An apparatus for managing plasma in wafer processing operations is disclosed which includes a housing having an internal region defined by an inner wall. The housing has an input port for supplying a plasma into the housing at a first end and an output port at a second end. The apparatus includes a hollow...http://www.google.es/patents/US7017514?utm_source=gb-gplus-sharePatente US7017514 - Method and apparatus for plasma optimization in water processing
Method and apparatus for plasma optimization in water processing
