 2021-06-25 재단법인대구경북과학기술원 Multi channel fiber photometry system using adaptive optics
GB2593194B (en) * 2020-03-18 2022-09-07 Refeyn Ltd Methods and apparatus for optimised interferometric scattering microscopy
CN111536883B (en) * 2020-06-10 2021-07-23 中北大学 Micro-displacement sensor based on combined type grating
CA3180252A1 (en) 2020-06-15 2021-12-23 Bmv Optical Technologies Inc. Optical system using enhanced static fringe capture
CN115720624A (en) 2020-06-24 2023-02-28 西默有限公司 Determination of measurement error in an etalon
CN112066909B (en) * 2020-08-24 2022-04-08 南京理工大学 Anti-vibration interference measurement method based on inclined plane high-precision extraction
JP7300432B2 (en) * 2020-10-27 2023-06-29 Ckd株式会社 Three-dimensional measuring device
JP7001947B2 (en) * 2020-12-24 2022-01-20 株式会社東京精密 Surface shape measurement method
WO2022150493A1 (en) * 2021-01-06 2022-07-14 Sentek Instrument, Llc Systems and methods for fiber optic fourier spectrometry measurement
CN112665509B (en) * 2021-01-08 2022-07-08 中国工程物理研究院机械制造工艺研究所 White light interferometry method for self-correcting scanning error
KR102494082B1 (en) * 2021-01-28 2023-01-31 서울대학교산학협력단 Measuring apparatus for thickness and profile for thin film using interference and wavenumber high frequency modulation, and measuring method using thereof
US20220371152A1 (en) * 2021-05-20 2022-11-24 Applied Materials, Inc. Fourier filtering of spectral data for measuring layer thickness during substrate processing
US20220373322A1 (en) * 2021-05-20 2022-11-24 Nanyang Technological University Surface profile inspection methods and systems
CN113721233B (en) * 2021-08-30 2023-09-19 中国航发沈阳黎明航空发动机有限责任公司 Three-dimensional optical measurement method for thickness of thermal barrier coating of multi-body turbine guide vane
CN113985711B (en) * 2021-10-28 2024-02-02 无锡卓海科技股份有限公司 Overlay measuring device
WO2023114213A1 (en) * 2021-12-13 2023-06-22 The Board Of Trustees Of The Leland Stanford Junior University Apparatus and method for multiplexed one-photon and nonlinear microscopy and method for biological tissue alignment
DE102022102572A1 (en) 2022-02-03 2023-08-03 Carl Zeiss Microscopy Gmbh Imaging system and method for imaging and measuring an object
KR102521324B1 (en) * 2022-03-03 2023-04-20 (주)오로스 테크놀로지 Method for aligning off-axis reflection optical system with angle of incidence
DE102023203568A1 (en) 2023-04-19 2024-04-11 Carl Zeiss Smt Gmbh Interferometric measuring device for measuring the roughness of a test surface
CN117006971A (en) * 2023-09-25 2023-11-07 板石智能科技(深圳)有限公司 Three-dimensional morphology measurement system

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5122648A (en) * 1990-06-01 1992-06-16 Wyko Corporation Apparatus and method for automatically focusing an interference microscope
US6181420B1 (en) * 1998-10-06 2001-01-30 Zygo Corporation Interferometry system having reduced cyclic errors
US20020196450A1 (en) * 2001-06-25 2002-12-26 Artur Olszak Scanning interferometry with reference signal
US20050157306A1 (en) * 2004-01-16 2005-07-21 Joanna Schmit Measurement of object deformation with optical profiler

