An exposure apparatus includes a measurement device for measuring a distortion of an image of a reticle formed on a substrate by scanning exposure, a calculation device for calculating a position compensation parameter for each distortion, by separating the measured distortion into a symmetrical component...http://www.google.es/patents/US6934004?utm_source=gb-gplus-sharePatente US6934004 - Exposure apparatus, semiconductor device manufacturing method, maintenance method of exposure apparatus, and semiconductor manufacturing factory
