Disclosed is a method of inspecting a sample. The sample is scanned in a first direction with at least one particle beam. The sample is scanned in a second direction with at least one particle beam. The second direction is at an angle to the first direction. The number of defects per an area of the sample...http://www.google.es/patents/US7012439?utm_source=gb-gplus-sharePatente US7012439 - Multiple directional scans of test structures on semiconductor integrated circuits
Multiple directional scans of test structures on semiconductor integrated ...
