A method for controlling a profile of a structure formed on a substrate using nitrogen trifluoride (NF.sub.3) in a high density plasma (HDP) process. Changing the amount of NF.sub.3 in the plasma controls the profile of the structure. It has been found that the best results are obtained with an inductively...http://www.google.es/patents/US6303513?utm_source=gb-gplus-sharePatente US6303513 - Method for controlling a profile of a structure formed on a substrate
Method for controlling a profile of a structure formed on a substrate
