WO2010092471A3 - Method and device for coating planar substrates with chalcogens - Google Patents

Method and device for coating planar substrates with chalcogens Download PDF

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Publication number
WO2010092471A3
WO2010092471A3 PCT/IB2010/000280 IB2010000280W WO2010092471A3 WO 2010092471 A3 WO2010092471 A3 WO 2010092471A3 IB 2010000280 W IB2010000280 W IB 2010000280W WO 2010092471 A3 WO2010092471 A3 WO 2010092471A3
Authority
WO
WIPO (PCT)
Prior art keywords
substrates
chalcogen
chalcogens
forming
process chamber
Prior art date
Application number
PCT/IB2010/000280
Other languages
French (fr)
Other versions
WO2010092471A2 (en
Inventor
Jörg Baier
Immo KÖTSCHAU
Reinhard Lenz
Dieter Schmid
Robert Michael Hartung
Original Assignee
Centrotherm Photovoltaics Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Centrotherm Photovoltaics Ag filed Critical Centrotherm Photovoltaics Ag
Publication of WO2010092471A2 publication Critical patent/WO2010092471A2/en
Publication of WO2010092471A3 publication Critical patent/WO2010092471A3/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/246—Replenishment of source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0623—Sulfides, selenides or tellurides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/228—Gas flow assisted PVD deposition
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • C23C14/566—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases using a load-lock chamber

Abstract

The invention relates to a method and a device for coating planar substrates with chalcogens in the form of thin layers. The invention is intended to provide a fast and cost-effective coating of planar substrates with chalcogens, with a controlled and safe removal of the uncondensed chalcogen and a device suitable for carrying out the method. This is achieved by forming an inlet side and outlet side gas lock (6, 7) for the oxygen-tight closure of a process chamber (5), introducing one or more substrates to be coated, said substrates being temperature-regulated to a predetermined temperature, into the process chamber (5), introducing a chalcogen vapour/carrier gas mixture into the process chamber (5) which has a transport channel (4), above the substrates, forming a flow of the chalcogen vapour/carrier gas mixture through the transport channel (4) between the inlet side and outlet side gas locks (6, 7) and forming a chalcogen layer on the substrates by means of PVD during a predetermined dwell time and removing the chalcogen vapour which has not condensed onto the substrates together with the carrier gas between the gas locks, and removal of the substrates after the predetermined process time has elapsed.
PCT/IB2010/000280 2009-02-16 2010-02-15 Method and device for coating planar substrates with chalcogens WO2010092471A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE200910009022 DE102009009022A1 (en) 2009-02-16 2009-02-16 Method and device for coating flat substrates with chalcogens
DE102009009022.3 2009-02-16

Publications (2)

Publication Number Publication Date
WO2010092471A2 WO2010092471A2 (en) 2010-08-19
WO2010092471A3 true WO2010092471A3 (en) 2010-12-16

Family

ID=42083920

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/IB2010/000280 WO2010092471A2 (en) 2009-02-16 2010-02-15 Method and device for coating planar substrates with chalcogens

Country Status (3)

Country Link
DE (1) DE102009009022A1 (en)
TW (1) TW201038756A (en)
WO (1) WO2010092471A2 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102010034653A1 (en) 2010-08-17 2012-02-23 Centrotherm Photovoltaics Ag Process for the condensation of chalcogen vapor and apparatus for carrying out the process
DE102010060292B4 (en) 2010-11-01 2023-05-25 Antec Solar Gmbh Process and CSS reactor for the continuous coating of substrates
DE102013108405B4 (en) * 2012-09-14 2015-11-05 Von Ardenne Gmbh Continuous Substrate Treatment Plant and Cleaning Process
NL2010809C2 (en) 2013-05-16 2014-11-24 Smit Ovens Bv DEVICE AND METHOD FOR APPLYING A MATERIAL TO A SUBSTRATE.
CN111321376B (en) * 2020-03-26 2022-05-03 武汉华星光电半导体显示技术有限公司 Evaporation plating machine

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5487784A (en) * 1991-10-29 1996-01-30 Ellis, Jr.; Frank B. Formation of tin oxide films on glass substrates
US5863337A (en) * 1993-02-16 1999-01-26 Ppg Industries, Inc. Apparatus for coating a moving glass substrate
GB2333781A (en) * 1998-01-19 1999-08-04 Libbey Owens Ford Co CVD coater for glass using two exhaust towers
WO2008085604A2 (en) * 2006-11-10 2008-07-17 Solopower, Inc. Reel-to-reel reaction of precursor film to form solar cell absorber
WO2009034131A2 (en) * 2007-09-11 2009-03-19 Centrotherm Photovoltaics Ag Method and arrangement for providing chalcogens

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6676994B2 (en) * 2000-03-31 2004-01-13 University Of Delaware Method for producing thin films
DE102004024601A1 (en) 2004-05-13 2005-12-01 Klaus Dr. Kalberlah Selenizing flexible strip-like CIS cells used in the production of thin layer solar cells comprises feeding a continuous strip through a condensation zone and passing the strip through an inert carrier gas
US7927659B2 (en) * 2005-04-26 2011-04-19 First Solar, Inc. System and method for depositing a material on a substrate

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5487784A (en) * 1991-10-29 1996-01-30 Ellis, Jr.; Frank B. Formation of tin oxide films on glass substrates
US5863337A (en) * 1993-02-16 1999-01-26 Ppg Industries, Inc. Apparatus for coating a moving glass substrate
GB2333781A (en) * 1998-01-19 1999-08-04 Libbey Owens Ford Co CVD coater for glass using two exhaust towers
WO2008085604A2 (en) * 2006-11-10 2008-07-17 Solopower, Inc. Reel-to-reel reaction of precursor film to form solar cell absorber
WO2009034131A2 (en) * 2007-09-11 2009-03-19 Centrotherm Photovoltaics Ag Method and arrangement for providing chalcogens

Also Published As

Publication number Publication date
DE102009009022A1 (en) 2010-08-26
TW201038756A (en) 2010-11-01
WO2010092471A2 (en) 2010-08-19

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