A substrate processing system includes a processing chamber and a plasma source located external to the chamber. A conduit connects the plasma source to an interior region of the chamber to provide a reactive species to the chamber interior for cleaning interior surfaces of the chamber. A shower head,...http://www.google.es/patents/US20010006070?utm_source=gb-gplus-sharePatente US20010006070 - Surface-treated shower head for use in a substrate processing chamber
Surface-treated shower head for use in a substrate processing chamber
Número de solicitud: 09/740,596 Número de publicación: US 2001/0006070 A1 Fecha de presentación: 19 Dic 2000 Patente emitida: US6647993 ( Fecha de emisión 18 Nov 2003)
