Prior to transfer of an wafer W, a mixed gas is being generated and exhausted, thereby fluctuation of concentration and temperature of a solvent component at the beginning of gas introduction into a chamber 3 is suppressed. A step of gelling after the wafer W is carried into an aging unit is divided...http://www.google.es/patents/US6589339?utm_source=gb-gplus-sharePatente US6589339 - Method of coating film, coating unit, aging unit, solvent replacement unit, and apparatus for coating film
Method of coating film, coating unit, aging unit, solvent replacement unit ...
