WO2011095217A1 - Method and process for metallic stamp replication for large area nanopatterns - Google Patents
Method and process for metallic stamp replication for large area nanopatterns Download PDFInfo
- Publication number
- WO2011095217A1 WO2011095217A1 PCT/EP2010/051399 EP2010051399W WO2011095217A1 WO 2011095217 A1 WO2011095217 A1 WO 2011095217A1 EP 2010051399 W EP2010051399 W EP 2010051399W WO 2011095217 A1 WO2011095217 A1 WO 2011095217A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- stamp
- recited
- metal
- layer
- imprint
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
- H01L21/0274—Photolithographic processes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
Abstract
Description
Claims
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US13/576,411 US20120297856A1 (en) | 2010-02-05 | 2010-02-05 | Method and process for metallic stamp replication for large area nanopatterns |
JP2012551510A JP2013518740A (en) | 2010-02-05 | 2010-02-05 | Methods and processes for metal stamp replication for large area nanopatterns |
KR1020127023157A KR101698838B1 (en) | 2010-02-05 | 2010-02-05 | Method and process for metallic stamp replication for large area nanopatterns |
EP10706563A EP2531888A1 (en) | 2010-02-05 | 2010-02-05 | Method and process for metallic stamp replication for large area nanopatterns |
PCT/EP2010/051399 WO2011095217A1 (en) | 2010-02-05 | 2010-02-05 | Method and process for metallic stamp replication for large area nanopatterns |
CN201080061817XA CN102713752A (en) | 2010-02-05 | 2010-02-05 | Method and process for metallic stamp replication for large area nanopatterns |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/EP2010/051399 WO2011095217A1 (en) | 2010-02-05 | 2010-02-05 | Method and process for metallic stamp replication for large area nanopatterns |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2011095217A1 true WO2011095217A1 (en) | 2011-08-11 |
Family
ID=42357620
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2010/051399 WO2011095217A1 (en) | 2010-02-05 | 2010-02-05 | Method and process for metallic stamp replication for large area nanopatterns |
Country Status (6)
Country | Link |
---|---|
US (1) | US20120297856A1 (en) |
EP (1) | EP2531888A1 (en) |
JP (1) | JP2013518740A (en) |
KR (1) | KR101698838B1 (en) |
CN (1) | CN102713752A (en) |
WO (1) | WO2011095217A1 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP3011391B1 (en) * | 2013-06-20 | 2018-07-18 | Ev Group E. Thallner GmbH | Mould with a mould pattern, and method for producing same |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8771529B1 (en) * | 2010-09-30 | 2014-07-08 | Seagate Technology Llc | Method for imprint lithography |
KR20140065451A (en) * | 2011-09-19 | 2014-05-29 | 크루서블 인텔렉츄얼 프라퍼티 엘엘씨. | Nano- and micro-replication for authentication and texturization |
SG10202003822RA (en) * | 2015-10-27 | 2020-05-28 | Agency Science Tech & Res | Nanoinjection molding |
EP3547026B1 (en) * | 2018-03-28 | 2023-11-29 | CSEM Centre Suisse d'Electronique et de Microtechnique SA | Method for producing a metal stamp for embossing a nano- and/or microstructure on a metal device as well as uses thereof and devices made therewith |
KR102142981B1 (en) * | 2018-05-29 | 2020-08-11 | 한국기계연구원 | Method of manufacturing metal layer having nano pattern |
CN114178067B (en) * | 2022-01-14 | 2023-04-28 | 苏州新维度微纳科技有限公司 | Nanometer stamping colloid sputtering device and method |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5422389A (en) | 1977-07-21 | 1979-02-20 | Toyama Chem Co Ltd | Novel 7alpha-methoxycephalosporins and their preparation |
US5244730A (en) | 1991-04-30 | 1993-09-14 | International Business Machines Corporation | Plasma deposition of fluorocarbon |
US5698901A (en) | 1994-09-12 | 1997-12-16 | Nec Corporation | Semiconductor device with amorphous carbon layer for reducing wiring delay |
US6184572B1 (en) | 1998-04-29 | 2001-02-06 | Novellus Systems, Inc. | Interlevel dielectric stack containing plasma deposited fluorinated amorphous carbon films for semiconductor devices |
