In accordance with the present invention, deposition of LiCoO2 layers in a pulsed-dc physical vapor deposition process is presented. Such a deposition can provide a low-temperature, high deposition rate deposition of a crystalline layer of LiCoO2 with a desired (101) or (003) orientation. Some embodiments...http://www.google.es/patents/US7959769?utm_source=gb-gplus-sharePatente US7959769 - Deposition of LiCoO2
