A method for manufacturing a semiconductor device may include: forming a main magnetic field having an axis, and forming a subsidiary magnetic field substantially parallel to the axis; applying an alternating current along a path between the main and the subsidiary magnetic fields; allowing a gas to...http://www.google.es/patents/US7578944?utm_source=gb-gplus-sharePatente US7578944 - Apparatus for generating gas plasma, gas composition for generating plasma and method for manufacturing semiconductor device using the same
Apparatus for generating gas plasma, gas composition for generating plasma ...
