An improved CVD apparatus for depositing a uniform film is shown. The apparatus comprises a reaction chamber, a substrate holder and a plurality of light sources for photo CVD or a pair of electrodes for plasma CVD. The substrate holder is a cylindrical cart which is encircled by the light sources, and...http://www.google.es/patents/US20030140941?utm_source=gb-gplus-sharePatente US20030140941 - CVD apparatus
