A magnetron sputtering system is provided that uses a backing plate assembly having an insulating spacer ring coupled between and hermetically sealed to the backing plate and an extender ring. The insulating spacer ring can be constructed from a ceramic material, and the extender ring can be constructed...http://www.google.es/patents/US6039848?utm_source=gb-gplus-sharePatente US6039848 - Ultra-high vacuum apparatus and method for high productivity physical vapor deposition.
Ultra-high vacuum apparatus and method for high productivity physical vapor ...
