A method for enhancing stability of a fluorinated silicon glass layer is disclosed. A fluorinated silicon glass layer provided on a substrate is subjected to a phosphorous-containing and hydrogen-containing gas such as phosphine (PH3), for example. The gas forms reactive hydrogen species which removes...http://www.google.es/patents/US7226875?utm_source=gb-gplus-sharePatente US7226875 - Method for enhancing FSG film stability