Family Cites Families (296)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2612074A (en) 1949-03-30 1952-09-30 Prec Mecanique Paris Soc Interferometer
US4199219A (en) 1977-04-22 1980-04-22 Canon Kabushiki Kaisha Device for scanning an object with a light beam
US4188122A (en) 1978-03-27 1980-02-12 Rockwell International Corporation Interferometer
US4340306A (en) 1980-02-04 1982-07-20 Balasubramanian N Optical system for surface topography measurement
US4355903A (en) 1980-02-08 1982-10-26 Rca Corporation Thin film thickness monitor
DE3145633A1 (en) * 1981-11-17 1983-08-11 Byk-Mallinckrodt Chemische Produkte Gmbh, 4230 Wesel DEVICE FOR MEASURING COLORS
US4576479A (en) 1982-05-17 1986-03-18 Downs Michael J Apparatus and method for investigation of a surface
US4523846A (en) 1982-09-10 1985-06-18 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Integrated optics in an electrically scanned imaging Fourier transform spectrometer
US4594003A (en) 1983-07-20 1986-06-10 Zygo Corporation Interferometric wavefront measurement
JPS60127403A (en) 1983-12-13 1985-07-08 Anritsu Corp Thickness measuring apparatus
US4618262A (en) 1984-04-13 1986-10-21 Applied Materials, Inc. Laser interferometer system and method for monitoring and controlling IC processing
US4699513A (en) 1985-02-08 1987-10-13 Stanford University Distributed sensor and method using coherence multiplexing of fiber-optic interferometric sensors
US4710642A (en) 1985-08-20 1987-12-01 Mcneil John R Optical scatterometer having improved sensitivity and bandwidth
US4639139A (en) 1985-09-27 1987-01-27 Wyko Corporation Optical profiler using improved phase shifting interferometry
US4818110A (en) * 1986-05-06 1989-04-04 Kla Instruments Corporation Method and apparatus of using a two beam interference microscope for inspection of integrated circuits and the like
US4806018A (en) 1987-07-06 1989-02-21 The Boeing Company Angular reflectance sensor
US4869593A (en) 1988-04-22 1989-09-26 Zygo Corporation Interferometric surface profiler
US4923301A (en) 1988-05-26 1990-05-08 American Telephone And Telegraph Company Alignment of lithographic system
US4964726A (en) 1988-09-27 1990-10-23 General Electric Company Apparatus and method for optical dimension measurement using interference of scattered electromagnetic energy
US4948253A (en) 1988-10-28 1990-08-14 Zygo Corporation Interferometric surface profiler for spherical surfaces
GB8903725D0 (en) 1989-02-18 1989-04-05 Cambridge Consultants Coherent tracking sensor
US5042949A (en) 1989-03-17 1991-08-27 Greenberg Jeffrey S Optical profiler for films and substrates
US5042951A (en) 1989-09-19 1991-08-27 Therma-Wave, Inc. High resolution ellipsometric apparatus
US4999014A (en) 1989-05-04 1991-03-12 Therma-Wave, Inc. Method and apparatus for measuring thickness of thin films
US5073018A (en) 1989-10-04 1991-12-17 The Board Of Trustees Of The Leland Stanford Junior University Correlation microscope
DE3942896A1 (en) 1989-12-23 1991-06-27 Zeiss Carl Fa INTERFEROMETRIC SENSOR FOR MEASURING DISTANCE CHANGES IN A SMALL AREA
US5594543A (en) 1990-01-16 1997-01-14 Hughes Danbury Optical Systems, Inc. Laser diode radar with extended range
US5112129A (en) 1990-03-02 1992-05-12 Kla Instruments Corporation Method of image enhancement for the coherence probe microscope with applications to integrated circuit metrology
US5343294A (en) 1990-03-09 1994-08-30 Carl-Zeiss-Stiftung Method for analyzing periodic brightness patterns
US5135307A (en) 1990-05-30 1992-08-04 Hughes Danbury Optical System, Inc. Laser diode interferometer
US5241369A (en) 1990-10-01 1993-08-31 Mcneil John R Two-dimensional optical scatterometer apparatus and process
US5129724A (en) 1991-01-29 1992-07-14 Wyko Corporation Apparatus and method for simultaneous measurement of film thickness and surface height variation for film-substrate sample
US5127731A (en) 1991-02-08 1992-07-07 Hughes Aircraft Company Stabilized two-color laser diode interferometer
US5164790A (en) 1991-02-27 1992-11-17 Mcneil John R Simple CD measurement of periodic structures on photomasks
DE69231715D1 (en) 1991-03-04 2001-04-12 At & T Corp Manufacturing process of semiconductor integrated circuits using latent images
DE4108944A1 (en) 1991-03-19 1992-09-24 Haeusler Gerd Contactless measurement of surface shape of diffusely scattering objects e.g. semiconductor wafers - using interferometric arrangement for three=dimensional measurement with minimal coherence length and illumination aperture angle less than observation aperture angle
US5153669A (en) 1991-03-27 1992-10-06 Hughes Danbury Optical Systems, Inc. Three wavelength optical measurement apparatus and method
US5194918A (en) * 1991-05-14 1993-03-16 The Board Of Trustees Of The Leland Stanford Junior University Method of providing images of surfaces with a correlation microscope by transforming interference signals
US5173746A (en) 1991-05-21 1992-12-22 Wyko Corporation Method for rapid, accurate measurement of step heights between dissimilar materials
US5204734A (en) 1991-06-12 1993-04-20 Wyko Corporation Rough surface profiler and method
US5133601A (en) 1991-06-12 1992-07-28 Wyko Corporation Rough surface profiler and method
JPH05304627A (en) 1991-08-19 1993-11-16 Fuji Photo Film Co Ltd Side grip for video camera
JPH05133711A (en) * 1991-11-11 1993-05-28 Minolta Camera Co Ltd Interferometer
US5181080A (en) 1991-12-23 1993-01-19 Therma-Wave, Inc. Method and apparatus for evaluating the thickness of thin films
US5371587A (en) 1992-05-06 1994-12-06 The Boeing Company Chirped synthetic wavelength laser radar
US6082892A (en) 1992-05-29 2000-07-04 C.I. Systems Ltd. Temperature measuring method and apparatus
WO1993024805A1 (en) 1992-06-03 1993-12-09 Zygo Corporation Interferometric method and apparatus to measure surface topography
US5390023A (en) * 1992-06-03 1995-02-14 Zygo Corporation Interferometric method and apparatus to measure surface topography
US5309277A (en) 1992-06-19 1994-05-03 Zygo Corporation High intensity illuminator
GB9213159D0 (en) 1992-06-22 1992-08-05 British Tech Group Method of and apparatus for interferometrically inspecting a surface of an object
CA2074289C (en) * 1992-07-21 1999-09-14 Claude Belleville Fabry-perot optical sensing device for measuring a physical parameter
US5402234A (en) 1992-08-31 1995-03-28 Zygo Corporation Method and apparatus for the rapid acquisition of data in coherence scanning interferometry
US5384717A (en) 1992-11-23 1995-01-24 Ford Motor Company Non-contact method of obtaining dimensional information about an object
