WO2012149331A2 - Optical endpoint detection system - Google Patents
Optical endpoint detection system Download PDFInfo
- Publication number
- WO2012149331A2 WO2012149331A2 PCT/US2012/035469 US2012035469W WO2012149331A2 WO 2012149331 A2 WO2012149331 A2 WO 2012149331A2 US 2012035469 W US2012035469 W US 2012035469W WO 2012149331 A2 WO2012149331 A2 WO 2012149331A2
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- light
- process chamber
- internal surface
- light source
- cleaning
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B9/00—Cleaning hollow articles by methods or apparatus specially adapted thereto
- B08B9/08—Cleaning containers, e.g. tanks
- B08B9/46—Inspecting cleaned containers for cleanliness
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67253—Process monitoring, e.g. flow or thickness monitoring
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/10—Measuring as part of the manufacturing process
- H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
- C23C16/4405—Cleaning of reactor or parts inside the reactor by using reactive gases
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/52—Controlling or regulating the coating process
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/94—Investigating contamination, e.g. dust
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N2021/8411—Application to online plant, process monitoring
- G01N2021/8416—Application to online plant, process monitoring and process controlling, not otherwise provided for
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Health & Medical Sciences (AREA)
- General Health & Medical Sciences (AREA)
- Biochemistry (AREA)
- Analytical Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Vapour Deposition (AREA)
- Drying Of Semiconductors (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
Claims
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201280019970.5A CN103493192B (en) | 2011-04-29 | 2012-04-27 | Determine the Apparatus and method for of the terminal processing chamber clean technique |
JP2014508603A JP6019105B2 (en) | 2011-04-29 | 2012-04-27 | Optical end point detection system |
SG2013075577A SG194450A1 (en) | 2011-04-29 | 2012-04-27 | Optical endpoint detection system |
KR1020137031675A KR101742478B1 (en) | 2011-04-29 | 2012-04-27 | Optical endpoint detection system |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201161480839P | 2011-04-29 | 2011-04-29 | |
US61/480,839 | 2011-04-29 | ||
US13/440,564 US9347132B2 (en) | 2011-04-29 | 2012-04-05 | Optical endpoint detection system |
US13/440,564 | 2012-04-05 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2012149331A2 true WO2012149331A2 (en) | 2012-11-01 |
WO2012149331A3 WO2012149331A3 (en) | 2013-03-28 |
Family
ID=47066950
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2012/035469 WO2012149331A2 (en) | 2011-04-29 | 2012-04-27 | Optical endpoint detection system |
Country Status (7)
Country | Link |
---|---|
US (2) | US9347132B2 (en) |
JP (1) | JP6019105B2 (en) |
KR (1) | KR101742478B1 (en) |
CN (1) | CN103493192B (en) |
SG (1) | SG194450A1 (en) |
TW (1) | TWI538079B (en) |
WO (1) | WO2012149331A2 (en) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10047457B2 (en) | 2013-09-16 | 2018-08-14 | Applied Materials, Inc. | EPI pre-heat ring |
US10153141B2 (en) | 2014-02-14 | 2018-12-11 | Electronics And Telecommunications Research Institute | Apparatus for monitoring gas and plasma process equipment including the same |
US10053777B2 (en) * | 2014-03-19 | 2018-08-21 | Applied Materials, Inc. | Thermal processing chamber |
JP2018046044A (en) * | 2016-09-12 | 2018-03-22 | 大陽日酸株式会社 | Cleaning device and cleaning method of susceptor |
US10043641B2 (en) | 2016-09-22 | 2018-08-07 | Applied Materials, Inc. | Methods and apparatus for processing chamber cleaning end point detection |
