A valve control system for a semiconductor processing chamber includes a system control computer and a plurality of electrically controlled valves associated with the processing chamber. The system further includes a programmable logic controller in communication with the system control computer and...http://www.google.es/patents/US20020127745?utm_source=gb-gplus-sharePatente US20020127745 - Valve control system for atomic layer deposition chamber
Valve control system for atomic layer deposition chamber
Número de solicitud: 09/800,881 Número de publicación: US 2002/0127745 A1 Fecha de presentación: 7 Mar 2001 Patente emitida: US6734020 ( Fecha de emisión 11 May 2004)