US5398113A (en) * 1993-02-08 1995-03-14 Zygo Corporation Method and apparatus for surface topography measurement by spatial-frequency analysis of interferograms
US5777742A (en) 1993-03-11 1998-07-07 Environmental Research Institute Of Michigan System and method for holographic imaging with discernible image of an object
DE4309056B4 (en) 1993-03-20 2006-05-24 Häusler, Gerd, Prof. Dr. Method and device for determining the distance and scattering intensity of scattering points
US5386119A (en) * 1993-03-25 1995-01-31 Hughes Aircraft Company Apparatus and method for thick wafer measurement
US5956030A (en) 1993-06-11 1999-09-21 Apple Computer, Inc. Computer system with graphical user interface including windows having an identifier within a control region on the display
JPH074922A (en) 1993-06-21 1995-01-10 Jasco Corp Apparatus and method for measurement of film thickness of semiconductor multilayer thin film
EP0767361B1 (en) 1993-07-22 2000-02-23 Applied Spectral Imaging Ltd. Method and apparatus for spectral imaging
US5856871A (en) * 1993-08-18 1999-01-05 Applied Spectral Imaging Ltd. Film thickness mapping using interferometric spectral imaging
GB9320500D0 (en) 1993-10-05 1993-11-24 Rensihaw Plc Interferometric distance measuring apparatus
US5371588A (en) 1993-11-10 1994-12-06 University Of Maryland, College Park Surface profile and material mapper using a driver to displace the sample in X-Y-Z directions
US5481811A (en) 1993-11-22 1996-01-09 The Budd Company Universal inspection workpiece holder
US5483064A (en) 1994-01-21 1996-01-09 Wyko Corporation Positioning mechanism and method for providing coaxial alignment of a probe and a scanning means in scanning tunneling and scanning force microscopy
US5459564A (en) 1994-02-18 1995-10-17 Chivers; James T. Apparatus and method for inspecting end faces of optical fibers and optical fiber connectors
WO1995025295A1 (en) 1994-03-17 1995-09-21 Dow Benelux N.V. System for real time optimization and profit depiction
US5471303A (en) * 1994-04-29 1995-11-28 Wyko Corporation Combination of white-light scanning and phase-shifting interferometry for surface profile measurements
US5473434A (en) 1994-05-16 1995-12-05 Zygo Corporation Phase shifting interferometer and method for surface topography measurement
US5671050A (en) 1994-11-07 1997-09-23 Zygo Corporation Method and apparatus for profiling surfaces using diffracative optics
US5633714A (en) 1994-12-19 1997-05-27 International Business Machines Corporation Preprocessing of image amplitude and phase data for CD and OL measurement
US5659392A (en) 1995-03-22 1997-08-19 Eastman Kodak Company Associated dual interferometric measurement apparatus for determining a physical property of an object
US5596409A (en) * 1995-03-22 1997-01-21 Eastman Kodak Company Associated dual interferometric measurement method for determining a physical property of an object
US5598265A (en) 1995-04-06 1997-01-28 Zygo Corporation Method for profiling an object surface using a large equivalent wavelength and system therefor
US5555471A (en) 1995-05-24 1996-09-10 Wyko Corporation Method for measuring thin-film thickness and step height on the surface of thin-film/substrate test samples by phase-shifting interferometry
US5589938A (en) 1995-07-10 1996-12-31 Zygo Corporation Method and apparatus for optical interferometric measurements with reduced sensitivity to vibration
US5703692A (en) 1995-08-03 1997-12-30 Bio-Rad Laboratories, Inc. Lens scatterometer system employing source light beam scanning means
JP3602925B2 (en) 1995-12-08 2004-12-15 独立行政法人科学技術振興機構 Simultaneous measuring device of refractive index and thickness of measurement object by optical interferometry
US5748318A (en) 1996-01-23 1998-05-05 Brown University Research Foundation Optical stress generator and detector
US5602643A (en) 1996-02-07 1997-02-11 Wyko Corporation Method and apparatus for correcting surface profiles determined by phase-shifting interferometry according to optical parameters of test surface
US5640270A (en) 1996-03-11 1997-06-17 Wyko Corporation Orthogonal-scanning microscope objective for vertical-scanning and phase-shifting interferometry
JPH09297004A (en) 1996-05-01 1997-11-18 Olympus Optical Co Ltd Microscope apparatus
GB9610471D0 (en) 1996-05-18 1996-07-24 Univ Nottingham Optical measurement
US5880838A (en) 1996-06-05 1999-03-09 California Institute Of California System and method for optically measuring a structure
JP3459327B2 (en) 1996-06-17 2003-10-20 理化学研究所 Method and apparatus for measuring layer thickness and refractive index of laminated structure
US5898501A (en) * 1996-07-25 1999-04-27 Nikon Corporation Apparatus and methods for measuring wavefront aberrations of a microlithography projection lens
US5923423A (en) 1996-09-12 1999-07-13 Sentec Corporation Heterodyne scatterometer for detecting and analyzing wafer surface defects
US5956141A (en) 1996-09-13 1999-09-21 Olympus Optical Co., Ltd. Focus adjusting method and shape measuring device and interference microscope using said focus adjusting method
US5757502A (en) 1996-10-02 1998-05-26 Vlsi Technology, Inc. Method and a system for film thickness sample assisted surface profilometry
US5774224A (en) 1997-01-24 1998-06-30 International Business Machines Corporation Linear-scanning, oblique-viewing optical apparatus
US5777740A (en) 1997-02-27 1998-07-07 Phase Metrics Combined interferometer/polarimeter
US5867276A (en) * 1997-03-07 1999-02-02 Bio-Rad Laboratories, Inc. Method for broad wavelength scatterometry
US5784164A (en) 1997-03-20 1998-07-21 Zygo Corporation Method and apparatus for automatically and simultaneously determining best focus and orientation of objects to be measured by broad-band interferometric means
JP3275797B2 (en) 1997-09-10 2002-04-22 松下電器産業株式会社 Low pressure mercury vapor discharge lamp
US6665078B1 (en) 1997-09-22 2003-12-16 Candela Instruments System and method for simultaneously measuring thin film layer thickness, reflectivity, roughness, surface profile and magnetic pattern in thin film magnetic disks and silicon wafers
US6392749B1 (en) 1997-09-22 2002-05-21 Candela Instruments High speed optical profilometer for measuring surface height variation
US6031615A (en) 1997-09-22 2000-02-29 Candela Instruments System and method for simultaneously measuring lubricant thickness and degradation, thin film thickness and wear, and surface roughness
US20020015146A1 (en) 1997-09-22 2002-02-07 Meeks Steven W. Combined high speed optical profilometer and ellipsometer
