WO2011056668A3 - Selective die electrical insulation additive process - Google Patents
Selective die electrical insulation additive process Download PDFInfo
- Publication number
- WO2011056668A3 WO2011056668A3 PCT/US2010/054325 US2010054325W WO2011056668A3 WO 2011056668 A3 WO2011056668 A3 WO 2011056668A3 US 2010054325 W US2010054325 W US 2010054325W WO 2011056668 A3 WO2011056668 A3 WO 2011056668A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- die
- electrical insulation
- additive process
- die electrical
- insulation additive
- Prior art date
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- H01L24/82—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected by forming build-up interconnects at chip-level, e.g. for high density interconnects [HDI]
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- H01L21/02282—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process liquid deposition, e.g. spin-coating, sol-gel techniques, spray coating
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Abstract
Additive processes are employed for electrically insulating selected surface regions on a stack of die; and methods for electrically interconnecting die in a stack of die, include additive processes for electrically insulating selected surface regions of the die. Regions that are not insulated according to the invention are available for electrical connection using electrically conductive material applied in flowable form to make electrically conductive traces.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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US25542909P | 2009-10-27 | 2009-10-27 | |
US61/255,429 | 2009-10-27 |
Publications (2)
Publication Number | Publication Date |
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WO2011056668A2 WO2011056668A2 (en) | 2011-05-12 |
WO2011056668A3 true WO2011056668A3 (en) | 2011-09-15 |
Family
ID=43970686
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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PCT/US2010/054325 WO2011056668A2 (en) | 2009-10-27 | 2010-10-27 | Selective die electrical insulation additive process |
Country Status (3)
Country | Link |
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US (2) | US9147583B2 (en) |
TW (1) | TWI520213B (en) |
WO (1) | WO2011056668A2 (en) |
Families Citing this family (22)
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US7999383B2 (en) | 2006-07-21 | 2011-08-16 | Bae Systems Information And Electronic Systems Integration Inc. | High speed, high density, low power die interconnect system |
US8704379B2 (en) | 2007-09-10 | 2014-04-22 | Invensas Corporation | Semiconductor die mount by conformal die coating |
KR101554761B1 (en) * | 2008-03-12 | 2015-09-21 | 인벤사스 코포레이션 | Support mounted electrically interconnected die assembly |
US9153517B2 (en) | 2008-05-20 | 2015-10-06 | Invensas Corporation | Electrical connector between die pad and z-interconnect for stacked die assemblies |
US9147583B2 (en) | 2009-10-27 | 2015-09-29 | Invensas Corporation | Selective die electrical insulation by additive process |
JP5512292B2 (en) * | 2010-01-08 | 2014-06-04 | ルネサスエレクトロニクス株式会社 | Manufacturing method of semiconductor device |
US8587088B2 (en) | 2011-02-17 | 2013-11-19 | Apple Inc. | Side-mounted controller and methods for making the same |
US9196588B2 (en) * | 2011-11-04 | 2015-11-24 | Invensas Corporation | EMI shield |
KR20140109134A (en) * | 2013-03-05 | 2014-09-15 | 삼성전자주식회사 | Semiconductor package having multi-channel and related electronic system |
US20150201500A1 (en) * | 2014-01-12 | 2015-07-16 | Zohar SHINAR | System, device, and method of three-dimensional printing |
US20150197062A1 (en) * | 2014-01-12 | 2015-07-16 | Zohar SHINAR | Method, device, and system of three-dimensional printing |
KR102247916B1 (en) * | 2014-01-16 | 2021-05-04 | 삼성전자주식회사 | Semiconductro pacakages having stepwised stacking structures |
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US20110266684A1 (en) | 2011-11-03 |
WO2011056668A2 (en) | 2011-05-12 |
TW201125036A (en) | 2011-07-16 |
TWI520213B (en) | 2016-02-01 |
US9490230B2 (en) | 2016-11-08 |
US20160020188A1 (en) | 2016-01-21 |
US9147583B2 (en) | 2015-09-29 |
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