A blanking aperture array for use in a charged particle beam exposure has a substrate, at least m rows by n columns of apertures arranged two-dimensionally in the substrate, where each of the apertures have a pair of blanking electrodes and m and n are integers greater than one, and n m-bit shift registers...http://www.google.es/patents/US5144142?utm_source=gb-gplus-sharePatente US5144142 - Blanking aperture array, method for producing blanking aperture array, charged particle beam exposure apparatus and charged particle beam exposure method
Blanking aperture array, method for producing blanking aperture array ...
