The disclosure herein describes an apparatus and a method of analysis of line patterns such as fingerprints, ideograms, or the like, which comprises the steps of superimposing a centrosymmetric reference pattern of lines over the line pattern to be analyzed to form an interferometric pattern of the moire...http://www.google.es/patents/US4541113?utm_source=gb-gplus-sharePatente US4541113 - Apparatus and method of line pattern analysis
