In processing requests for wafer structure profile determination from optical metrology measurements, a plurality of measured diffraction signal of a plurality of structures formed on one or more wafers is obtained. The plurality of measured diffraction signals is distributed to a plurality of instances...http://www.google.es/patents/US7515283?utm_source=gb-gplus-sharePatente US7515283 - Parallel profile determination in optical metrology
Parallel profile determination in optical metrology
