Plural plasma etching vessels and a wafer queuing station are arrayed about a closed pentagonal locus with a wafer transfer arm therewithin all in a controlled vacuum environment. Wafers are movable within the controlled environment between the several plasma vessels and the wafer queuing station without...http://www.google.es/patents/US5102495?utm_source=gb-gplus-sharePatente US5102495 - Method providing multiple-processing of substrates
Method providing multiple-processing of substrates
