A lithographic method and apparatus for determining operational parameters of a maskless lithography tool. In an embodiment, an amount of data in a datapath of the maskless lithography system is reduced. A maximum value of at least one operational parameter of the maskless lithography system is determined...http://www.google.es/patents/US7791710?utm_source=gb-gplus-sharePatente US7791710 - System and method for determining maximum operational parameters used in maskless applications
System and method for determining maximum operational parameters used in ...
