An apparatus and method for processing a microelectronic workpiece at an elevated temperature. In one embodiment, the apparatus includes a workpiece support positioned to engage and support the microelectronic workpiece during operation. The apparatus can further include a heat source having a solid...http://www.google.es/patents/US20020096508?utm_source=gb-gplus-sharePatente US20020096508 - Method and apparatus for processing a microelectronic workpiece at an elevated temperature
Method and apparatus for processing a microelectronic workpiece at an ...
Número de solicitud: 09/733,608 Número de publicación: US 2002/0096508 A1 Fecha de presentación: 8 Dic 2000 Patente emitida: US6780374 ( Fecha de emisión 24 Ago 2004)