US6219144B1 (en) 1997-10-02 2001-04-17 Zygo Corporation Apparatus and method for measuring the refractive index and optical path length effects of air using multiple-pass interferometry
US5912741A (en) 1997-10-10 1999-06-15 Northrop Grumman Corporation Imaging scatterometer
US5963329A (en) 1997-10-31 1999-10-05 International Business Machines Corporation Method and apparatus for measuring the profile of small repeating lines
US5900633A (en) 1997-12-15 1999-05-04 On-Line Technologies, Inc Spectrometric method for analysis of film thickness and composition on a patterned sample
US6011624A (en) 1998-01-06 2000-01-04 Zygo Corporation Geometrically-Desensitized interferometer with adjustable range of measurement depths
US6124141A (en) 1998-01-07 2000-09-26 International Business Machines Corporation Non-destructive method and device for measuring the depth of a buried interface
US5953124A (en) 1998-01-19 1999-09-14 Zygo Corporation Interferometric methods and systems using low coherence illumination
US6028670A (en) 1998-01-19 2000-02-22 Zygo Corporation Interferometric methods and systems using low coherence illumination
US5999263A (en) 1998-01-26 1999-12-07 Zygo Corporation Method and apparatus for performing interferometric measurements with reduced sensitivity to vibration
US5995224A (en) 1998-01-28 1999-11-30 Zygo Corporation Full-field geometrically-desensitized interferometer employing diffractive and conventional optics
US6495394B1 (en) * 1999-02-16 2002-12-17 Sumitomo Metal (Smi) Electronics Devices Inc. Chip package and method for manufacturing the same
US6407816B1 (en) 1998-02-23 2002-06-18 Zygo Corporation Interferometer and method for measuring the refractive index and optical path length effects of air
KR20010041209A (en) 1998-02-23 2001-05-15 게리 윌리스 Interferometer and method for measuring the refractive index and optical path length effects of air
US6483580B1 (en) 1998-03-06 2002-11-19 Kla-Tencor Technologies Corporation Spectroscopic scatterometer system
WO1999050615A1 (en) * 1998-03-27 1999-10-07 Litef Gmbh Method and device for measuring absolute interferometric length
US6175669B1 (en) * 1998-03-30 2001-01-16 The Regents Of The Universtiy Of California Optical coherence domain reflectometry guidewire
DE19814057B4 (en) 1998-03-30 2009-01-02 Carl Zeiss Meditec Ag Arrangement for optical coherence tomography and coherence topography
US6242739B1 (en) 1998-04-21 2001-06-05 Alexander P. Cherkassky Method and apparatus for non-destructive determination of film thickness and dopant concentration using fourier transform infrared spectrometry
DE19819762A1 (en) 1998-05-04 1999-11-25 Bosch Gmbh Robert Interferometric measuring device
US6229988B1 (en) 1998-05-20 2001-05-08 Lojack Corporation Method of and apparatus for battery and similar power source conservation in periodically operable portable and related radio receivers and the like
US6034774A (en) 1998-06-26 2000-03-07 Eastman Kodak Company Method for determining the retardation of a material using non-coherent light interferometery
JP2990266B1 (en) * 1998-08-18 1999-12-13 株式会社東京精密 Sinusoidal wavelength scanning interferometer and sinusoidal wavelength scanning light source device
US6275297B1 (en) 1998-08-19 2001-08-14 Sc Technology Method of measuring depths of structures on a semiconductor substrate
US6208424B1 (en) 1998-08-27 2001-03-27 Zygo Corporation Interferometric apparatus and method for measuring motion along multiple axes
KR100270365B1 (en) * 1998-09-17 2001-01-15 김상국 High Speed Scanning Interferometer System
US6252667B1 (en) 1998-09-18 2001-06-26 Zygo Corporation Interferometer having a dynamic beam steering assembly
US6313918B1 (en) 1998-09-18 2001-11-06 Zygo Corporation Single-pass and multi-pass interferometery systems having a dynamic beam-steering assembly for measuring distance, angle, and dispersion
JP2000121317A (en) 1998-10-12 2000-04-28 Hitachi Electronics Eng Co Ltd Interference phase detecting system for optical interferometer
US6038027A (en) 1998-10-29 2000-03-14 Eastman Kodak Company Method for measuring material thickness profiles
US6067161A (en) 1998-10-29 2000-05-23 Eastman Kodak Company Apparatus for measuring material thickness profiles
US6072581A (en) 1998-10-30 2000-06-06 Zygo Corporation Geometrically-desensitized interferometer incorporating an optical assembly with high stray-beam management capability
US6159073A (en) 1998-11-02 2000-12-12 Applied Materials, Inc. Method and apparatus for measuring substrate layer thickness during chemical mechanical polishing
JP3569726B2 (en) 1998-12-15 2004-09-29 独立行政法人理化学研究所 Apparatus and method for measuring geometric thickness and refractive index of sample
US6184984B1 (en) 1999-02-09 2001-02-06 Kla-Tencor Corporation System for measuring polarimetric spectrum and other properties of a sample
US6075601A (en) 1999-03-03 2000-06-13 Eastman Kodak Company Optical probe calibration apparatus and method
KR100290086B1 (en) * 1999-03-23 2001-05-15 윤덕용 Method and Apparatus for Three Dimensional Thickness Profile Measurement of Transparent Dielectric Thin-Film by White-Light Scanning Interferometry
US6417927B2 (en) 1999-04-28 2002-07-09 Zygo Corporation Method and apparatus for accurately compensating both long and short term fluctuations in the refractive index of air in an interferometer
US6449066B1 (en) 1999-04-29 2002-09-10 Kaiser Optical Systems, Inc. Polarization insensitive, high dispersion optical element
US6888638B1 (en) 1999-05-05 2005-05-03 Zygo Corporation Interferometry system having a dynamic beam steering assembly for measuring angle and distance
TW477897B (en) 1999-05-07 2002-03-01 Sharp Kk Liquid crystal display device, method and device to measure cell thickness of liquid crystal display device, and phase difference plate using the method thereof
US6507405B1 (en) * 1999-05-17 2003-01-14 Ultratech Stepper, Inc. Fiber-optic interferometer employing low-coherence-length light for precisely measuring absolute distance and tilt
US6226092B1 (en) 1999-05-27 2001-05-01 Zygo Corporation Full-field geometrically desensitized interferometer using refractive optics
US6249351B1 (en) 1999-06-03 2001-06-19 Zygo Corporation Grazing incidence interferometer and method
US6381009B1 (en) 1999-06-29 2002-04-30 Nanometrics Incorporated Elemental concentration measuring methods and instruments
US6359692B1 (en) 1999-07-09 2002-03-19 Zygo Corporation Method and system for profiling objects having multiple reflective surfaces using wavelength-tuning phase-shifting interferometry
US6201609B1 (en) * 1999-08-27 2001-03-13 Zygo Corporation Interferometers utilizing polarization preserving optical systems
