A light exposure apparatus used for manufacturing semiconductors, liquid crystal display elements or the like is provided with an illuminating optical system for illuminating a mask formed with a pattern with pulse light from a light source, a mask stage for loading the mask, a substrate stage for loading...http://www.google.es/patents/US5663784?utm_source=gb-gplus-sharePatente US5663784 - Slit-scanning type light exposure apparatus