CN109226131A (en) * | 2018-10-11 | 2019-01-18 | 武汉华星光电半导体显示技术有限公司 | Clean endpoint monitoring method and monitoring device |
CN109365410B (en) * | 2018-10-17 | 2020-09-18 | 北京航天控制仪器研究所 | Processing head device for realizing efficient laser cleaning and cleaning method |
US11708635B2 (en) | 2020-06-12 | 2023-07-25 | Applied Materials, Inc. | Processing chamber condition and process state monitoring using optical reflector attached to processing chamber liner |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11140655A (en) * | 1997-11-14 | 1999-05-25 | Sony Corp | Plasma treating device |
US20040011379A1 (en) * | 2000-08-08 | 2004-01-22 | Anaokar Sunil G. | Processing apparatus and cleaning method |
US6737666B1 (en) * | 1999-11-26 | 2004-05-18 | Nec Electronics Corporation | Apparatus and method for detecting an end point of a cleaning process |
KR20040055344A (en) * | 2002-12-20 | 2004-06-26 | 아남반도체 주식회사 | Chamber cleaner |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6129807A (en) | 1997-10-06 | 2000-10-10 | Applied Materials, Inc. | Apparatus for monitoring processing of a substrate |
JP2002246320A (en) | 2001-02-20 | 2002-08-30 | Hitachi Ltd | Plasma cleaning method for plasma processor |
JP2004047020A (en) * | 2002-07-15 | 2004-02-12 | Fuji Electric Holdings Co Ltd | Magnetic disk medium and fixed magnetic disk device |
US8460945B2 (en) | 2003-09-30 | 2013-06-11 | Tokyo Electron Limited | Method for monitoring status of system components |
US20060021633A1 (en) * | 2004-07-27 | 2006-02-02 | Applied Materials, Inc. | Closed loop clean gas control |
US7534469B2 (en) | 2005-03-31 | 2009-05-19 | Asm Japan K.K. | Semiconductor-processing apparatus provided with self-cleaning device |
US8158526B2 (en) | 2006-10-30 | 2012-04-17 | Applied Materials, Inc. | Endpoint detection for photomask etching |
EP1926125B1 (en) * | 2006-10-30 | 2011-02-16 | Applied Materials, Inc. | Endpoint detection for photomask etching |
JP3138693U (en) | 2007-02-01 | 2008-01-17 | アプライド マテリアルズ インコーポレイテッド | Plasma reactor with nozzle and variable process gas distribution |
-
2012
- 2012-04-05 US US13/440,564 patent/US9347132B2/en active Active
- 2012-04-26 TW TW101114953A patent/TWI538079B/en not_active IP Right Cessation
- 2012-04-27 KR KR1020137031675A patent/KR101742478B1/en active IP Right Grant
- 2012-04-27 WO PCT/US2012/035469 patent/WO2012149331A2/en active Application Filing
- 2012-04-27 JP JP2014508603A patent/JP6019105B2/en active Active
- 2012-04-27 CN CN201280019970.5A patent/CN103493192B/en active Active
- 2012-04-27 SG SG2013075577A patent/SG194450A1/en unknown
-
2016
- 2016-05-23 US US15/162,160 patent/US10179354B2/en active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11140655A (en) * | 1997-11-14 | 1999-05-25 | Sony Corp | Plasma treating device |
US6737666B1 (en) * | 1999-11-26 | 2004-05-18 | Nec Electronics Corporation | Apparatus and method for detecting an end point of a cleaning process |
US20040011379A1 (en) * | 2000-08-08 | 2004-01-22 | Anaokar Sunil G. | Processing apparatus and cleaning method |
KR20040055344A (en) * | 2002-12-20 | 2004-06-26 | 아남반도체 주식회사 | Chamber cleaner |
Also Published As
Publication number | Publication date |
---|---|
SG194450A1 (en) | 2013-12-30 |
CN103493192A (en) | 2014-01-01 |
JP2014518009A (en) | 2014-07-24 |
KR20140033376A (en) | 2014-03-18 |
TWI538079B (en) | 2016-06-11 |
JP6019105B2 (en) | 2016-11-02 |
US10179354B2 (en) | 2019-01-15 |
US20160263634A1 (en) | 2016-09-15 |
KR101742478B1 (en) | 2017-06-15 |
TW201250906A (en) | 2012-12-16 |
US20120273005A1 (en) | 2012-11-01 |
WO2012149331A3 (en) | 2013-03-28 |
CN103493192B (en) | 2016-08-17 |
US9347132B2 (en) | 2016-05-24 |
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