US6160621A (en) 1999-09-30 2000-12-12 Lam Research Corporation Method and apparatus for in-situ monitoring of plasma etch and deposition processes using a pulsed broadband light source
US6259521B1 (en) 1999-10-05 2001-07-10 Advanced Micro Devices, Inc. Method and apparatus for controlling photolithography parameters based on photoresist images
JP3642996B2 (en) 1999-11-18 2005-04-27 独立行政法人科学技術振興機構 Method for simultaneously measuring refractive index and thickness of object to be measured by optical interferometry and apparatus therefor
US6545761B1 (en) * 1999-11-30 2003-04-08 Veeco Instruments, Inc. Embedded interferometer for reference-mirror calibration of interferometric microscope
DE10195052B3 (en) 2000-01-25 2015-06-18 Zygo Corp. Method and devices for determining a geometric property of a test object and optical profile measuring system
JP4673955B2 (en) 2000-03-24 2011-04-20 オリンパス株式会社 Optical device
US6429943B1 (en) 2000-03-29 2002-08-06 Therma-Wave, Inc. Critical dimension analysis with simultaneous multiple angle of incidence measurements
JP2001343208A (en) * 2000-03-30 2001-12-14 Fuji Photo Optical Co Ltd Method and apparatus for fringe analysis using fourier transform
LU90580B1 (en) 2000-05-08 2001-11-09 Europ Economic Community Method of identifying an object
US6449048B1 (en) 2000-05-11 2002-09-10 Veeco Instruments, Inc. Lateral-scanning interferometer with tilted optical axis
WO2001090686A1 (en) * 2000-05-19 2001-11-29 Zygo Corporation In-situ mirror characterization
US6597460B2 (en) 2000-05-19 2003-07-22 Zygo Corporation Height scanning interferometer for determining the absolute position and surface profile of an object with respect to a datum
US6417109B1 (en) 2000-07-26 2002-07-09 Aiwa Co., Ltd. Chemical-mechanical etch (CME) method for patterned etching of a substrate surface
US6847029B2 (en) 2000-07-27 2005-01-25 Zetetic Institute Multiple-source arrays with optical transmission enhanced by resonant cavities
US6775009B2 (en) 2000-07-27 2004-08-10 Zetetic Institute Differential interferometric scanning near-field confocal microscopy
DE10041041A1 (en) 2000-08-22 2002-03-07 Zeiss Carl Interferometer device e.g. for eye surgery has beam guide which directs superimposed beam onto surfaces
US7317531B2 (en) 2002-12-05 2008-01-08 Kla-Tencor Technologies Corporation Apparatus and methods for detecting overlay errors using scatterometry
JP4583619B2 (en) * 2000-09-13 2010-11-17 富士フイルム株式会社 Method for detecting fringe image analysis error and method for correcting fringe image analysis error
US6694284B1 (en) * 2000-09-20 2004-02-17 Kla-Tencor Technologies Corp. Methods and systems for determining at least four properties of a specimen
US20020190207A1 (en) 2000-09-20 2002-12-19 Ady Levy Methods and systems for determining a characteristic of micro defects on a specimen
US6891627B1 (en) 2000-09-20 2005-05-10 Kla-Tencor Technologies Corp. Methods and systems for determining a critical dimension and overlay of a specimen
US6370299B1 (en) 2000-09-27 2002-04-09 The Boeing Company Fiber optic collimation apparatus and associated method
ATE464534T1 (en) 2000-11-02 2010-04-15 Zygo Corp METHOD AND DEVICE FOR HEIGHT-SCANNING INTERFEROMETRY WITH PHASE DIFFERENCE ANALYSIS
US6633389B1 (en) 2000-11-28 2003-10-14 Nanometrics Incorporated Profiling method
JP3871309B2 (en) * 2001-01-31 2007-01-24 フジノン株式会社 Phase shift fringe analysis method and apparatus using the same
US6909509B2 (en) 2001-02-20 2005-06-21 Zygo Corporation Optical surface profiling systems
US6721094B1 (en) * 2001-03-05 2004-04-13 Sandia Corporation Long working distance interference microscope
JP2004530869A (en) 2001-03-13 2004-10-07 ザイゴ　コーポレーション Reduction of cyclic error in average interference position measurement
KR100393429B1 (en) 2001-04-09 2003-08-02 한국과학기술원 Two-wavelength white-light interferometry and interferometer for measuring steps of different metallic materials
US6788422B2 (en) 2001-04-17 2004-09-07 Zygo Corporation Method and apparatus for using quasi-stable light sources in interferometry applications
US6624893B1 (en) 2001-06-06 2003-09-23 Veeco Instruments Inc. Correction of scanning errors in interferometric profiling
US6721510B2 (en) * 2001-06-26 2004-04-13 Aoptix Technologies, Inc. Atmospheric optical data transmission system
US7382447B2 (en) * 2001-06-26 2008-06-03 Kla-Tencor Technologies Corporation Method for determining lithographic focus and exposure
US6778280B2 (en) * 2001-07-06 2004-08-17 Zygo Corporation Interferometry system and method employing an angular difference in propagation between orthogonally polarized input beam components
US6867866B1 (en) 2001-08-10 2005-03-15 Therma-Wave, Inc. CD metrology analysis using green's function
US6741357B2 (en) 2001-08-14 2004-05-25 Seagate Technology Llc Quadrature phase shift interferometer with unwrapping of phase
CN1556914A (en) 2001-09-21 2004-12-22 Kmac株式会社 Apparatus for measuring thickness profile and refractive index distribution of multiple layers of thin films by means of two-dimensional reflectometry and method of measuring the same
US6714307B2 (en) * 2001-10-16 2004-03-30 Zygo Corporation Measurement of complex surface shapes using a spherical wavefront
US6630982B2 (en) 2001-10-18 2003-10-07 Motorola, Inc. Color and intensity tunable liquid crystal device
KR100437024B1 (en) 2001-10-18 2004-06-23 엘지전자 주식회사 The inspection method of thin film and the same apparatus
WO2003036229A1 (en) * 2001-10-25 2003-05-01 Toray Engineering Co., Ltd. Surface shape measuring method and device therefor
US6847453B2 (en) 2001-11-05 2005-01-25 Optiphase, Inc. All fiber autocorrelator
KR100354613B1 (en) * 2001-11-06 2002-10-11 박헌휘 Repairable immersed hollow fiber membrane module
US7030995B2 (en) 2001-12-10 2006-04-18 Zygo Corporation Apparatus and method for mechanical phase shifting interferometry
US6856384B1 (en) * 2001-12-13 2005-02-15 Nanometrics Incorporated Optical metrology system with combined interferometer and ellipsometer
US6934035B2 (en) 2001-12-18 2005-08-23 Massachusetts Institute Of Technology System and method for measuring optical distance
US6816264B1 (en) 2001-12-21 2004-11-09 Itt Manufacturing Enterprises, Inc. Systems and methods for amplified optical metrology
CN1623085A (en) 2002-01-24 2005-06-01 通用医疗公司 Apparatus and method for ranging and noise reduction of low coherence interferometry LCI and optical coherence tomography OCT signals by parallel detection of spectral bands
US7057739B2 (en) * 2002-02-12 2006-06-06 Zygo Corporation Separated beam multiple degree of freedom interferometer
