A method for measuring at least one desired parameter of a patterned structure having a plurality of features defined by a certain process of its manufacturing. The structure represents a grid having at least one cycle formed of at least two metal-containing regions spaced by substantially transparent...http://www.google.es/patents/US7187456?utm_source=gb-gplus-sharePatente US7187456 - Method and apparatus for measurements of patterned structures
Method and apparatus for measurements of patterned structures
