In one embodiment, an apparatus for performing an atomic layer deposition process is provided which includes a chamber body having a substrate support, a lid assembly attached to the chamber body, and delivery sub-assemblies coupled to the lid assembly and configured to deliver process gases into a centralized...http://www.google.es/patents/US7402210?utm_source=gb-gplus-sharePatente US7402210 - Apparatus and method for hybrid chemical processing
Apparatus and method for hybrid chemical processing