US6906784B2 (en) 2002-03-04 2005-06-14 Zygo Corporation Spatial filtering in interferometry
CN1320334C (en) 2002-03-14 2007-06-06 泰勒·霍布森有限公司 Surface profiling apparatus
GB2385417B (en) 2002-03-14 2004-01-21 Taylor Hobson Ltd Surface profiling apparatus
WO2003087934A2 (en) 2002-04-11 2003-10-23 Zygo Corporation Interferometry system error compensation in twin stage lithography tools
US7068376B2 (en) 2002-04-19 2006-06-27 Zygo Corporation Interferometry method and apparatus for producing lateral metrology images
JP2005524832A (en) * 2002-05-02 2005-08-18 ザイゴ　コーポレーション Phase shift analysis for scanning interferometers
EP1506373B1 (en) 2002-05-17 2008-05-14 Sensor Highway Limited Fibre-optic interferometric remote sensor
DE10392828T5 (en) 2002-06-17 2005-07-21 Zygo Corp., Middlefield Interferometry methods and systems with coupled cavity geometry for use with an extended source
JP2005530147A (en) 2002-06-17 2005-10-06 ザイゴ　コーポレーション Interferometric optical system and method for scanning optical path length and focus simultaneously
US6882433B2 (en) * 2002-07-01 2005-04-19 Lightgage, Inc. Interferometer system of compact configuration
US7428685B2 (en) * 2002-07-08 2008-09-23 Zygo Corporation Cyclic error compensation in interferometry systems
US7262860B2 (en) 2002-07-29 2007-08-28 Zygo Corporation Compensation for errors in off-axis interferometric measurements
US7869057B2 (en) 2002-09-09 2011-01-11 Zygo Corporation Multiple-angle multiple-wavelength interferometer using high-NA imaging and spectral analysis
US7139081B2 (en) 2002-09-09 2006-11-21 Zygo Corporation Interferometry method for ellipsometry, reflectometry, and scatterometry measurements, including characterization of thin film structures
JP4563811B2 (en) 2002-09-09 2010-10-13 ザイゴ コーポレーション Interferometry and scanning interferometers for ellipsometry, reflected light and scattered light measurements, including characterization of thin film structures
US6901176B2 (en) 2002-10-15 2005-05-31 University Of Maryland Fiber tip based sensor system for acoustic measurements
US6842254B2 (en) * 2002-10-16 2005-01-11 Fiso Technologies Inc. System and method for measuring an optical path difference in a sensing interferometer
JP3847703B2 (en) * 2002-12-10 2006-11-22 直弘 丹野 Optical coherence tomography device
US6925860B1 (en) 2003-02-21 2005-08-09 Nanometrics Incorporated Leveling a measured height profile
US7106454B2 (en) 2003-03-06 2006-09-12 Zygo Corporation Profiling complex surface structures using scanning interferometry
US7271918B2 (en) 2003-03-06 2007-09-18 Zygo Corporation Profiling complex surface structures using scanning interferometry
US7324214B2 (en) * 2003-03-06 2008-01-29 Zygo Corporation Interferometer and method for measuring characteristics of optically unresolved surface features
US6985232B2 (en) 2003-03-13 2006-01-10 Tokyo Electron Limited Scatterometry by phase sensitive reflectometer
US7049156B2 (en) 2003-03-19 2006-05-23 Verity Instruments, Inc. System and method for in-situ monitor and control of film thickness and trench depth
US6999180B1 (en) 2003-04-02 2006-02-14 Kla-Tencor Technologies Corporation Optical film topography and thickness measurement
US7016050B2 (en) * 2003-04-30 2006-03-21 Veeco Instruments Inc. Microscope with fixed-element autocollimator for tilt adjustment
DE10327019A1 (en) 2003-06-12 2004-12-30 Carl Zeiss Sms Gmbh Method for determining the imaging quality of an optical imaging system
US7102761B2 (en) 2003-06-13 2006-09-05 Zygo Corporation Scanning interferometry
US7177029B2 (en) 2003-07-10 2007-02-13 Zygo Corporation Stroboscopic interferometry with frequency domain analysis
US6956716B2 (en) 2003-07-30 2005-10-18 Hitachi Global Storage Technologies Netherlands, B.V. Magnetic head having multilayer heater for thermally assisted write head and method of fabrication thereof
FI20031143A0 (en) 2003-08-08 2003-08-08 Wallac Oy Optical Focusing Method and Arrangement
US7488929B2 (en) * 2003-08-13 2009-02-10 Zygo Corporation Perimeter detection using fiber optic sensors
US6977730B2 (en) 2003-08-18 2005-12-20 Zygo Corporation Method and apparatus for alignment of a precision optical assembly
US7061623B2 (en) 2003-08-25 2006-06-13 Spectel Research Corporation Interferometric back focal plane scatterometry with Koehler illumination
WO2005029193A2 (en) 2003-09-15 2005-03-31 Zygo Corporation Interferometric analysis of surfaces.
EP1519144A1 (en) 2003-09-29 2005-03-30 Nederlandse Organisatie voor toegepast-natuurwetenschappelijk onderzoek TNO Free-form optical surface measuring apparatus and method
TWI335417B (en) 2003-10-27 2011-01-01 Zygo Corp Method and apparatus for thin film measurement
US7289226B2 (en) 2003-11-04 2007-10-30 Zygo Corporation Characterization and compensation of errors in multi-axis interferometry systems
WO2005052652A2 (en) 2003-11-25 2005-06-09 Zygo Corporation Optical fiber connectors and systems including optical fiber connectors
US7379190B2 (en) 2004-01-05 2008-05-27 Zygo Corporation Stage alignment in lithography tools
JP4790632B2 (en) 2004-01-06 2011-10-12 ザイゴ コーポレーション Multi-axis interferometer and method and system using multi-axis interferometer
US20050179911A1 (en) 2004-02-17 2005-08-18 Digital Optics Corporation Aspheric diffractive reference for interferometric lens metrology
US7492469B2 (en) 2004-03-15 2009-02-17 Zygo Corporation Interferometry systems and methods using spatial carrier fringes
US7417743B2 (en) 2004-03-15 2008-08-26 Zygo Corporation Interferometry systems and methods
US7321430B2 (en) 2004-04-22 2008-01-22 Zygo Corporation Vibration resistant interferometry
US7177030B2 (en) * 2004-04-22 2007-02-13 Technion Research And Development Foundation Ltd. Determination of thin film topography
US7187453B2 (en) 2004-04-23 2007-03-06 Opsens Inc. Optical MEMS cavity having a wide scanning range for measuring a sensing interferometer
TW200604695A (en) 2004-05-18 2006-02-01 Zygo Corp Methods and systems for determining optical properties using low-coherence interference signals
US20050259269A1 (en) * 2004-05-19 2005-11-24 Asml Holding N.V. Shearing interferometer with dynamic pupil fill
US7119909B2 (en) 2004-06-16 2006-10-10 Veeco Instruments, Inc. Film thickness and boundary characterization by interferometric profilometry
US7378136B2 (en) * 2004-07-09 2008-05-27 3M Innovative Properties Company Optical film coating
US20060007599A1 (en) * 2004-07-12 2006-01-12 Hitachi Global Storage Technologies Netherlands B.V. System, method, and apparatus for high performance, four-piece suspension with extended hinge plate
