Disclosed is a method of determining an overlay error between two layers of a multiple layer sample. For a plurality of periodic targets that each have a first structure formed from a first layer and a second structure formed from a second layer of the sample, an interferometer is employed to modulate...http://www.google.es/patents/US20040233444?utm_source=gb-gplus-sharePatente US20040233444 - Apparatus and methods for detecting overlay errors using scatterometry
Apparatus and methods for detecting overlay errors using scatterometry
Número de solicitud: 10/785,821 Número de publicación: US 2004/0233444 A1 Fecha de presentación: 23 Feb 2004 Patente emitida: US7301634 ( Fecha de emisión 27 Nov 2007)
