A method for transferring a fine pattern (12) on a mask (11) onto a substrate (17) by a projection exposure apparatus including an illumination optical system (1-10) for irradiating an illuminating light on the mask (11), and a projection optical system (13) for projecting an image of the fine pattern...http://www.google.es/patents/US6233041?utm_source=gb-gplus-sharePatente US6233041 - Exposure method utilizing diffracted light having different orders of diffraction
Exposure method utilizing diffracted light having different orders of ...
