An object of the disclosure is to provide a vacuum processing apparatus capable of minimizing the size of the whole apparatus by reducing a floor area occupied by a vacuum pump. An etching apparatus 20 for applying an etching process on an object to be processed in a vacuum includes a processing vessel...http://www.google.es/patents/US20020117112?utm_source=gb-gplus-sharePatente US20020117112 - Vacuum processing apparatus
Número de solicitud: 10/066,598 Número de publicación: US 2002/0117112 A1 Fecha de presentación: 6 Feb 2002 Patente emitida: US6702899 ( Fecha de emisión 9 Mar 2004)
