The thickness of a thin film on a substrate surface is determined by measuring its emissivity and temperature with a non-contact optical technique and then calculating the film thickness from these measurements. The thickness of the film can be determined by this technique in situ, while it is being...http://www.google.es/patents/US5166080?utm_source=gb-gplus-sharePatente US5166080 - Techniques for measuring the thickness of a film formed on a substrate
Techniques for measuring the thickness of a film formed on a substrate