WO2002003142A2 (en) * | 2000-06-30 | 2002-01-10 | President And Fellows Of Harvard College | Electric microcontact printing method and apparatus |
EP1731962A1 (en) | 2005-06-10 | 2006-12-13 | Obducat AB | Pattern replication with intermediate stamp |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20030071016A1 (en) | 2001-10-11 | 2003-04-17 | Wu-Sheng Shih | Patterned structure reproduction using nonsticking mold |
TW200511296A (en) * | 2003-09-01 | 2005-03-16 | Matsushita Electric Ind Co Ltd | Method for manufacturing stamper, stamper and optical recording medium |
DE602005010839D1 (en) * | 2005-06-10 | 2008-12-18 | Obducat Ab | Method for copying a model |
US7955516B2 (en) * | 2006-11-02 | 2011-06-07 | Applied Materials, Inc. | Etching of nano-imprint templates using an etch reactor |
EP2199855B1 (en) * | 2008-12-19 | 2016-07-20 | Obducat | Methods and processes for modifying polymer material surface interactions |
US20120126458A1 (en) * | 2009-05-26 | 2012-05-24 | King William P | Casting microstructures into stiff and durable materials from a flexible and reusable mold |
-
2010
- 2010-02-05 WO PCT/EP2010/051399 patent/WO2011095217A1/en active Application Filing
- 2010-02-05 CN CN201080061817XA patent/CN102713752A/en active Pending
- 2010-02-05 KR KR1020127023157A patent/KR101698838B1/en active IP Right Grant
- 2010-02-05 JP JP2012551510A patent/JP2013518740A/en active Pending
- 2010-02-05 EP EP10706563A patent/EP2531888A1/en not_active Withdrawn
- 2010-02-05 US US13/576,411 patent/US20120297856A1/en not_active Abandoned
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5422389A (en) | 1977-07-21 | 1979-02-20 | Toyama Chem Co Ltd | Novel 7alpha-methoxycephalosporins and their preparation |
US5244730A (en) | 1991-04-30 | 1993-09-14 | International Business Machines Corporation | Plasma deposition of fluorocarbon |
US5698901A (en) | 1994-09-12 | 1997-12-16 | Nec Corporation | Semiconductor device with amorphous carbon layer for reducing wiring delay |
US6184572B1 (en) | 1998-04-29 | 2001-02-06 | Novellus Systems, Inc. | Interlevel dielectric stack containing plasma deposited fluorinated amorphous carbon films for semiconductor devices |
WO2002003142A2 (en) * | 2000-06-30 | 2002-01-10 | President And Fellows Of Harvard College | Electric microcontact printing method and apparatus |
EP1731962A1 (en) | 2005-06-10 | 2006-12-13 | Obducat AB | Pattern replication with intermediate stamp |
Non-Patent Citations (12)
Title |
---|
B. HEIDARI ET AL., J. VAC. SCI. TECHNOL., vol. B 17, no. 6, 1999, pages 2961 - 2964 |
CORSAT F ET AL: "Imprint Technologies on Conductive Polymers and Metals for Interconnection and Bumping Purposes", 1ST ELECTRONICS SYSTEMINTEGRATION TECHNOLOGY CONFERENCE, IEEE, PI, 1 September 2006 (2006-09-01), pages 1336 - 1341, XP031008551, ISBN: 978-1-4244-0552-7 * |
HONG, S. ET AL., MICROELECTRONICS, ENG., vol. 84, 2007, pages 977 |
J. J. WANG ET AL., J. LIGHTWAVE TECHNOL., vol. 23, 2005, pages 474 - 485 |
J. K. LUO ET AL., MATER. LETT., vol. 58, 2004, pages 2306 - 2309 |
J. KOUBA ET AL., J. PHYS. CONFERENCE SERIES, vol. 34, 2006, pages 897 |
KIM H ET AL: "Fabrication of metallic nano stamp to replicate patterned substrate using electron-beam recording, nanoimprinting, and electroforming", IEEE TRANSACTIONS ON MAGNETICS MAY 2009 INSTITUTE OF ELECTRICAL AND ELECTRONICS ENGINEERS INC. USA, vol. 45, no. 5, May 2009 (2009-05-01), pages 2304 - 2307, XP002595495, DOI: DOI:10.1109/TMAG.2009.2016476 * |
S. H. HONG ET AL., MICROELECTRON. ENG., vol. 84, 2007, pages 977 - 979 |
T. HAATAINEN ET AL., MICROELECTRON. ENG., vol. 83, 2006, pages 948 - 950 |
Y. HIRAI ET AL., JPN. J. APPL. PHYS., vol. 41, 2002, pages 4186 |
Y. HIRAI ET AL., JPN. J. APPL. PHYS., vol. 41, 2002, pages 4186 - 4189 |
YOUN ET AL: "A replication process of metallic micro-mold by using parylene embossing and electroplating", MICROELECTRONIC ENGINEERING, ELSEVIER PUBLISHERS BV., AMSTERDAM, NL LNKD- DOI:10.1016/J.MEE.2007.05.005, vol. 85, no. 1, 20 November 2007 (2007-11-20), pages 161 - 167, XP022353975, ISSN: 0167-9317 * |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP3011391B1 (en) * | 2013-06-20 | 2018-07-18 | Ev Group E. Thallner GmbH | Mould with a mould pattern, and method for producing same |