US20060012582A1 (en) 2004-07-15 2006-01-19 De Lega Xavier C Transparent film measurements
US20060066842A1 (en) 2004-09-30 2006-03-30 Saunders Winston A Wafer inspection with a customized reflective optical channel component
US7405833B2 (en) 2004-11-05 2008-07-29 Zygo Corporation Method for calibration and removal of wavefront errors
US7417740B2 (en) 2004-11-12 2008-08-26 Medeikon Corporation Single trace multi-channel low coherence interferometric sensor
JP2006162366A (en) 2004-12-06 2006-06-22 Fujinon Corp Optical tomographic imaging system
JP4429886B2 (en) 2004-12-09 2010-03-10 富士フイルム株式会社 Optical tomography system
CA2590790C (en) * 2004-12-14 2014-09-02 Luna Innovations Inc. Compensating for time varying phase changes in interferometric measurements
US7446881B2 (en) 2005-01-12 2008-11-04 Tokyo Electron Limited System, apparatus, and method for determining temperature/thickness of an object using light interference measurements
US7884947B2 (en) 2005-01-20 2011-02-08 Zygo Corporation Interferometry for determining characteristics of an object surface, with spatially coherent illumination
TWI409451B (en) 2005-01-20 2013-09-21 Zygo Corp Interferometry system, interferometry apparatus, and interferometry systemmethod for determining characteristics of an object surface
JP2006214856A (en) 2005-02-03 2006-08-17 Canon Inc Measuring apparatus and method
WO2006107322A2 (en) 2005-04-01 2006-10-12 Zygo Corporation Method for compensating errors in interferometric surface metrology
US7826063B2 (en) * 2005-04-29 2010-11-02 Zygo Corporation Compensation of effects of atmospheric perturbations in optical metrology
US7321431B2 (en) * 2005-05-19 2008-01-22 Zygo Corporation Method and system for analyzing low-coherence interferometry signals for information about thin film structures
US7528962B2 (en) 2005-06-29 2009-05-05 Zygo Corporation Apparatus and methods for reducing non-cyclic non-linear errors in interferometry
JP2007014556A (en) * 2005-07-07 2007-01-25 Ykk Corp Overedging machine for cloth piece
US7595891B2 (en) 2005-07-09 2009-09-29 Kla-Tencor Corporation Measurement of the top surface of an object with/without transparent thin films in white light interferometry
US7495770B2 (en) 2005-08-09 2009-02-24 Zygo Corporation Beam shear reduction in interferometry systems
US7532330B2 (en) 2005-08-16 2009-05-12 Zygo Corporation Angle interferometers
US7636168B2 (en) 2005-10-11 2009-12-22 Zygo Corporation Interferometry method and system including spectral decomposition
US7711014B2 (en) 2005-10-11 2010-05-04 Clear Align Llc Apparatus and method for generating short optical pulses
EP2950065A1 (en) * 2005-10-11 2015-12-02 Duke University Method for fiber-based endoscopic angle-resolved low coherence interferometry
US7561278B2 (en) 2005-10-18 2009-07-14 Zygo Corporation Interferometer using integrated retarders to reduce physical volume
JP2007121499A (en) 2005-10-26 2007-05-17 Nikon Corp Differential interference observation method and microscope
US7408649B2 (en) 2005-10-26 2008-08-05 Kla-Tencor Technologies Corporation Method and apparatus for optically analyzing a surface
WO2007057016A1 (en) * 2005-11-16 2007-05-24 Chemometec A/S Determination of chemical or physical properties of sample or component of a sample
US7542148B2 (en) 2005-12-06 2009-06-02 Tokyo Electron Limited Method for measuring physical quantity of measurement object in substrate processing apparatus and storage medium storing program for implementing the method
US20070127036A1 (en) 2005-12-07 2007-06-07 Chroma Ate Inc. Interference measurement system self-alignment method
KR100701974B1 (en) 2005-12-14 2007-03-30 나노전광 주식회사 Apparatus for detecting hazes of photomask surface using phase shifting interferometer and method for detecting thereof
US7612891B2 (en) 2005-12-15 2009-11-03 Veeco Instruments, Inc. Measurement of thin films using fourier amplitude
WO2007071944A1 (en) * 2005-12-22 2007-06-28 Taylor Hobson Limited Apparatus for and a method of determining surface characteristics
JP2007178261A (en) * 2005-12-28 2007-07-12 Epson Imaging Devices Corp Inspection method of substrate for electro-optical device, manufacturing method of substrate for electro-optical device, and inspection device
WO2007083376A1 (en) * 2006-01-19 2007-07-26 Shofu Inc. Light coherence tomography device and measuring head
JP2007192675A (en) * 2006-01-19 2007-08-02 Canon Inc Interference measuring method and device, and exposing device having it
JP5558005B2 (en) 2006-01-23 2014-07-23 ザイゴ コーポレーション Interferometer system for monitoring objects
US7564568B2 (en) 2006-03-02 2009-07-21 Zygo Corporation Phase shifting interferometry with multiple accumulation
US7456956B2 (en) 2006-03-21 2008-11-25 Thermo Electron Scientific Instruments Llc Vibrational circular dichroism spectrometer using reflective optics
WO2008011510A2 (en) * 2006-07-21 2008-01-24 Zygo Corporation Compensation of systematic effects in low coherence interferometry
US7710580B2 (en) 2006-10-27 2010-05-04 Zygo Corporation Vibration resistant interferometry
US7812964B2 (en) 2006-11-15 2010-10-12 Zygo Corporation Distance measuring interferometer and encoder metrology systems for use in lithography tools
JP4869895B2 (en) * 2006-12-07 2012-02-08 富士フイルム株式会社 Optical tomographic imaging system
US7812965B2 (en) 2006-12-11 2010-10-12 Zygo Corporation Multiple-degree of freedom interferometer with compensation for gas effects
US7894075B2 (en) 2006-12-11 2011-02-22 Zygo Corporation Multiple-degree of freedom interferometer with compensation for gas effects
US7933025B2 (en) 2006-12-18 2011-04-26 Zygo Corporation Sinusoidal phase shifting interferometry
US7924435B2 (en) 2006-12-22 2011-04-12 Zygo Corporation Apparatus and method for measuring characteristics of surface features
US7505863B2 (en) * 2007-07-13 2009-03-17 Veeco Instruments, Inc. Interferometric iterative technique with bandwidth and numerical-aperture dependency
DE102008001482A1 (en) * 2008-04-30 2009-11-05 Robert Bosch Gmbh Interferometric arrangement and method for adjusting a path difference
US9080861B2 (en) * 2008-08-20 2015-07-14 Hamamatsu Photonics K.K. Observation device, and observation method
US8120781B2 (en) * 2008-11-26 2012-02-21 Zygo Corporation Interferometric systems and methods featuring spectral analysis of unevenly sampled data
US8107084B2 (en) * 2009-01-30 2012-01-31 Zygo Corporation Interference microscope with scan motion detection using fringe motion in monitor patterns
US8422026B2 (en) * 2009-06-15 2013-04-16 Artur G. Olszak Spectrally controllable light sources in interferometry

