A heater assembly for annealing a semiconductor wafer in a vacuum chamber includes a blackbody source having a constant planar energy flux charactertistic and a wafer support for supporting the wafer adjacent to, but not spaced apart from, the source in planar parallel alignment therewith. The heater...http://www.google.es/patents/US4481406?utm_source=gb-gplus-sharePatente US4481406 - Heater assembly for thermal processing of a semiconductor wafer in a vacuum chamber
Heater assembly for thermal processing of a semiconductor wafer in a vacuum ...