US11131021B2 (en) | 2013-06-20 | 2021-09-28 | Ev Group E. Thallner Gmbh | Mould with a mould pattern, and device and method for producing same |
Also Published As
Publication number | Publication date |
---|---|
JP2013518740A (en) | 2013-05-23 |
KR101698838B1 (en) | 2017-01-23 |
EP2531888A1 (en) | 2012-12-12 |
US20120297856A1 (en) | 2012-11-29 |
KR20120124476A (en) | 2012-11-13 |
CN102713752A (en) | 2012-10-03 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US20120297856A1 (en) | Method and process for metallic stamp replication for large area nanopatterns | |
McClelland et al. | Nanoscale patterning of magnetic islands by imprint lithography using a flexible mold | |
JP5876059B2 (en) | Method for fabricating highly ordered nanopillars or nanohole structures on large areas | |
Lan et al. | Nanoimprint lithography | |
Hirai et al. | Nano-imprint lithography using replicated mold by Ni electroforming | |
US20060216413A1 (en) | Mold and process of production thereof | |
KR100693992B1 (en) | Nickel stamp structure for providing easy formation of self-assembled monolayer as anti-stiction layer, and manufacturing method thereof | |
US9139924B2 (en) | Systems and processes for forming molds such as nickel molds | |
CN110891895B (en) | Method for micro-and nano-fabrication by selective template removal | |
JP2010274650A (en) | Manufacturing of metal stamp for duplicating technique | |
Zhou et al. | A method for metallic stamp replication using nanoimprinting and electroforming techniques | |
Asif et al. | Comparison of UV-curable materials for high-resolution polymer nanoimprint stamps | |
JP5272791B2 (en) | Manufacturing method of mold for nanoimprint | |
JP2006303454A (en) | Nano imprint mold and methods for manufacturing same, transcribing method of convexo-concave pattern, and manufacturing method of member with concave | |
JP4889316B2 (en) | A manufacturing method of a three-dimensional structure, a three-dimensional structure, an optical element, a stencil mask, a manufacturing method of a finely processed product, and a manufacturing method of a fine pattern molded product. | |
JP2011093123A (en) | Method of manufacturing structure with comb type structure, method of manufacturing mold for molding resin structure, and resin molding | |
KR101049218B1 (en) | Micro pattern formation method using applied pressure elimination | |
TWI522229B (en) | Method and process for metallic stamp replication for large area nanopatterns | |
KR20190133369A (en) | Lithography Method Using Scanning Probe Microscope | |
KR100927481B1 (en) | Method of manufacturing micro-nano metal structures | |
Sato et al. | Development of film mold for roll to roll nanoimprintg process and its application | |
Park et al. | Chemical patterning of sub-50-nm half pitches via nanoimprint lithography | |
Kreindl et al. | Soft UV-NIL at the 12.5 nm Scale | |
Mizawa et al. | Development of Functional Transcript Resin Sheets for Nanoimprint Applications | |
Zhou et al. | High volume manufacturing of nanoimprint lithography produced devices: addressing the stamp supply challenge |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
WWE | Wipo information: entry into national phase |
Ref document number: 201080061817.X Country of ref document: CN |
|
121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 10706563 Country of ref document: EP Kind code of ref document: A1 |
|
WWE | Wipo information: entry into national phase |
Ref document number: 13576411 Country of ref document: US |
|
WWE | Wipo information: entry into national phase |
Ref document number: 2012551510 Country of ref document: JP |
|
NENP | Non-entry into the national phase |
Ref country code: DE |
|
ENP | Entry into the national phase |
Ref document number: 20127023157 Country of ref document: KR Kind code of ref document: A |
|
WWE | Wipo information: entry into national phase |
Ref document number: 2010706563 Country of ref document: EP |