A method and an apparatus for executing efficient and cost-effective Atomic Layer Deposition (ALD) at low temperatures are presented. ALD films such as oxides and nitrides are produced at low temperatures under controllable and mild oxidizing conditions over substrates and devices that are moisture-...http://www.google.es/patents/US7250083?utm_source=gb-gplus-sharePatente US7250083 - ALD method and apparatus
