The present invention provides an apparatus and a method of handling and transferring substrate in reduced particle contamination and thermal stress, as well as increased speed. One embodiment of the present invention provides an apparatus for handling a substrate. The apparatus comprises a support plate,...http://www.google.es/patents/US20060236941?utm_source=gb-gplus-sharePatente US20060236941 - Passive wafer support for particle free wafer acceleration
Passive wafer support for particle free wafer acceleration
