Methods and an apparatus for providing a non-contact probe for accurately measuring the temperature of a substrate in a process chamber are disclosed. One exemplary apparatus is a processing chamber, which includes a heating source, where the heating source heats the substrate. Also included is a window...http://www.google.es/patents/US6563092?utm_source=gb-gplus-sharePatente US6563092 - Measurement of substrate temperature in a process chamber using non-contact filtered infrared pyrometry
Measurement of substrate temperature in a process chamber using non-contact ...