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5122648A (en) * 1990-06-01 1992-06-16 Wyko Corporation Apparatus and method for automatically focusing an interference microscope
US6181420B1 (en) * 1998-10-06 2001-01-30 Zygo Corporation Interferometry system having reduced cyclic errors
US20020196450A1 (en) * 2001-06-25 2002-12-26 Artur Olszak Scanning interferometry with reference signal
US20050157306A1 (en) * 2004-01-16 2005-07-21 Joanna Schmit Measurement of object deformation with optical profiler

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of EP2238430A4 *

Also Published As

Publication number Publication date
EP2238430B9 (en) 2016-07-13
WO2010062860A2 (en) 2010-06-03
CN102057269B (en) 2014-08-13
TWI425184B (en) 2014-02-01
TW201037267A (en) 2010-10-16
EP2238430A4 (en) 2012-02-01
KR20120053043A (en) 2012-05-24
US8379218B2 (en) 2013-02-19
US20130155413A1 (en) 2013-06-20
US7978338B2 (en) 2011-07-12
JP2011508241A (en) 2011-03-10
US8004688B2 (en) 2011-08-23
KR101530898B1 (en) 2015-06-23
WO2010062860A3 (en) 2010-08-26
EP2238430A2 (en) 2010-10-13
US20100128283A1 (en) 2010-05-27
WO2010062853A2 (en) 2010-06-03
US8120781B2 (en) 2012-02-21
US20100128276A1 (en) 2010-05-27
EP2238430B1 (en) 2016-03-30
US20100128278A1 (en) 2010-05-27
KR101191842B1 (en) 2012-10-18
US8902431B2 (en) 2014-12-02
KR20100094584A (en) 2010-08-26
US20100128280A1 (en) 2010-05-27
JP5536667B2 (en) 2014-07-02
CN102057269A (en) 2011-05-11

Similar Documents

Publication Publication Date Title
WO2010062853A3 (en) Scan error correction in low coherence scanning interferometry
US8504141B2 (en) Optical tomographic image generating apparatus and optical tomographic image generating method
WO2005114096A3 (en) Methods and systems for determining optical properties using low-coherence interference signals
EP1775545A3 (en) Optical image measuring device, optical image measuring program, fundus observation device, and fundus observation program
WO2008154349A3 (en) Method and apparatus for localized polarization sensitive imaging
TW201129775A (en) Fiber-based interferometer system for monitoring an imaging interferometer
JP2011242177A5 (en)
KR102121345B1 (en) Cavity measurement by interference spectroscopy
JP2005283155A (en) Dispersion correcting apparatus in light interference sectional image imaging method
US8780334B1 (en) Topographical profiling with coherence scanning interferometry
JP4443420B2 (en) Method and apparatus for optical coherence tomography
RU2012142137A (en) SPECTROMETRIC DEVICE
Hagen-Eggert et al. Analysis of the signal fall-off in spectral domain optical coherence tomography systems
JP4897586B2 (en) Shape measuring device
EP3526602B1 (en) Method for detecting a deflection, scanning apparatus, and use of a blocking device for detecting a deflection
JP6947493B2 (en) Equipment and methods for inspecting the surface of the mask
WO2014061498A1 (en) Optical tomographic image acquiring device
TW200700940A (en) Apparatus and method for in situ and ex situ measurements of optical system flare
JP2016083245A (en) Optical tomography apparatus
KR20090098225A (en) A coordinate measuring machine using a reference plate
JP2022154236A5 (en)
US8780337B2 (en) System and method for eliminating the effect of non-primary laser modes on characterization of optical components through characterized decomposition
US9036011B2 (en) Optical phase extraction system having phase compensation function of closed loop type and three-dimensional image extraction method thereof
JP2013029317A (en) Optical tomographic image measuring apparatus and optical tomographic image measuring system
KR101197970B1 (en) Correction method and device for measuring roughness

Legal Events

Date Code Title Description
WWE Wipo information: entry into national phase

Ref document number: 200980120703.5

Country of ref document: CN

WWE Wipo information: entry into national phase

Ref document number: 2010540961

Country of ref document: JP

ENP Entry into the national phase

Ref document number: 20107015982

Country of ref document: KR

Kind code of ref document: A

121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 09829736

Country of ref document: EP

Kind code of ref document: A2

WWE Wipo information: entry into national phase

Ref document number: 2009829736

Country of ref document: EP

NENP Non-entry into the national phase

Ref country code: DE