A conductive film is formed to extend from a bottom and a sidewall of a recess formed in an interlayer insulating film onto a top surface of the interlayer insulating film. Dry etching of the conductive film is performed such that a portion of the conductive film remains on the bottom and sidewall of...http://www.google.es/patents/US8133779?utm_source=gb-gplus-sharePatente US8133779 - Method of fabricating a semiconductor device
