A manufacturing process technology creates a pattern on a first layer using a focused ion beam process. The pattern is transferred to a second layer, which may act as a traditional etch stop layer. The pattern can be formed on the second layer without irradiation by light through a reticle and without...http://www.google.es/patents/US7993813?utm_source=gb-gplus-sharePatente US7993813 - Apparatus and method for conformal mask manufacturing
Apparatus and method for conformal mask manufacturing
