A set of candidate global optima is identified, one of which is a global solution for making a mask for printing a lithographic pattern. A solution space is formed from dominant joint eigenvectors that is constrained for bright and dark areas of the printed pattern. The solution space is mapped to identify...http://www.google.es/patents/US7685559?utm_source=gb-gplus-sharePatente US7685559 - Step-walk relaxation method for global optimization of masks
Step-walk relaxation method for global optimization of masks
