In order to solve the problem of the proximity effects which occurs in the fabrication of integrated circuit devices, a facile method is provided for automatically creating a new pattern in which variably spaced windage correction is applied over the mask. This permits the utilization of conventional...http://www.google.es/patents/US4895780?utm_source=gb-gplus-sharePatente US4895780 - Adjustable windage method and mask for correction of proximity effect in submicron photolithography
Adjustable windage method and mask for correction of proximity effect in ...
