A substrate processing apparatus includes a chamber, and a cleaning-liquid supply unit that supplies a cleaning liquid containing hydrofluoro ether onto a substrate to be processed placed in the chamber. In the chamber, there is further disposed a gas supply unit that supplies into the chamber a gas...http://www.google.es/patents/US20080127508?utm_source=gb-gplus-sharePatente US20080127508 - Substrate processing apparatus and substrate processing method
Substrate processing apparatus and substrate processing method
Número de solicitud: 11/984,100 Número de publicación: US 2008/0127508 A1 Fecha de presentación: 13 Nov 2007 Patente emitida: US8056257 ( Fecha de emisión 15 Nov 2011)
