A resist is peeled without leaving a residue after peeling, by bringing a resist-peeling liquid comprising a primary aliphatic amine of 2-6 carbon atoms into contact with the surface of an etched novolak positive photoresist, and removing the resist-peeling liquid containing the thus peeled resist from...http://www.google.es/patents/US5399202?utm_source=gb-gplus-sharePatente US5399202 - Resist-peeling liquid and process for peeling a resist using the same
Resist-peeling liquid and process for peeling a resist using the same
